公开(公告)号：US06773559B2

公开(公告)日：2004-08-10

申请号：US09782216

申请日：2001-02-13

申请人： Daniel Woodruff ,  Steve Eudy ,  James Erickson ,  Thomas Oberlitner ,  Matthew Egloff

发明人： Daniel Woodruff ,  Steve Eudy ,  James Erickson ,  Thomas Oberlitner ,  Matthew Egloff

IPC分类号： C25D1700

CPC分类号： H01L21/67086 ,  C25D5/08 ,  C25D7/123 ,  C25D17/001 ,  C25D17/007 ,  C25D21/10 ,  H01L21/67005 ,  H01L21/67023 ,  H01L21/67057 ,  H01L21/6723

摘要： Although there are several inventions disclosed herein, the present application is directed to a reactor for electrochemically processing a microelectronic workpiece. The reactor comprises a movable electrode assembly that is disposed for movement along a motion path. The motion path includes at least a portion thereof over which the electrode assembly is positioned for processing at least one surface of the microelectronic workpiece. A cleaning electrode is located along the motion path of the movable electrode assembly. In one embodiment, a programmable controller is connected to direct the movable electrode assembly to move to the cleaning electrode during a cleaning cycle. At that time, the programmable controller connects the movable electrode assembly as an anode and the cleaning electrode as a cathode for cleaning of the movable electrode assembly. The cleaning electrode may be disposed along a position of the motion path that is beyond the range of motion required to process the microelectronic workpiece so that the programmable controller may be programmed to conduct a cleaning cycle while a microelectronic workpiece is present in the reactor for processing.

摘要翻译： 虽然本文公开了几个发明，但是本申请涉及用于电化学处理微电子工件的反应器。 反应器包括可移动电极组件，其被设置为沿着运动路径移动。 运动路径至少包括一部分，电极组件定位在该部分上用于处理微电子工件的至少一个表面。 沿着可动电极组件的运动路径设置清洁电极。 在一个实施例中，连接可编程控制器以在清洁循环期间引导可移动电极组件移动到清洁电极。 此时，可编程控制器将作为阳极的可动电极组件和作为用于清洁可动电极组件的阴极的清洁电极连接起来。 清洁电极可以沿着运动路径的位置设置，该位置超出处理微电子工件所需的运动范围，使得可编程控制器可以被编程以在微电子工件存在于反应器中进行清洁循环以进行处理 。

公开(公告)号：US20070110895A1

公开(公告)日：2007-05-17

申请号：US11619515

申请日：2007-01-03

申请人： Jason Rye ,  Daniel Woodruff ,  Dana Scranton

发明人： Jason Rye ,  Daniel Woodruff ,  Dana Scranton

IPC分类号： B05C11/02 ,  B05D3/12 ,  C23C16/00 ,  B05B1/28

CPC分类号： H01L21/6723 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/68792

摘要： A centrifugal workpiece processor for processing semiconductor wafers and similar workpieces includes a head which holds and spins the workpiece. The head includes a rotor having a gas system. Gas is sprayed or jetted from inlets in the rotor to create a rotational gas flow. The rotational gas flow causes pressure conditions which hold the edges of a first side of the workpiece against contact pins on the rotor. The rotor and the workpiece rotate together. Guide pins adjacent to a perimeter may help to align the workpiece with the rotor. An angled surface helps to deflect spent process liquid away from the workpiece. The head is moveable into multiple different engagement positions with a bowl. Spray nozzles in the bowl spray a process liquid onto the second side of the workpiece, as the workpiece is spinning, to process the workpiece. A moving end point detector may be used to detect an end point of processing.

摘要翻译： 用于处理半导体晶片和类似工件的离心工件处理器包括保持和旋转工件的头部。 头包括具有气体系统的转子。 气体从转子中的入口喷射或喷射以产生旋转气流。 旋转气流引起压力条件，其保持工件的第一侧的边缘抵抗转子上的接触销。 转子和工件一起旋转。 与周边相邻的导销可能有助于将工件与转子对准。 有角度的表面有助于将废工艺液体偏离工件。 头部可以与碗一起移动到多个不同的接合位置。 当工件旋转时，碗中的喷嘴将工艺液体喷射到工件的第二面上，以处理工件。 可以使用移动端点检测器来检测处理的终点。

公开(公告)号：US20060029815A1

公开(公告)日：2006-02-09

申请号：US11184539

申请日：2005-07-19

申请人： Daniel Woodruff ,  William Meredith ,  Chanin Cloutier

发明人： Daniel Woodruff ,  William Meredith ,  Chanin Cloutier

IPC分类号： B32B17/06

CPC分类号： C03C17/3417 ,  C03C2217/91 ,  C23C14/086

摘要： A substrate coating and method of applying the same in which the coating provides UV blocking and AR properties and in which at least one of the layers is formed of a combination of zinc oxide and a stabilizing secondary metal oxide.

