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    Modular reactor system with stirrer
    11.
    发明申请
    Modular reactor system with stirrer 审中-公开
    带搅拌器的模块式反应器系统

    公开(公告)号：US20050079109A1

    公开(公告)日：2005-04-14

    申请号：US10958012

    申请日：2004-10-04

    Applicant: Daniel Meier

    Inventor： Daniel Meier

    IPC: B01J3/03 ,  B01J19/00 ,  B01L3/00 ,  B01L9/00 ,  C40B60/14

    CPC classification number: B01L3/565 ,  B01J3/03 ,  B01J19/004 ,  B01J19/0046 ,  B01J2219/00011 ,  B01J2219/00065 ,  B01J2219/002 ,  B01J2219/00213 ,  B01J2219/0024 ,  B01J2219/0027 ,  B01J2219/00283 ,  B01J2219/00306 ,  B01J2219/00333 ,  B01J2219/00353 ,  B01J2219/00477 ,  B01J2219/00481 ,  B01J2219/00495 ,  B01J2219/00585 ,  B01J2219/00689 ,  B01J2219/00698 ,  B01L9/50 ,  C40B60/14 ,  Y10T292/202 ,  Y10T292/212

    Abstract: A modular reactor system comprises a backplane connected to a computer and a thermal control unit. The backplane includes a plurality of seats for releasably holding a plurality of modules. Each module holds a reactor vessel that may be used to conduct experiments. A plurality of laboratory instruments, such as motors, switches, sensors and pumps are included within the backplane and on the reactor modules. These laboratory instruments are utilized to perform work on the contents of the reactor vessels when the modules holding the reactor vessels are positioned in the backplane. A computer is connected to the backplane and controls the laboratory instruments within the backplane and on the reactor modules positioned within the backplane. A thermal control unit provides a thermal control fluid that is delivered to the reactors in the reactor modules when the modules are properly seated in the backplane.

    Abstract translation: 模块化反应堆系统包括连接到计算机和热控制单元的背板。 背板包括用于可释放地保持多个模块的多个座。 每个模块都装有可用于进行实验的反应堆容器。 多个实验室仪器，如电机，开关，传感器和泵都包含在背板和反应堆模块内。 当保持反应堆容器的模块位于背板中时，这些实验室仪器用于对反应堆容器的内容物进行工作。 计算机连接到背板，并控制底板内的实验室仪器和位于背板内的反应堆模块。 一个热控制单元提供一个热控制流体，当模块正确地安装在背板中时，该控制流体被传送到反应器模块中的反应器。

    Focus spot detection method and system
    12.
    发明授权
    Focus spot detection method and system 失效
    聚焦点检测方法和系统

    公开(公告)号：US5673208A

    公开(公告)日：1997-09-30

    申请号：US631306

    申请日：1996-04-11

    Applicant: Daniel Meier ,  Gregory King ,  Michael McMahon

    Inventor： Daniel Meier ,  Gregory King ,  Michael McMahon

    IPC: G01J1/42 ,  G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G01J1/20

    CPC classification number: G03F9/7092 ,  G01J1/4257 ,  G03F7/70641 ,  G03F9/70 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/14

    Abstract: A method and system for detecting focus spots. Data from a file created during stepper operation is extracted to get field coordinate position, leveling scheme, and tilt with respect to the x- and y-axes, and wafer height with respect to the focal plane for the multiple fields on the multiple wafers in a production batch. A delta value is calculated for the x- and y-axes tilt data which averages the tilt of each field with its surrounding fields. Delta values are placed in a 3-dimensional data structure linking neighboring fields and corresponding fields on subsequent wafers. Focus spots are detected by the repeated presence of data spikes over the sum of the arithmetic mean and some multiple of the standard deviation of the delta values.

    Abstract translation: 一种检测焦点的方法和系统。 提取在步进操作期间创建的文件的数据以获得相对于x轴和y轴的场坐标位置，调平方案和倾斜，以及相对于多个晶片上的多个场的焦平面的晶片高度 一批生产。 对于每个场与其周围场的倾斜平均的x轴和y轴倾斜数据，计算增量值。 Delta值被放置在连接相邻的场和后续晶片上的对应场的3维数据结构中。 通过在算术平均值和Δ值的标准偏差的总和之间重复存在数据尖峰来检测焦点。

    Nanoparticle-based etching of silicon surfaces
    13.
    发明授权
    Nanoparticle-based etching of silicon surfaces 有权
    硅表面的纳米粒子蚀刻

    公开(公告)号：US08075792B1

    公开(公告)日：2011-12-13

    申请号：US12053372

    申请日：2008-03-21

    Applicant: Howard Branz ,  Anna Duda ,  David S. Ginley ,  Vernon Yost ,  Daniel Meier ,  James S. Ward

    Inventor： Howard Branz ,  Anna Duda ,  David S. Ginley ,  Vernon Yost ,  Daniel Meier ,  James S. Ward

