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    Compound, acid generator, resist composition and method of forming resist pattern
    13.
    发明授权
    Compound, acid generator, resist composition and method of forming resist pattern 有权
    化合物，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US07955777B2

    公开(公告)日：2011-06-07

    申请号：US12327549

    申请日：2008-12-03

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106

    摘要： There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern.[Chemical Formula 1] X—Q1—Y1—SO3−M+  (I) X—Q1—Y1—SO3−A+  (b1-1) (wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+ represents an alkali metal ion; and A+ represents an organic cation.).

    摘要翻译： 提供由下述通式（b1-1）表示的化合物，其适合作为抗蚀剂组合物的酸产生剂，由下述通式（I）表示的化合物适合作为由通式 式（b1-1），酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 [化学式1] X-Q1-Y1-SO3-M +（I）X-Q1-Y1-SO3-A +（b1-1）（其中，Q1表示二价连接基或单键; Y1表示亚烷基 其可以含有取代基或可以含有取代基的氟化亚烷基; X表示含有氟原子且含有取代基的碳原子数为5〜30的芳香族环状基团，M +表示碱金属离子， A +表示有机阳离子。）

    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    15.
    发明申请
    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    正电阻组合物和形成电阻图案的方法

    公开(公告)号：US20100015553A1

    公开(公告)日：2010-01-21

    申请号：US12500528

    申请日：2009-07-09

    申请人： Hiroaki Shimizu ,  Tsuyoshi Nakamura ,  Yoshiyuki Utsumi ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Akiya Kawaue

    发明人： Hiroaki Shimizu ,  Tsuyoshi Nakamura ,  Yoshiyuki Utsumi ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Akiya Kawaue

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/2041

    摘要： A positive resist composition including a resin component (A) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; R1 represents a C3 or more branched alkyl group; and each of R2 and R3 independently represents an alkyl group, wherein R2 and R3 may be mutually bonded to form a polycyclic group) and/or general formula (a0-2) (R is the same as defined above; R8 represents a divalent linking group that contains no halogen atom; and R7 represents an acid dissociable, dissolution inhibiting group), and an acid generator (B1) consisting of a compound represented by general formula (b1) (Y1 represents a C1-C4 fluorinated alkylene group which may have a substituent; X represents a C3-C30 aliphatic cyclic group which may have a substituent; and A+ represents an organic cation).

    摘要翻译： 一种正型抗蚀剂组合物，其包含具有由通式（a0-1）表示的结构单元（a0）的树脂组分（A）（R表示氢原子，C1-C5烷基或C1-C5卤代烷基; R1 表示C3或更多支链烷基; R2和R3各自独立地表示烷基，其中R2和R3可以相互键合形成多环基）和/或通式（a0-2）（R相同） R8表示不含卤原子的二价连接基团，R7表示酸解离性溶解抑制基团）和由通式（b1）表示的化合物（Y1）表示的酸产生剂（B1） 可以具有取代基的C1-C4氟化亚烷基; X表示可具有取代基的C 3 -C 30脂族环基; A +表示有机阳离子。

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
    16.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR 有权
    抗蚀剂组合物，形成抗蚀剂图案，新型化合物和酸产生剂的方法

    公开(公告)号：US20090130597A1

    公开(公告)日：2009-05-21

    申请号：US12265607

    申请日：2008-11-05

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

    IPC分类号： G03F7/031 ,  G03F7/20 ,  C07C309/04 ,  C07D327/04

    CPC分类号： G03F7/0045 ,  C07D327/02 ,  C07D327/04 ,  C07D497/08 ,  C08K5/36 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： A compound represented by general formula (I); and a compound represented by general formula (b1-1). X-Q1-Y1—SO3−M+  [Chemical Formula 1] (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.

    摘要翻译： 由通式（I）表示的化合物; 和由通式（b1-1）表示的化合物。 <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-M + [化学式1] <？in-line-formula description =“ “end =”tail“？> <？in-line-formula description =”In-line formula“end =”lead“？>（I）<？in-line-formula description =”In-line Formulas“end = “tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-A + <？in-line-formula description =“In-line Formulas “end =”tail“？> <？in-line-formula description =”在线公式“end =”lead“？>（b1-1）<？in-line-formula description =”In-line Formulas“ end =“tail”？>其中Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的3〜30个碳原子的环状基团，其结构中具有-SO 2 - 键; M +表示碱金属离子; 而A +代表有机阳离子。

    Resist composition, method of forming resist pattern, and new compound
    18.
    发明授权
    Resist composition, method of forming resist pattern, and new compound 有权
    抗蚀剂组合物，形成抗蚀剂图案的方法和新化合物

    公开(公告)号：US08846291B2

    公开(公告)日：2014-09-30

    申请号：US13312013

    申请日：2011-12-06

    申请人： Yoshiyuki Utsumi ,  Kenichiro Miyashita ,  Akiya Kawaue

    发明人： Yoshiyuki Utsumi ,  Kenichiro Miyashita ,  Akiya Kawaue

    IPC分类号： G03F7/004 ,  C07C303/32 ,  C07C309/07 ,  C07D213/79 ,  C07D213/80 ,  C07D215/48 ,  C07D215/50 ,  C07D215/54 ,  C07D219/04 ,  C07D221/10 ,  G03F7/039

    CPC分类号： C07D213/79 ,  C07D213/80 ,  C07D215/48 ,  C07D215/50 ,  C07D215/54 ,  C07D219/04 ,  C07D221/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

    摘要： A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and M+ represents an organic cation.

    摘要翻译： 一种抗蚀剂组合物，其包含：在酸的作用下在显影液中表现出改变的溶解度的碱成分（A） 含有下述通式（c1）表示的化合物（C1）的含氮有机化合物成分（C） 以及暴露后产生酸的酸产生剂组分（B），条件是化合物（C1）不在酸产生剂组分（B）中：其中RN表示可以具有取代基的含氮杂环基; X 0表示1〜10个碳原子的直链或支链的二价脂族烃基，3〜20个碳原子的环状二价脂族烃基或具有环状部分结构的3〜20个碳的二价脂肪族烃基， 这些基团中的一部分或全部氢原子被氟原子取代; M +表示有机阳离子。