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公开(公告)号：US06261743B1
公开(公告)日：2001-07-17
申请号：US09058343
申请日：1998-04-10
IPC分类号： G03F730
CPC分类号： C08J9/26 , C08J2201/046 , C08J2383/04 , G03F7/091 , G03F7/095 , H01B3/46 , H01L21/02118 , H01L21/02282 , H01L21/31695 , Y10S430/127 , Y10S430/128
摘要： The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
摘要翻译： 本发明提供了适合用作抗反射组合物的新的光吸收交联组合物，特别是用于深UV应用。 本发明的抗反射组合物包含在外涂光致抗蚀剂曝光期间被活化的光酸产生剂。 本发明的抗反射组合物可以显着减少外涂防腐剂图像的不期望的基础。
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公开(公告)号：US20090220888A1
公开(公告)日：2009-09-03
申请号：US12316578
申请日：2008-12-12
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
IPC分类号： G03F7/004
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
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13.发明授权公开(公告)号：US07632630B2
公开(公告)日：2009-12-15
申请号：US11418520
申请日：2006-05-03
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
摘要翻译： 本发明提供了新的光致抗蚀剂组合物，其包含树脂粘合剂，光活性组分，特别是酸发生剂，以及含有一种或多种可以减少曝光辐射的不希望的反射的发色团的染料。 优选的染料化合物是包括一种或多种发色团，例如蒽和其它有效吸收深紫外线照射辐射的多环部分的聚合材料。
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公开(公告)号：US06887648B2
公开(公告)日：2005-05-03
申请号：US10858584
申请日：2004-06-02
CPC分类号： G03F7/091 , Y10S430/122
摘要： Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
摘要翻译： 提供了含有离子热酸发生剂材料的抗反射组合物。 使用这种热酸产生剂材料可显着增加抗反射组合物在质子介质中的溶液的保质期。 本发明的抗反射组合物可以在用于暴露包括248nm和193nm的外涂光致抗蚀剂层的各种波长下有效地使用。
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公开(公告)号：US06749765B2
公开(公告)日：2004-06-15
申请号：US10108070
申请日：2002-03-27
IPC分类号： H01L2100
CPC分类号： H01L21/02118 , H01L21/31051 , H01L21/312 , H01L21/76808 , H05K3/0076 , H05K3/0094 , H05K3/064 , Y10S428/901 , Y10T428/24322 , Y10T428/24339 , Y10T428/24521 , Y10T428/31942
摘要： Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.
摘要翻译： 公开了用于在电子设备的制造中提供基本平坦化的表面的组合物和方法。 还公开了用于在电子设备的制造中保护孔的组合物和方法。
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公开(公告)号：US06461717B1
公开(公告)日：2002-10-08
申请号：US09556542
申请日：2000-04-24
IPC分类号： B32B324
CPC分类号： H01L21/02118 , H01L21/31051 , H01L21/312 , H01L21/76808 , H05K3/0076 , H05K3/0094 , H05K3/064 , Y10S428/901 , Y10T428/24322 , Y10T428/24339 , Y10T428/24521 , Y10T428/31942
摘要： Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.
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公开(公告)号：US07018717B2
公开(公告)日：2006-03-28
申请号：US10457258
申请日：2003-06-09
申请人： Edward K. Pavelchek
发明人： Edward K. Pavelchek
IPC分类号： B32B25/20
CPC分类号： G03F7/091 , Y10T428/31663
摘要： New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
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公开(公告)号：US06890448B2
公开(公告)日：2005-05-10
申请号：US09330417
申请日：1999-06-11
申请人： Edward K. Pavelchek
发明人： Edward K. Pavelchek
IPC分类号： H01L21/302 , G03F7/09 , H01L21/027 , H01L21/3065 , H01B13/00
CPC分类号： G03F7/091 , Y10T428/31663
摘要： New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
摘要翻译： 提供了新的基于有机的辐射吸收组合物，其适合用作外涂光致抗蚀剂的抗反射涂料组合物（“ARC”）。 通过从底涂层的介电层中选择性地显示足够的等离子体蚀刻，这些组合物还有效地用作硬掩模层。
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公开(公告)号：US5366852A
公开(公告)日：1994-11-22
申请号：US948022
申请日：1992-09-21
摘要： The present invention comprises methods for treating photoresists and forming photoresist relief images, including a method comprising providing a photoresist coating having a crosslinked surface layer, treating the photoresist coating with an organometallic material, and developing the photoresist coating to provide a relief image comprising an etch resistant effective amount of organometallic material.
摘要翻译： 本发明包括用于处理光致抗蚀剂和形成光致抗蚀剂浮雕图像的方法，包括提供具有交联表面层的光致抗蚀剂涂层，用有机金属材料处理光致抗蚀剂涂层并显影光致抗蚀剂涂层以提供包括蚀刻 有效量的有机金属材料。
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公开(公告)号：US08142988B2
公开(公告)日：2012-03-27
申请号：US11385012
申请日：2006-03-20
IPC分类号： G03F7/30
CPC分类号： G03F7/091 , Y10T428/31786
摘要： Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other migration crosslinker from the composition coating layer during lithographic processing.
摘要翻译： 提供了有机涂料组合物，包括抗反射涂料组合物，其可以减少从衬底暴露辐射的反射回到外涂光致抗蚀剂层和/或作为平坦化或通孔填充层的功能。 本发明的优选组合物包括在光刻加工期间从组合物涂层中含有对升华或其它迁移交联剂具有抗性的交联剂组分。
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