    IPC: C03C15/00

    CPC classification number: H01L31/02363 ,  Y02E10/50 ,  Y10T428/24917

    Abstract: A method (300) of texturing silicon surfaces (116) such to reduce reflectivity of a silicon wafer (110) for use in solar cells. The method (300) includes filling (330, 340) a vessel (122) with a volume of an etching solution (124) so as to cover the silicon surface 116) of a wafer or substrate (112). The etching solution (124) is made up of a catalytic nanomaterial (140) and an oxidant-etchant solution (146). The catalytic nanomaterial (140) may include gold or silver nanoparticles or noble metal nanoparticles, each of which may be a colloidal solution. The oxidant-etchant solution (146) includes an etching agent (142), such as hydrofluoric acid, and an oxidizing agent (144), such as hydrogen peroxide. Etching (350) is performed for a period of time including agitating or stirring the etching solution (124). The etch time may be selected such that the etched silicon surface (116) has a reflectivity of less than about 15 percent such as 1 to 10 percent in a 350 to 1000 nanometer wavelength range.

    Abstract translation: 一种使硅表面（116）纹理化以减少用于太阳能电池的硅晶片（110）的反射率的方法（300）。 方法（300）包括用一定体积的蚀刻溶液（124）填充（330,340）容器（122）以覆盖晶片或衬底（112）的硅表面116）。 蚀刻溶液（124）由催化纳米材料（140）和氧化剂 - 蚀刻剂溶液（146）组成。 催化纳米材料（140）可以包括金或银纳米颗粒或贵金属纳米颗粒，其各自可以是胶体溶液。 氧化剂 - 蚀刻剂溶液（146）包括诸如氢氟酸的蚀刻剂（142）和氧化剂（144），例如过氧化氢。 进行蚀刻（350）一段时间，包括搅拌或搅拌蚀刻液（124）。 可以选择蚀刻时间，使得蚀刻的硅表面（116）具有小于约15％的反射率，例如在350至1000纳米波长范围内的1至10％。

    Device for ejection of moulded pieces from a moulding tool
    15.
    发明授权
    Device for ejection of moulded pieces from a moulding tool 失效
    用于从成形工具中排出模制件的装置

    公开(公告)号：US07254979B2

    公开(公告)日：2007-08-14

    申请号：US10495026

    申请日：2002-11-19

    Applicant: Rudolf Lüthi ,  Daniel Meier

    Inventor： Rudolf Lüthi ,  Daniel Meier

    IPC: B21J13/14

    CPC classification number: B21D45/02

    Abstract: The invention relates to a so-called spring cushion (5), for the ejection of moulded pieces (4) from a moulding tool (3), with a plunger (6), moving in a guide tube (9) within the moulding tool and loaded in the ejection direction (14) by means of a spring (15). According to the invention, the spring (15) is embodied as a draw spring, in particular as a spiral draw spring. Considerably longer service life can be achieved as draw springs do not have radial deflections on loading.

    Abstract translation: 本发明涉及一种所谓的弹簧缓冲垫（5），用于将模制件（4）从模制工具（3）与柱塞（6）一起排出，在模具中的导管（9）内移动 并通过弹簧（15）装载在排出方向（14）上。 根据本发明，弹簧（15）被实施为拉伸弹簧，特别是作为螺旋拉伸弹簧。 拉伸弹簧在加载时不具有径向偏转，可以实现更长的使用寿命。

    Focus spot detection method and system
    16.
    发明授权
    Focus spot detection method and system 失效
    聚焦点检测方法和系统

    公开(公告)号：US5884242A

    公开(公告)日：1999-03-16

    申请号：US895620

    申请日：1997-07-17

    Applicant: Daniel Meier ,  Gregory King ,  Michael McMahon

    Inventor： Daniel Meier ,  Gregory King ,  Michael McMahon

    IPC: G01J1/42 ,  G03F7/20 ,  G03F9/00 ,  G01N21/01

    CPC classification number: G03F9/7092 ,  G01J1/4257 ,  G03F7/70641 ,  G03F9/70 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/14

    Abstract: A method and system for detecting focus spots. Data from a file created during stepper operation is extracted to get field coordinate position, leveling scheme, and tilt with respect to the x- and y-axes, and wafer height with respect to the focal plane for the multiple fields on the multiple wafers in a production batch. A delta value is calculated for the x- and y-axes tilt data which averages the tilt of each field with its surrounding fields. Delta values are placed in a 3-dimensional data structure linking neighboring fields and corresponding fields on subsequent wafers. Focus spots are detected by the repeated presence of data spikes over the sum of the arithmetic mean and some multiple of the standard deviation of the delta values.

    Abstract translation: 一种检测焦点的方法和系统。 提取在步进操作期间创建的文件的数据以获得相对于x轴和y轴的场坐标位置，调平方案和倾斜，以及相对于多个晶片上的多个场的焦平面的晶片高度 一批生产。 对于每个场与其周围场的倾斜平均的x轴和y轴倾斜数据，计算增量值。 Delta值被放置在连接相邻的场和后续晶片上的对应场的3维数据结构中。 通过在算术平均值和Δ值的标准偏差的总和之间重复存在数据尖峰来检测焦点。

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