摘要翻译： 基材涂层及其涂布方法，其中涂层提供UV阻挡和AR性质，并且其中至少一层由氧化锌和稳定二次金属氧化物的组合形成。

公开(公告)号：US20050193537A1

公开(公告)日：2005-09-08

申请号：US11101834

申请日：2005-04-07

申请人： Robert Berner ,  Daniel Woodruff ,  Wayne Schmidt ,  Kevin Coyle ,  Vladimir Zila ,  Worm Lund

发明人： Robert Berner ,  Daniel Woodruff ,  Wayne Schmidt ,  Kevin Coyle ,  Vladimir Zila ,  Worm Lund

IPC分类号： H01L21/677 ,  B65G49/07 ,  C25D7/12 ,  H01L21/00 ,  B21F41/00

CPC分类号： H01L21/67173 ,  C25D7/12 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/6723 ,  H01L21/67742 ,  Y10S414/141 ,  Y10T29/40

摘要： The present invention provides for a semiconductor workpiece processing tool and methods for handling semiconductor workpiece therein. The semiconductor workpiece processing tool preferably includes an interface section comprising at least one interface module and a processing section comprising a plurality of processing modules for processing the semiconductor workpieces. The semiconductor workpiece processing tool may have a conveyor for transferring the semiconductor workpieces between the interface modules and the processing modules.

摘要翻译： 本发明提供一种用于在其中处理半导体工件的半导体工件加工工具和方法。 半导体工件加工工具优选地包括包括至少一个接口模块的接口部分和包括用于处理半导体工件的多个处理模块的处理部分。 半导体工件加工工具可以具有用于在接口模块和处理模块之间传送半导体工件的传送器。

公开(公告)号：US20050161336A1

公开(公告)日：2005-07-28

申请号：US11083439

申请日：2005-03-17

申请人： Daniel Woodruff ,  Kyle Hanson

发明人： Daniel Woodruff ,  Kyle Hanson

IPC分类号： C25D7/12 ,  C25D17/12 ,  C25D5/02 ,  C25D17/00

CPC分类号： C25D17/12 ,  C25D7/123 ,  C25D17/001

摘要： An electroplating apparatus includes a reactor vessel having a segmented anode array positioned therein for effecting electroplating of an associated workpiece such as a semiconductor wafer. The anode array includes a plurality of ring-like anode segments which are preferably positioned in concentric, coplanar relationship with each other. The anode segments can be independently operated to create varying electrical potentials with the associated workpiece to promote uniform deposition of electroplated metal on the surface of the workpiece.

公开(公告)号：US20050161320A1

公开(公告)日：2005-07-28

申请号：US11083707

申请日：2005-03-17

申请人： Daniel Woodruff ,  Kyle Hanson

发明人： Daniel Woodruff ,  Kyle Hanson

IPC分类号： C25D7/12 ,  C25D17/12 ,  C25D17/00

CPC分类号： C25D17/12 ,  C25D7/123 ,  C25D17/001

摘要： An electroplating apparatus includes a reactor vessel having a segmented anode array positioned therein for effecting electroplating of an associated workpiece such as a semiconductor wafer. The anode array includes a plurality of ring-like anode segments which are preferably positioned in concentric, coplanar relationship with each other. The anode segments can be independently operated to create varying electrical potentials with the associated workpiece to promote uniform deposition of electroplated metal on the surface of the workpiece.

公开(公告)号：US20050034809A1

公开(公告)日：2005-02-17

申请号：US10861240

申请日：2004-06-03

申请人： Daniel Woodruff ,  Jeffry Davis ,  Randy Harris ,  David Mattson ,  James Erickson ,  Matthew Egloff

发明人： Daniel Woodruff ,  Jeffry Davis ,  Randy Harris ,  David Mattson ,  James Erickson ,  Matthew Egloff

IPC分类号： B24B20060101 ,  C12N15/31 ,  C23F1/00 ,  H01L21/00

CPC分类号： H01L21/6719

摘要： An integrated tool and automatic calibration systems that enable wet chemical processing chambers, lift-rotate units and other hardware to be quickly interchanged without having to recalibrate the transport system or other components to the replacement items. These tools are expected to reduce the down time associated with repairing or maintaining processing chambers and/or lift-rotate units so that the tools can maintain a high throughput. Several aspects of these tools are particularly useful for applications that have stringent performance requirements because components are more likely to require maintenance more frequently, and reducing the down time associated with maintaining such components will significantly enhance the integrated tool.

