公开(公告)号：US4965630A

公开(公告)日：1990-10-23

申请号：US451166

申请日：1989-12-15

申请人： Kinya Kato ,  Kazuo Ushida ,  Toshiyuki Namikawa ,  Koichi Matsumoto ,  Kyoichi Suwa ,  Koichi Ohno

发明人： Kinya Kato ,  Kazuo Ushida ,  Toshiyuki Namikawa ,  Koichi Matsumoto ,  Kyoichi Suwa ,  Koichi Ohno

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70241

摘要： The present invention provides a projection exposure apparatus comprising: a reticle stage; an illumination optical system for illuminating a reticle on the reticle stage; a stage on which a substrate is supported; and a projection optical system having a predetermined numerical aperture to project a pattern formed on the reticle and illuminated by the illumination optical system onto the substrate, and in which a longitudinal spherial aberration thereof regarding the focusing of the pattern formed on the reticle onto the substrate are excessively corrected.

摘要翻译： 本发明提供一种投影曝光装置，包括：标线片台; 照明光学系统，用于照亮标线片台上的掩模版; 支撑衬底的阶段; 以及具有预定数值孔径的投影光学系统，以将形成在标线上的图案投影并由照明光学系统照射到基板上，并且其中将关于在掩模版上形成的图案聚焦到基板上的纵向球面像差 被过度纠正。

公开(公告)号：US4918504A

公开(公告)日：1990-04-17

申请号：US222844

申请日：1988-07-22

申请人： Kinya Kato ,  Nobuhiko Kakuda ,  Noboru Naito ,  Tsutomu Wada

发明人： Kinya Kato ,  Nobuhiko Kakuda ,  Noboru Naito ,  Tsutomu Wada

IPC分类号： G02F1/1362 ,  G02F1/1368 ,  H01L21/77 ,  H01L21/84 ,  H01L27/12

CPC分类号： G02F1/1368 ,  H01L27/1214 ,  G02F2001/136263 ,  G02F2001/13629

摘要： An active matrix cell includes a first conductor group formed on a transparent substrate, two-layered regions consisting of a semiconductor film and a first insulating film, a second insulating film and a second conductor group. The first conductor group forms the source and drain of a thin film transistor, pixel electrode, data line. One of the two-layered regions serves as an active region of the thin film transistor and the other of the two-layered regions serves as the intersection between the data and scanning lines. The second insulating film is buried in the gap between the two-layered regions and the first conductor group, and has substantially a same thickness as the two-layered regions. The second conductor group forms the scanning line and the part of the data line. A method of manufacturing the active matrix cell is also disclosed.

公开(公告)号：US4769551A

公开(公告)日：1988-09-06

申请号：US66241

申请日：1987-06-25

申请人： Muneki Hamashima ,  Kinya Kato ,  Tatsumi Ishizeki ,  Kou Sekiba ,  Hiroaki Iseya

发明人： Muneki Hamashima ,  Kinya Kato ,  Tatsumi Ishizeki ,  Kou Sekiba ,  Hiroaki Iseya

IPC分类号： G03F7/20 ,  G01N21/86

CPC分类号： G03F7/70616 ,  G03F7/70358

摘要： Pattern detection and measurement comprises: first irradiation means for irradiating a workpiece with a first energy beam; detection means for receiving a second energy beam emitted from a portion of the workpiece irradiated by the first energy beam, thereby detecting a pattern in the irradiated portion; second irradiation means for irradiating the workpiece with a third energy beam; discrimination means for receiving a fourth energy beam emitted from a portion of the workpiece irradiated by the third energy beam, thereby discriminating whether the portion irradiated by the third energy beam is sensitive to the first energy beam; and control means for controlling, in response to the output of the discrimination means, the first energy beam in irradiating the sensitive portion, thereby preventing the damage of the sensitive portion by the first energy beam.

摘要翻译： 图案检测和测量包括：用第一能量束照射工件的第一照射装置; 检测装置，用于接收从由第一能量束照射的工件的一部分发射的第二能量束，从而检测照射部分中的图案; 第二照射装置，用于用第三能量束照射所述工件; 用于接收从由第三能量束照射的工件的一部分发射的第四能量束的识别装置，从而判断由第三能量束照射的部分是否对第一能量束敏感; 以及控制装置，用于响应于识别装置的输出，控制第一能量束照射敏感部分，从而防止敏感部分被第一能量束损坏。

公开(公告)号：US4739158A

公开(公告)日：1988-04-19

申请号：US909211

申请日：1986-09-19

申请人： Kinya Kato

发明人： Kinya Kato

IPC分类号： G01B11/00 ,  G01B11/02 ,  G03F7/20 ,  G01J1/20

CPC分类号： G03F7/70616 ,  G01B11/028

摘要： Apparatus for detecting the edge of a pattern on an object surface is disclosed. The apparatus includes a light source for emitting a collimated light beam, a condensing optical system for forming an elongated light spot of the collimated light beam on the object surface, an image-forming optical system for forming an image of the elongated light spot by focusing the reflected light from the object surface, a detector for forming an output signal corresponding to the reflected light from the spot image, an image rotator and a driving member. The elongated light spot is formed by means of slit. The direction of the slit is changed by the driving member to change the direction of the elongated light spot on the object surface. The driving member also drives the image rotator so as to keep the direction of the reflected spot image unchanged irrespective of the change of the direction of the slit.

