中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

20 records (took 0.026 seconds)

    OPTICAL SYSTEM AND METHOD FOR CORRECTING MASK DEFECTS USING THE SYSTEM
    11.
    发明申请
    OPTICAL SYSTEM AND METHOD FOR CORRECTING MASK DEFECTS USING THE SYSTEM 审中-公开

    公开(公告)号：US20190170991A1

    公开(公告)日：2019-06-06

    申请号：US16269771

    申请日：2019-02-07

    Applicant: Carl Zeiss SMT GmbH ,  Carl Zeiss SMS Ltd.

    Inventor： Markus Seesselberg ,  Vladimir Dmitriev ,  Joachim Welte ,  Uri Stern ,  Tomer Cohen ,  Erez Graitzer

    IPC: G02B21/00 ,  G03F1/72 ,  G02B21/24 ,  G02B21/36

    Abstract: The inventions concerns an optical system comprising a scanning unit, a first lens-element group comprising at least a first lens element, a focusing unit which is designed to focus beams onto a focus, wherein the focusing unit comprises a second lens-element group comprising at least a second lens element and an imaging lens. The imaging lens further comprises a pupil plane and a wavefront manipulator. The wavefront manipulator of the optical system is arranged in the pupil plane of the imaging lens or in a plane that is conjugate to the pupil plane of the imaging lens, or the scanning unit of the optical system is arranged in a plane that is conjugate to the pupil plane of the imaging lens and the wavefront manipulator is arranged upstream of the scanning unit in the light direction. The focus of the second lens-element group lies in the pupil plane of the imaging lens in all focal positions of the focusing unit.

    METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOIDING DAMAGE TO REAR-SIDE COATINGS
    13.
    发明公开
    METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOIDING DAMAGE TO REAR-SIDE COATINGS 审中-公开

    公开(公告)号：US20240280892A1

    公开(公告)日：2024-08-22

    申请号：US18443486

    申请日：2024-02-16

    Applicant: Carl Zeiss SMS Ltd.

    Inventor： Vladimir Dmitriev ,  Avi Cohen ,  Kujan Gorhad ,  Hani Zeidan

    IPC: G03F1/36 ,  G03F1/72 ,  G03F7/00

    CPC classification number: G03F1/36 ,  G03F1/72 ,  G03F7/70508

    Abstract: The present invention relates to a method for correcting placement errors in a photolithographic mask comprising a substrate and structures formed on the substrate, the method involving at least one local density change, preferably a plurality of local density changes, each of which defines a pixel, being introduced into the substrate by use of a laser beam in order to correct placement errors of the structures, wherein in an examination step, an incidence surface of the mask, via which the laser beam radiates into the substrate, is examined for contaminations and, in regions in which a contamination of the incidence surface has been ascertained in the examination step, no laser irradiation or a laser irradiation with at least one changed laser beam parameter takes place, the laser beam parameter(s) being changed such that no damage to the incidence surface or near-surface regions occurs in the case of an interaction between laser beam and contamination.

    METHOD AND APPARATUS FOR OPTIMIZING A DEFECT CORRECTION FOR AN OPTICAL ELEMENT USED IN A LITHOGRAPHIC PROCESS
    18.
    发明公开
    METHOD AND APPARATUS FOR OPTIMIZING A DEFECT CORRECTION FOR AN OPTICAL ELEMENT USED IN A LITHOGRAPHIC PROCESS 审中-公开

    公开(公告)号：US20230408911A1

    公开(公告)日：2023-12-21

    申请号：US18238730

    申请日：2023-08-28

    Applicant: Carl Zeiss SMS Ltd.

    Inventor： Vladimir Dmitriev

    IPC: G03F1/72 ,  G03F7/00 ,  G03F1/60

    CPC classification number: G03F1/72 ,  G03F1/60 ,  G03F7/0002

    Abstract: This invention refers to a method for optimizing a defect correction of an optical element used in a lithographic process which comprises the steps: (a) determining whether the optical element has at least one defect; (b) determining whether the optical element has at least one surface contour deformation; and (c) determining at least one pixel arrangement for writing into the optical element based on whether at least one defect has been determined and on whether at least one surface contour deformation has been determined, the at least one pixel arrangement correcting the at least one defect, the at least one surface contour deformation or both.

    METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER
    20.
    发明申请
    METHOD AND APPARATUS FOR GENERATING A PREDETERMINED THREE-DIMENSIONAL CONTOUR OF AN OPTICAL COMPONENT AND/OR A WAFER 审中-公开
    用于产生光学元件和/或波形的预定三维轮廓的方法和装置

    公开(公告)号：US20170010540A1

    公开(公告)日：2017-01-12

    申请号：US15272936

    申请日：2016-09-22

    Applicant: Carl Zeiss SMS Ltd. ,  Carl Zeiss SMT GmbH

    Inventor： Vladimir Dmitriev ,  Bernd Geh

    IPC: G03F7/20

    CPC classification number: G03F7/70283 ,  B82Y40/00 ,  G03F1/60 ,  G03F1/72 ,  G03F7/0002 ,  G03F7/70316 ,  G03F7/70591 ,  G21K1/062 ,  H01L22/12 ,  H01L22/20

    Abstract: A method for generating a predetermined three-dimensional contour of a component and/or a wafer comprises: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculating at least one three-dimensional arrangement of laser pulses having one or more parameter sets defining the laser pulses for correcting the determined existing deviation of the three-dimensional contour from the predetermined three-dimensional contour; and (c) applying the calculated at least one three-dimensional arrangement of laser pulses on the component and/or the wafer for generating the predetermined three-dimensional contour.

    Abstract translation: 用于产生部件和/或晶片的预定三维轮廓的方法包括：（a）确定部件和/或晶片的现有三维轮廓与预定三维轮廓的偏差; （b）计算具有一个或多个限定激光脉冲的参数集的激光脉冲的至少一个立体布置，用于将所确定的三维轮廓的现有偏差与预定的三维轮廓进行校正; 和（c）将所计算的激光脉冲的至少一个三维布置应用于所述部件和/或所述晶片以产生所述预定的三维轮廓。

Patent Agency Ranking