摘要翻译： 集成的工具和自动校准系统，使湿化学处理室，提升 - 旋转单元和其他硬件能够快速互换，而无需重新校准运输系统或其他组件到更换项目。 预计这些工具可以减少与修理或维护处理室和/或提升旋转单元相关联的停机时间，从而使工具能够保持高通量。 这些工具的几个方面对于具有严格性能要求的应用程序特别有用，因为组件更有可能需要更频繁的维护，并且减少与维护这些组件相关联的停机时间将显着增强集成工具。

公开(公告)号：US20070184283A1

公开(公告)日：2007-08-09

申请号：US11620971

申请日：2007-01-08

申请人： Jean Breshears ,  Joseph Chavis ,  Willliam Meredith ,  Daniel Woodruff

发明人： Jean Breshears ,  Joseph Chavis ,  Willliam Meredith ,  Daniel Woodruff

IPC分类号： B32B17/06 ,  B05D5/06 ,  B32B9/00

CPC分类号： C09D183/06 ,  C03C17/008 ,  C03C17/28 ,  C03C17/30 ,  Y10T428/31612

摘要： A method of making coated glass structure including providing a glass substrate wherein the glass substrate exhibits a color which is off neutral, and applying a coating to the glass substrate wherein the coating comprises a colorant capable of at least partially neutralizing the color. A glass structure including a glass substrate having a pair of major surfaces wherein the glass substrate exhibits a color which is off neutral, and a coating applied to at least one of the major surfaces wherein the coating exhibits a color which at least partially neutralizes the color of the glass substrate.

摘要翻译： 一种制造涂覆玻璃结构的方法，包括提供玻璃基板，其中所述玻璃基板呈现中性的颜色，并且向所述玻璃基板施加涂层，其中所述涂层包括能够至少部分地中和所述颜色的着色剂。 一种玻璃结构，其包括具有一对主表面的玻璃基板，其中所述玻璃基板呈现中性的颜色，以及施加到至少一个所述主表面的涂层，其中所述涂层呈现至少部分中和所述颜色的颜色 的玻璃基板。

公开(公告)号：US20070144912A1

公开(公告)日：2007-06-28

申请号：US11699763

申请日：2007-01-29

申请人： Daniel Woodruff

发明人： Daniel Woodruff

IPC分类号： C25D7/12

CPC分类号： C25D17/001

摘要： Systems and methods for processing microfeature workpieces with agitators are disclosed. A system in accordance with one embodiment includes a vessel configured to receive a processing fluid at a process location, a fluid inlet positioned to direct the processing fluid into the vessel, a weir positioned above the process location and outwardly from the fluid inlet to receive the processing fluid moving radially outwardly from the inlet, and a workpiece support positioned to carry a workpiece at the process location. An agitator has an elongated agitator element positioned proximate to the process location, a first support proximate to a first end of the agitator element, and a second support proximate to an opposite end of the agitator element. A motor is coupled to the first support and not the second support to drive the agitator along a linear path relative to the process location. A linear guide is engaged with the second support to guide the motion of the agitator.

摘要翻译： 公开了用搅拌器处理微型工件的系统和方法。 根据一个实施例的系统包括构造成在处理位置处接收处理流体的容器，定位成将处理流体引导到容器中的流体入口，位于处理位置上方并且从流体入口向外的堰， 从入口径向向外移动的处理流体以及定位成在处理位置承载工件的工件支撑件。 搅拌器具有靠近处理位置设置的细长的搅拌器元件，靠近搅拌器元件的第一端的第一支撑件和靠近搅拌器元件的相对端的第二支撑件。 电动机联接到第一支撑件而不是第二支撑件，以相对于过程位置沿线性路径驱动搅拌器。 线性引导件与第二支撑件接合以引导搅拌器的运动。

公开(公告)号：US20070009344A1

公开(公告)日：2007-01-11

申请号：US11178250

申请日：2005-07-07

申请人： Paul Wirth ,  Daniel Woodruff

发明人： Paul Wirth ,  Daniel Woodruff

IPC分类号： H01L21/677

CPC分类号： H01L21/67201 ,  H01L21/6719 ,  H01L21/67775

摘要： An intermediate module comprising a dimensionally stable mounting module and a first device attached to the dimensionally stable mounting module. The dimensionally stable mounting module can include a front docking unit with front alignment elements for connecting the mounting module to a load/unload module, and a rear docking unit with rear alignment elements for connecting the mounting module to a main processing unit. The mounting module can further include a deck between the front docking unit and the rear docking unit, positioning elements at the deck, and attachment elements at the deck. The first device can be a processing chamber, an annealing station, a metrology station, a buffer station, or another type of component for holding or otherwise performing a function on a workpiece. The first device has a device interface member engaged with one of the positioning elements and a device fastener engaged with one of the attachment elements so that the first device is positioned precisely at a known location in a fixed reference frame defined by the mounting module.

摘要翻译： 一种中间模块，包括尺寸稳定的安装模块和附接到尺寸稳定的安装模块的第一装置。 尺寸稳定的安装模块可以包括具有用于将安装模块连接到装载/卸载模块的前对准元件的前对接单元和具有用于将安装模块连接到主处理单元的后对准元件的后对接单元。 安装模块还可以包括在前对接单元和后对接单元之间的甲板，位于甲板处的定位元件和甲板上的附接元件。 第一装置可以是处理室，退火站，计量站，缓冲站或用于在工件上保持或以其他方式执行功能的另一类型的部件。 所述第一装置具有与所述定位元件中的一个接合的设备接口构件和与所述附接元件中的一个接合的设备紧固件，使得所述第一设备精确地定位在由所述安装模块限定的固定参考框架中的已知位置处。