公开(公告)号：US20050193537A1

公开(公告)日：2005-09-08

申请号：US11101834

申请日：2005-04-07

申请人： Robert Berner ,  Daniel Woodruff ,  Wayne Schmidt ,  Kevin Coyle ,  Vladimir Zila ,  Worm Lund

发明人： Robert Berner ,  Daniel Woodruff ,  Wayne Schmidt ,  Kevin Coyle ,  Vladimir Zila ,  Worm Lund

IPC分类号： H01L21/677 ,  B65G49/07 ,  C25D7/12 ,  H01L21/00 ,  B21F41/00

CPC分类号： H01L21/67173 ,  C25D7/12 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/6723 ,  H01L21/67742 ,  Y10S414/141 ,  Y10T29/40

摘要： The present invention provides for a semiconductor workpiece processing tool and methods for handling semiconductor workpiece therein. The semiconductor workpiece processing tool preferably includes an interface section comprising at least one interface module and a processing section comprising a plurality of processing modules for processing the semiconductor workpieces. The semiconductor workpiece processing tool may have a conveyor for transferring the semiconductor workpieces between the interface modules and the processing modules.

摘要翻译： 本发明提供一种用于在其中处理半导体工件的半导体工件加工工具和方法。 半导体工件加工工具优选地包括包括至少一个接口模块的接口部分和包括用于处理半导体工件的多个处理模块的处理部分。 半导体工件加工工具可以具有用于在接口模块和处理模块之间传送半导体工件的传送器。

公开(公告)号：US20050189213A1

公开(公告)日：2005-09-01

申请号：US11085908

申请日：2005-03-21

申请人： Daniel Woodruff ,  Kyle Hanson ,  Thomas Oberlitner ,  LinLin Chen ,  John Pedersen ,  Vladimir Zila

发明人： Daniel Woodruff ,  Kyle Hanson ,  Thomas Oberlitner ,  LinLin Chen ,  John Pedersen ,  Vladimir Zila

IPC分类号： C23C18/16 ,  A61K35/12 ,  C23C28/00 ,  C25D5/08 ,  C25D7/12 ,  C25D17/06 ,  H01L21/288 ,  C25D17/04

CPC分类号： H01L21/2885 ,  A61K35/12 ,  C12N2500/25 ,  C12N2500/32 ,  C12N2500/34 ,  C12N2500/40 ,  C12N2501/11 ,  C12N2501/39 ,  C12N2501/395 ,  C12N2506/22 ,  C25D5/08 ,  C25D7/123 ,  C25D17/001 ,  C25D17/06

摘要： A reactor for plating a metal onto a surface of a workpiece is set forth. The reactor comprises a reactor bowl including an electroplating solution disposed therein and an anode disposed in the reactor bowl in contact with the electroplating solution. A contact assembly is spaced from the anode within the reactor bowl. The contact assembly includes a plurality of contacts disposed to contact a peripheral edge of the surface of the workpiece to provide electroplating power to the surface of the workpiece. The contacts execute a wiping action against the surface of the workpiece as the workpiece is brought into engagement therewith The contact assembly also including a barrier disposed interior of the plurality of contacts. The barrier includes a member disposed to engage the surface of the workpiece to assist in isolating the plurality of contacts from the electroplating solution. In one embodiment, the plurality of contacts are in the form of discrete flexures while in another embodiment the plurality of contacts are in the form of a Belleville ring contact. A flow path may be provided in the contact assembly for providing a purging gas to the plurality of contacts and the peripheral edge of the workpiece. The purging gas may be used to assist in the formation of the barrier of the contact assembly. A combined electroplating/electroless plating tool and method are also set forth.

摘要翻译： 阐述了将金属镀在工件表面上的反应器。 反应器包括反应器碗，其包括设置在其中的电镀溶液和设置在与电镀溶液接触的反应器碗中的阳极。 接触组件与反应器碗内的阳极间隔开。 接触组件包括多个触点，其设置成接触工件表面的周边边缘以向工件的表面提供电镀功率。 当工件与其接合时，触头在工件的表面上执行擦拭动作。触头组件还包括设置在多个触点内部的屏障。 阻挡层包括设置成接合工件的表面以帮助将多个触点与电镀溶液隔离的构件。 在一个实施例中，多个触点是离散弯曲的形式，而在另一个实施例中，多个触点是贝尔维尔环接触的形式。 可以在接触组件中设置流路，以向多个触点和工件的周边边缘提供净化气体。 吹扫气体可用于帮助形成接触组件的屏障。 还提出了组合电镀/无电镀工具和方法。

