利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

89 条记录 (耗时 0.027 秒)

    DUAL-BULB LAMPHEAD CONTROL METHODOLOGY
    12.
    发明申请
    DUAL-BULB LAMPHEAD CONTROL METHODOLOGY 有权
    双通道灯泡控制方法

    公开(公告)号：US20120129275A1

    公开(公告)日：2012-05-24

    申请号：US13011687

    申请日：2011-01-21

    申请人： Yao-Hung Yang ,  Abhijit Kangude ,  Sanjeev Baluja ,  Michael Martinelli ,  Liliya Krivulina ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Scott Hendrickson

    发明人： Yao-Hung Yang ,  Abhijit Kangude ,  Sanjeev Baluja ,  Michael Martinelli ,  Liliya Krivulina ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Scott Hendrickson

    IPC分类号： H01L21/26 ,  H05B37/02

    CPC分类号： H05B41/3921 ,  H01L21/67115 ,  H05B41/3922

    摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.

    摘要翻译： 本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。 方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。 然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。 在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。 闭环控制确保从基板到基板的工艺均匀性。 辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。

    Dual-bulb lamphead control methodology
    13.
    发明授权
    Dual-bulb lamphead control methodology 有权
    双灯泡灯头控制方法

    公开(公告)号：US08309421B2

    公开(公告)日：2012-11-13

    申请号：US13011687

    申请日：2011-01-21

    申请人： Yao-Hung Yang ,  Abhijit Kangude ,  Sanjeev Baluja ,  Michael Martinelli ,  Liliya Krivulina ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Scott Hendrickson

    发明人： Yao-Hung Yang ,  Abhijit Kangude ,  Sanjeev Baluja ,  Michael Martinelli ,  Liliya Krivulina ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Scott Hendrickson

    IPC分类号： H01L21/336 ,  H01L21/76

    CPC分类号： H05B41/3921 ,  H01L21/67115 ,  H05B41/3922

    摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.

    摘要翻译： 本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。 方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。 然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。 在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。 闭环控制确保从基板到基板的工艺均匀性。 辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。

    Multifunctional heater/chiller pedestal for wide range wafer temperature control
    14.
    发明授权
    Multifunctional heater/chiller pedestal for wide range wafer temperature control 有权
    多功能加热器/冷水机座，适用于宽幅晶圆温度控制

    公开(公告)号：US08274017B2

    公开(公告)日：2012-09-25

    申请号：US12641819

    申请日：2009-12-18

    申请人： Lipyeow Yap ,  Tuan Anh Nguyen ,  Dale R. Du Bois ,  Sanjeev Baluja ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Jianhua Zhou

    发明人： Lipyeow Yap ,  Tuan Anh Nguyen ,  Dale R. Du Bois ,  Sanjeev Baluja ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Jianhua Zhou

    IPC分类号： H05B3/68

    CPC分类号： H01L21/67109 ,  H01L21/68792

    摘要： Embodiments of the invention generally relate to a semiconductor processing chamber and, more specifically, a heated support pedestal for a semiconductor processing chamber. In one embodiment, a pedestal for a semiconductor processing chamber is provided. The pedestal comprises a substrate support comprising a conductive material and having a support surface for receiving a substrate, a resistive heater encapsulated within the substrate support, a hollow shaft coupled to the substrate support at a first end and a mating interface at an opposing end, the hollow shaft comprising a shaft body having a hollow core, and a cooling channel assembly encircling the hollow core and disposed within the shaft body for removing heat from the pedestal via an internal cooling path, wherein the substrate support has a heat control gap positioned between the heating element and the ring-shaped cooling channel.

