Abstract:
The present invention relates to a process for the production of carboxylic esters by reaction of carboxylic acids and/or carboxylic anhydrides with at least one alcohol selected from alkanols having at least 5 carbon atoms, cycloalkanols, and alkoxy-alkanols, in the presence of an acidic esterification catalyst. The invention further relates to the use of the resultant carboxylic esters as plasticizers or in a plasticizer composition for thermoplastic polymers and elastomers.
Abstract:
The present invention relates to a process for preparing a terephthalic diester by reacting terephthalic acid with at least one alcohol, wherein terephthalic acid is suspended in the alcohol in a dispersing tank, the preliminary suspension is passed from the dispersing tank into a reactor and converted in the presence of an esterification catalyst to obtain a reaction suspension, a stream of the reaction suspension is drawn off from the reactor, passed through a heat exchanger outside the reactor and heated and the heated reaction suspension is recycled into the reactor, and water of reaction is distilled off together with the vapor as alcohol-water azeotrope, the vapor is at least partly condensed, the condensate is separated into an aqueous phase and an organic phase and the organic phase is at least partly recycled into the reactor.
Abstract:
A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.
Abstract:
The present invention relates to a polymer composition comprising a cycloalkyl alkyl dicarboxylic diester as plasticizer, to molding compositions and plastisols each comprising such a polymer composition, and to the use of these polymer compositions.
Abstract:
A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.
Abstract:
The present invention relates to a process for preparing a terephthalic diester by reacting terephthalic acid with at least one alcohol, wherein terephthalic acid is suspended in the alcohol in a dispersing tank, the preliminary suspension is passed from the dispersing tank into a reactor and converted in the presence of an esterification catalyst, a reaction suspension is drawn off from a region between the upper region and the lower region of the reactor, a first stream of the reaction suspension is recycled into the upper region of the reactor and a second stream of the reaction suspension is introduced into the lower region of the reactor, and the reaction suspension is thus mixed, wherein the stream drawn off and/or the first stream is passed through a heat exchanger outside the reactor and heated; and water of reaction is distilled off together with the vapor as alcohol-water azeotrope, the vapor is at least partly condensed, the condensate is separated into an aqueous phase and an organic phase and the organic phase is at least partly recycled into the reaction system.
Abstract:
The invention relates to a process for preparing a compound of the formula (I), in which R is H or C1-C6 alkyl, by reaction of at least one compound of the formula (II) in which R has the same definition as in the formula (I) and in which R1 is H, C1-C12 alkyl or C3-C12 cycloalkyl, with a compound of the formula (III) in which R2 is H or C(O)R3, in which R3 is H or C1-C12 alkyl, in the presence of at least one enzyme suitable for transesterification.
Abstract:
A process for preparing isosorbide ethoxylate di(meth)acrylate by transesterifying alkyl (meth)acrylate with isosorbide ethoxylate, comprising the steps of: (i) ethoxylating isosorbide to give isosorbide ethoxylate, (ii) reacting alkyl (meth)acrylate with isosorbide ethoxylate in the presence of potassium phosphate as catalyst and a stabilizer and in the presence of an azeotroping agent which forms an azeotrope with the alcohol bound in the alkyl (meth)acrylate, (iii) continuously distilling off the azeotrope of azeotroping agent and alcohol, wherein steps (ii) and (iii) are conducted simultaneously until the isosorbide ethoxylate has been essentially fully converted, (iv) removing the catalyst from the product mixture comprising isosorbide ethoxylate di(meth)acrylate, (v) distilling unconverted alkyl (meth)acrylate and azeotroping agent out of the product mixture.