公开(公告)号：US20070121123A1

公开(公告)日：2007-05-31

申请号：US11288770

申请日：2005-11-28

申请人： Daniel Woodruff ,  Marvin Bernt

发明人： Daniel Woodruff ,  Marvin Bernt

IPC分类号： G01B11/28

CPC分类号： H01L21/67253 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a workpiece process end point detection system, light is diffused and then light intensity or color is sensed. Optical noise is greatly reduced and more accurate end point detection can be made. A light emitter and a light sensor may be located within a workpiece process chamber. A housing around the light emitter and the light sensor seals out process fluids and also diffuses light passing through. The diffused light may be optically filtered before reaching the light sensor.

摘要翻译： 在工件处理终点检测系统中，光被漫射，然后感测到光强度或颜色。 光学噪声大大降低，可以进行更准确的端点检测。 光发射器和光传感器可以位于工件处理室内。 光发射器周围的壳体和光传感器密封工艺流体，并且散射通过的光。 扩散光可以在到达光传感器之前进行光学滤波。

公开(公告)号：US20050006241A1

公开(公告)日：2005-01-13

申请号：US10734098

申请日：2003-12-11

申请人： Paul McHugh ,  Gregory Wilson ,  Daniel Woodruff ,  Nolan Zimmerman ,  James Erickson

发明人： Paul McHugh ,  Gregory Wilson ,  Daniel Woodruff ,  Nolan Zimmerman ,  James Erickson

IPC分类号： C25D5/00

CPC分类号： C25D5/006 ,  C25D5/08 ,  C25D17/001 ,  C25D17/008 ,  C25D17/10 ,  C25D17/12 ,  C25D21/10 ,  C25D21/12 ,  H01L21/6723

摘要： Paddles and enclosures for processing microfeature workpieces are disclosed. A paddle device having multiple paddles is positioned in an enclosure to reciprocate back and forth along a generally linear path. The clearances between the paddles, the workpiece and the walls of the chamber are relatively small to increase the flow agitation at the surface of the workpiece and enhance the mass transfer process occurring there. The paddles are shaped to reduce or eliminate electrical shadowing effects created at the surface of the workpiece during electrochemical processing. Paddles on the same paddle device may have different shapes to reduce the likelihood for creating three-dimensional effects in the flow field proximate to the surface of the workpiece. The reciprocation stroke of the paddles may shift to further reduce shadowing.

摘要翻译： 公开了用于处理微特征工件的鞍座和外壳。 具有多个桨叶的桨装置定位在外壳中，沿着大致线性的路径往复运动。 桨叶，工件和室壁之间的间隙相对较小，以增加工件表面的流动搅拌并增强在那里发生的传质过程。 桨叶的形状可减少或消除在电化学处理期间在工件表面产生的电阴影效应。 相同桨装置上的桨叶可以具有不同的形状，以减少在靠近工件表面的流场中产生三维效应的可能性。 桨叶的往复行程可能会转移以进一步减少阴影。

公开(公告)号：US20080028984A1

公开(公告)日：2008-02-07

申请号：US11579288

申请日：2004-10-20

申请人： William Meredith ,  Joel Anderson ,  John German ,  Daniel Woodruff

发明人： William Meredith ,  Joel Anderson ,  John German ,  Daniel Woodruff

IPC分类号： B32B17/00 ,  G02B1/11

CPC分类号： C03C17/3417 ,  C03C17/34 ,  G02B1/115

摘要： An anti-reflective coating for a substrate which includes an outer metal oxide layer with a refractive index greater than the refractive index of the substrate. The invention also relates to a method for making the anti-reflection coating.

摘要翻译： 一种用于衬底的抗反射涂层，其包括折射率大于衬底的折射率的外部金属氧化物层。 本发明还涉及一种制造抗反射涂层的方法。

公开(公告)号：US20080011334A1

公开(公告)日：2008-01-17

申请号：US11782159

申请日：2007-07-24

申请人： Jason Rye ,  Kyle Hanson ,  Daniel Woodruff

发明人： Jason Rye ,  Kyle Hanson ,  Daniel Woodruff

IPC分类号： B08B3/08

CPC分类号： H01L21/68735 ,  H01L21/67051 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67259 ,  H01L21/68728 ,  H01L21/68785 ,  H01L21/68792

摘要： A centrifugal workpiece processor for processing semiconductor wafers and similar workpieces includes a head which holds and spins the workpiece. The head includes a rotor having a gas system. Gas or air is sprayed or jetted from inlets in the rotor to create a rotational gas flow. The rotational gas flow causes pressure conditions which hold the edges of a first side of the workpiece against an angled annular surface on the rotor. The rotor and the workpiece rotate together. Guide pins adjacent to a perimeter may help to align the workpiece with the rotor. Outlets through the rotor allow gas to flow out of the rotor.