    摘要翻译： 本发明的实施例一般涉及半导体处理室，更具体地说，涉及用于半导体处理室的加热支撑基座。 在一个实施例中，提供了一种用于半导体处理室的基座。 基座包括基板支撑件，该基板支撑件包括导电材料并且具有用于接收基板的支撑表面，封装在基板支撑件内的电阻加热器，在第一端处耦合到基板支撑件的中空轴和在相对端处的配合接口， 所述空心轴包括具有中空芯的轴体和围绕所述中空芯的冷却通道组件，所述冷却通道组件设置在所述轴体内，用于经由内部冷却路径从所述基座移除热量，其中所述基板支撑件具有位于 加热元件和环形冷却通道。

    QUARTZ SHOWERHEAD FOR NANOCURE UV CHAMBER
    15.
    发明申请
    QUARTZ SHOWERHEAD FOR NANOCURE UV CHAMBER 有权
    QUARTZ淋浴器用于纳米紫外线灯

    公开(公告)号：US20120090691A1

    公开(公告)日：2012-04-19

    申请号：US13248656

    申请日：2011-09-29

    申请人： Sanjeev Baluja ,  Juan Carlos Rocha-Alvarez ,  Alexandros T. Demos ,  Thomas Nowak ,  Jianhua Zhou

    发明人： Sanjeev Baluja ,  Juan Carlos Rocha-Alvarez ,  Alexandros T. Demos ,  Thomas Nowak ,  Jianhua Zhou

    IPC分类号： F17D1/16 ,  B08B5/00 ,  C23C16/48

    CPC分类号： C23C16/56 ,  C23C16/4405 ,  C23C16/45565 ,  C23C16/482 ,  H01L21/6719 ,  H01L21/67742 ,  Y10T137/0391

    摘要： Embodiments of the invention generally provide apparatuses and methods for controlling the gas flow profile within a processing chamber. In one embodiment, a processing tool includes an ultraviolet processing chamber defining a processing region, a substrate support, a window disposed between a UV radiation source and the substrate support, and a transparent showerhead disposed within the processing region between the window and the substrate support and having one or more transparent showerhead passages between upper and lower processing regions. The processing tool also includes a gas distribution ring having one or more gas distribution ring passages between a gas distribution ring inner channel and the upper processing region and a gas outlet ring positioned below the gas distribution ring, the gas outlet ring having one or more gas outlet passages between a gas outlet ring inner channel within the gas outlet ring and the lower processing region.

    摘要翻译： 本发明的实施例通常提供用于控制处理室内的气流分布的装置和方法。 在一个实施例中，处理工具包括限定处理区域的紫外线处理室，衬底支撑件，设置在UV辐射源和衬底支撑件之间的窗口，以及布置在窗口和衬底支撑件之间的处理区域内的透明花洒 并且在上下处理区域之间具有一个或多个透明花洒通道。 处理工具还包括气体分配环，气体分配环具有在气体分配环内部通道和上部加工区域之间的一个或多个气体分配环通道和位于气体分配环下方的气体出口环，气体出口环具有一个或多个气体 气体出口环内的气体出口环内部通道和下部加工区域之间的出口通道。

    INCREASED TOOL UTILIZATION/REDUCTION IN MWBC FOR UV CURING CHAMBER
    16.
    发明申请
    INCREASED TOOL UTILIZATION/REDUCTION IN MWBC FOR UV CURING CHAMBER 有权
    紫外线固化室MWBC中增加工具的使用/减少

    公开(公告)号：US20070298362A1

    公开(公告)日：2007-12-27

    申请号：US11562043

    申请日：2006-11-21

    申请人： Juan Carlos Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Ndanka O. Mukuti

    发明人： Juan Carlos Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Ndanka O. Mukuti

    IPC分类号： F27D3/00 ,  F27D11/00

    CPC分类号： F27B17/0025 ,  H01L21/67115

    摘要： A pump liner is used to direct a laminar flow of purge gas across a workpiece to remove contaminants or species outgassed or otherwise produced by the workpiece during processing. The pump liner can take the form of a ring having a plurality of injection ports, such as slits of a variety of shapes and/or sizes, opposite a plurality of receiving ports in order to provide the laminar flow. The flow of purge gas is sufficient to carry a contaminant or outgassed species from the processing chamber in order to prevent the collection of the contaminants on components of the chamber. The pump liner can be heated, via conduction and irradiation from a radiation source, for example, in order to prevent the condensation of species on the liner. The pump liner also can be anodized or otherwise processed in order to increase the emissivity of the liner.