摘要翻译： 用于处理半导体晶片和类似工件的离心工件处理器包括保持和旋转工件的头部。 头包括具有气体系统的转子。 气体或空气从转子中的入口喷射或喷射以产生旋转气体流。 旋转气流导致压力条件，其将工件的第一侧的边缘抵靠在转子上的成角度的环形表面上。 转子和工件一起旋转。 与周边相邻的导销可能有助于将工件与转子对准。 通过转子的出口允许气体流出转子。

公开(公告)号：US20070151844A1

公开(公告)日：2007-07-05

申请号：US11603940

申请日：2006-11-22

申请人： Gregory Wilson ,  Paul McHugh ,  Daniel Woodruff

发明人： Gregory Wilson ,  Paul McHugh ,  Daniel Woodruff

IPC分类号： C25B9/04

CPC分类号： C25D17/00 ,  C25D5/08 ,  C25D5/18 ,  C25D17/001 ,  C25D17/08 ,  C25D17/10

摘要： Reactors with agitators and methods for processing microfeature workpieces with such reactors. The agitators are capable of obtaining high, controlled mass-transfer rates that result in high quality surfaces and efficient wet chemical processes. The agitators generate high flow velocities in the fluid and contain the high energy fluid proximate to the surface of the workpiece to form high quality surfaces when cleaning, etching and/or depositing materials to/from a workpiece. The agitators also have short stroke lengths so that the footprints of the reactors are relatively small. As a result, the reactors are efficient and cost effective to operate. The agitators are also designed so that electrical fields in the processing solution can effectively operate at the surface of the workpiece.

摘要翻译： 具有搅拌器的反应器和用这种反应器处理微型工件的方法。 搅拌器能够获得高质量的质量传递速率，从而产生高品质的表面和有效的湿化学工艺。 搅拌器在流体中产生高流速并且在工件表面附近容纳高能量流体，以便当清洁，蚀刻和/或从工件沉积材料时形成高质量的表面。 搅拌器还具有短行程长度，使得反应器的足迹相对较小。 因此，反应堆的运行效率高，成本低。 搅拌器也被设计成使得处理溶液中的电场能够在工件的表面上有效地操作。

公开(公告)号：US20050155864A1

公开(公告)日：2005-07-21

申请号：US11081030

申请日：2005-03-10

申请人： Daniel Woodruff ,  Kyle Hanson ,  Steve Eudy ,  Curtis Weber ,  Randy Harris

发明人： Daniel Woodruff ,  Kyle Hanson ,  Steve Eudy ,  Curtis Weber ,  Randy Harris

IPC分类号： B23H7/26 ,  C25D3/00 ,  C25D5/00 ,  C25D7/12 ,  C25D17/00 ,  C25D21/00

CPC分类号： H01L21/6723 ,  C25D7/123 ,  C25D17/001 ,  C25D17/10 ,  H01L21/6719 ,  H01L21/67751

摘要： An electrochemical processing chamber which can be modified for treating different workpieces and methods for so modifying electrochemical processing chambers. In one particular embodiment, an electrochemical processing chamber 200 includes a plurality of walls 510 defining a plurality of electrode compartments 520, each electrode compartment having at least one electrode 600 therein, and a virtual electrode unit 530 defining a plurality of flow conduits, with at least one of the flow conduits being in fluid communication with each of the electrode compartments. This first virtual electrode unit 530 may be exchanged for a second virtual electrode unit 540, without modification of any of the electrodes 600, to adapt the processing chamber 200 for treating a different workpiece.

摘要翻译： 一种电化学处理室，可用于处理不同的工件和改性电化学处理室的方法。 在一个特定实施例中，电化学处理室200包括限定多个电极隔室520的多个壁510，每个电极室中具有至少一个电极600，以及限定多个流动管道的虚拟电极单元530， 至少一个流动管道与每个电极隔室流体连通。 第一虚拟电极单元530可以被替换为第二虚拟电极单元540，而不改变任何电极600，以使处理室200适应于处理不同的工件。

公开(公告)号：US06773559B2

公开(公告)日：2004-08-10

申请号：US09782216

申请日：2001-02-13

申请人： Daniel Woodruff ,  Steve Eudy ,  James Erickson ,  Thomas Oberlitner ,  Matthew Egloff

发明人： Daniel Woodruff ,  Steve Eudy ,  James Erickson ,  Thomas Oberlitner ,  Matthew Egloff

IPC分类号： C25D1700

CPC分类号： H01L21/67086 ,  C25D5/08 ,  C25D7/123 ,  C25D17/001 ,  C25D17/007 ,  C25D21/10 ,  H01L21/67005 ,  H01L21/67023 ,  H01L21/67057 ,  H01L21/6723

摘要： Although there are several inventions disclosed herein, the present application is directed to a reactor for electrochemically processing a microelectronic workpiece. The reactor comprises a movable electrode assembly that is disposed for movement along a motion path. The motion path includes at least a portion thereof over which the electrode assembly is positioned for processing at least one surface of the microelectronic workpiece. A cleaning electrode is located along the motion path of the movable electrode assembly. In one embodiment, a programmable controller is connected to direct the movable electrode assembly to move to the cleaning electrode during a cleaning cycle. At that time, the programmable controller connects the movable electrode assembly as an anode and the cleaning electrode as a cathode for cleaning of the movable electrode assembly. The cleaning electrode may be disposed along a position of the motion path that is beyond the range of motion required to process the microelectronic workpiece so that the programmable controller may be programmed to conduct a cleaning cycle while a microelectronic workpiece is present in the reactor for processing.

摘要翻译： 虽然本文公开了几个发明，但是本申请涉及用于电化学处理微电子工件的反应器。 反应器包括可移动电极组件，其被设置为沿着运动路径移动。 运动路径至少包括一部分，电极组件定位在该部分上用于处理微电子工件的至少一个表面。 沿着可动电极组件的运动路径设置清洁电极。 在一个实施例中，连接可编程控制器以在清洁循环期间引导可移动电极组件移动到清洁电极。 此时，可编程控制器将作为阳极的可动电极组件和作为用于清洁可动电极组件的阴极的清洁电极连接起来。 清洁电极可以沿着运动路径的位置设置，该位置超出处理微电子工件所需的运动范围，使得可编程控制器可以被编程以在微电子工件存在于反应器中进行清洁循环以进行处理 。

公开(公告)号：US20070110895A1

公开(公告)日：2007-05-17

申请号：US11619515

申请日：2007-01-03

申请人： Jason Rye ,  Daniel Woodruff ,  Dana Scranton

发明人： Jason Rye ,  Daniel Woodruff ,  Dana Scranton

IPC分类号： B05C11/02 ,  B05D3/12 ,  C23C16/00 ,  B05B1/28

CPC分类号： H01L21/6723 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/68792

摘要： A centrifugal workpiece processor for processing semiconductor wafers and similar workpieces includes a head which holds and spins the workpiece. The head includes a rotor having a gas system. Gas is sprayed or jetted from inlets in the rotor to create a rotational gas flow. The rotational gas flow causes pressure conditions which hold the edges of a first side of the workpiece against contact pins on the rotor. The rotor and the workpiece rotate together. Guide pins adjacent to a perimeter may help to align the workpiece with the rotor. An angled surface helps to deflect spent process liquid away from the workpiece. The head is moveable into multiple different engagement positions with a bowl. Spray nozzles in the bowl spray a process liquid onto the second side of the workpiece, as the workpiece is spinning, to process the workpiece. A moving end point detector may be used to detect an end point of processing.

摘要翻译： 用于处理半导体晶片和类似工件的离心工件处理器包括保持和旋转工件的头部。 头包括具有气体系统的转子。 气体从转子中的入口喷射或喷射以产生旋转气流。 旋转气流引起压力条件，其保持工件的第一侧的边缘抵抗转子上的接触销。 转子和工件一起旋转。 与周边相邻的导销可能有助于将工件与转子对准。 有角度的表面有助于将废工艺液体偏离工件。 头部可以与碗一起移动到多个不同的接合位置。 当工件旋转时，碗中的喷嘴将工艺液体喷射到工件的第二面上，以处理工件。 可以使用移动端点检测器来检测处理的终点。