    摘要翻译： 泵衬套用于引导吹扫气体的层流穿过工件以去除在加工过程中由工件脱气或以其它方式产生的污染物或物质。 泵衬套可以采取具有多个注入口的环的形式，例如与多个接收端口相对的各种形状和/或尺寸的狭缝，以提供层流。 吹扫气体的流动足以承载来自处理室的污染物或去气物质，以便防止在室的部件上收集污染物。 可以通过例如辐射源的传导和辐射来加热泵衬垫，以防止物质在衬套上的冷凝。 泵衬垫也可以被阳极化处理或以其它方式加工，以便增加衬套的发射率。

    Quartz showerhead for nanocure UV chamber
    17.
    发明授权
    Quartz showerhead for nanocure UV chamber 有权
    用于纳米级紫外线室的石英花洒

    公开(公告)号：US08911553B2

    公开(公告)日：2014-12-16

    申请号：US13248656

    申请日：2011-09-29

    申请人： Sanjeev Baluja ,  Juan Carlos Rocha-Alvarez ,  Alexandros T. Demos ,  Thomas Nowak ,  Jianhua Zhou

    发明人： Sanjeev Baluja ,  Juan Carlos Rocha-Alvarez ,  Alexandros T. Demos ,  Thomas Nowak ,  Jianhua Zhou

    IPC分类号： C23C16/455 ,  C23C16/48 ,  C23C16/56 ,  H01L21/67 ,  C23C16/44 ,  H01L21/677

    CPC分类号： C23C16/56 ,  C23C16/4405 ,  C23C16/45565 ,  C23C16/482 ,  H01L21/6719 ,  H01L21/67742 ,  Y10T137/0391

    摘要： Embodiments of the invention generally provide apparatuses and methods for controlling the gas flow profile within a processing chamber. In one embodiment, a processing tool includes an ultraviolet processing chamber defining a processing region, a substrate support, a window disposed between a UV radiation source and the substrate support, and a transparent showerhead disposed within the processing region between the window and the substrate support and having one or more transparent showerhead passages between upper and lower processing regions. The processing tool also includes a gas distribution ring having one or more gas distribution ring passages between a gas distribution ring inner channel and the upper processing region and a gas outlet ring positioned below the gas distribution ring, the gas outlet ring having one or more gas outlet passages between a gas outlet ring inner channel within the gas outlet ring and the lower processing region.

    摘要翻译： 本发明的实施例通常提供用于控制处理室内的气流分布的装置和方法。 在一个实施例中，处理工具包括限定处理区域的紫外线处理室，衬底支撑件，设置在UV辐射源和衬底支撑件之间的窗口，以及布置在窗口和衬底支撑件之间的处理区域内的透明花洒 并且在上下处理区域之间具有一个或多个透明花洒通道。 处理工具还包括气体分配环，气体分配环具有在气体分配环内部通道和上部加工区域之间的一个或多个气体分配环通道和位于气体分配环下方的气体出口环，气体出口环具有一个或多个气体 气体出口环内的气体出口环内部通道和下部加工区域之间的出口通道。

    DUAL-BULB LAMPHEAD CONTROL METHODOLOGY
    19.
    发明申请
    DUAL-BULB LAMPHEAD CONTROL METHODOLOGY 审中-公开
    双通道灯泡控制方法

    公开(公告)号：US20130122611A1

    公开(公告)日：2013-05-16

    申请号：US13669113

    申请日：2012-11-05

    申请人： YAO-HUNG YANG ,  Abhijit Kangude ,  Sanjeev Baluja ,  Michael Martinelli ,  Liliya Krivulina ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Scott A. Hendrickson

    发明人： YAO-HUNG YANG ,  Abhijit Kangude ,  Sanjeev Baluja ,  Michael Martinelli ,  Liliya Krivulina ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Scott A. Hendrickson

    IPC分类号： H05B37/02 ,  H01L21/26 ,  H01L21/66

    CPC分类号： H05B41/3921 ,  H01L21/67115 ,  H05B41/3922

    摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.

    摘要翻译： 本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。 方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。 然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。 在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。 闭环控制确保从基板到基板的工艺均匀性。 辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。