摘要翻译： 公开了一种用于检测物体表面上的图案的边缘的装置。 该装置包括用于发射准直光束的光源，用于在物体表面上形成准直光束的细长光斑的聚光光学系统，用于通过聚焦形成细长光斑图像的图像形成光学系统 来自物体表面的反射光，用于形成与来自光斑图像的反射光对应的输出信号的检测器，图像旋转器和驱动部件。 细长的光点通过狭缝形成。 狭缝的方向由驱动构件改变，以改变物体表面上的细长光斑的方向。 驱动构件还驱动图像旋转器，以便保持反射光斑图像的方向不变，而与狭缝方向的变化无关。

公开(公告)号：US07372543B2

公开(公告)日：2008-05-13

申请号：US11471658

申请日：2006-06-21

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/32 ,  G03B27/54 ,  G03B27/44

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

公开(公告)号：US07336244B2

公开(公告)日：2008-02-26

申请号：US10782979

申请日：2004-02-23

申请人： Shiro Suyama ,  Munekazu Date ,  Shigeto Kohda ,  Kinya Kato ,  Shigenobu Sakai

发明人： Shiro Suyama ,  Munekazu Date ,  Shigeto Kohda ,  Kinya Kato ,  Shigenobu Sakai

IPC分类号： G09G5/00

CPC分类号： G02F1/1333 ,  G02B27/2271 ,  G02B27/2278 ,  G02F1/1392 ,  G02F1/29 ,  G02F2001/294 ,  H04N13/161 ,  H04N13/189 ,  H04N13/239 ,  H04N13/305 ,  H04N13/32 ,  H04N13/322 ,  H04N13/324 ,  H04N13/341 ,  H04N13/344 ,  H04N13/395 ,  H04N13/398

摘要： An optical device includes a transparent material layer having a desired curved surface configuration, a layer including a variable refractive index material having a dielectric constant anisotropy, at least two transparent electrodes arranged to sandwich the transparent material layer and the variable refractive index material, and a driving device supplying a voltage including driving frequencies f1 and f2 between the transparent electrodes. The difference Δ∈ in the dielectric constant of the variable refractive index material due to the anisotropy is positive at one of the driving frequencies and negative at the other driving frequency.

摘要翻译： 光学装置包括具有期望的曲面构造的透明材料层，包括具有介电常数各向异性的可变折射率材料的层，至少两个布置成夹持透明材料层和可变折射率材料的透明电极，以及 在透明电极之间提供包括驱动频率f 1和f 2的电压的驱动装置。 由于各向异性引起的可变折射率材料的介电常数差ΔΔε在驱动频率的一个为正，另一个驱动频率为负。

公开(公告)号：US20070204655A1

公开(公告)日：2007-09-06

申请号：US11712134

申请日：2007-02-28

申请人： Kinya Kato

发明人： Kinya Kato

IPC分类号： C03B23/00 ,  C03B23/04 ,  C03B29/00

CPC分类号： C03B11/08 ,  C03B2215/80

摘要： A pair of upper die and lower die having forming surfaces corresponding to optical glass elements are prepared. A locating member having a plurality of locating holes for locating preforms is arranged on the lower die. A plurality of preforms are supplied to the locating holes, respectively, and the preforms are hot-press-molded between the paired upper die and lower die. According to this method, since a plurality of optical glass elements can be formed simultaneously, the high-precision optical glass elements can be manufactured at low cost.

摘要翻译： 准备具有对应于光学玻璃元件的成形表面的一对上模和下模。 具有用于定位预成型件的多个定位孔的定位构件设置在下模上。 将多个预成型件分别供应到定位孔，并且将预成型件热压成型在成对的上模和下模之间。 根据该方法，由于可以同时形成多个光学玻璃元件，所以可以以低成本制造高精度光学玻璃元件。

公开(公告)号：US07108837B2

公开(公告)日：2006-09-19

申请号：US10290357

申请日：2002-11-08

申请人： Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

发明人： Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

IPC分类号： B01J19/08

CPC分类号： C02F1/20 ,  B01D53/007 ,  B01D2257/2064 ,  B09C1/005 ,  B09C1/08 ,  C02F1/32 ,  C02F2101/36 ,  C02F2101/363 ,  C02F2103/06

摘要： A polluted soil remediation apparatus comprising a treatment tank in which pollutants degradable with light irradiation in the presence of chlorine is extracted as a gas containing the pollutants from polluted soil and a mixture of the gas containing the pollutants and chlorine-containing air is irradiated with light to degrade the pollutants, wherein the apparatus comprises a unit for aspirating the gas containing the pollutants from the polluted soil, a chlorine-containing air generation unit for generating the chlorine-containing gas, a mixing unit for mixing the gas containing the pollutants extracted by the aspiration unit and the chorine-containing air generated by the chlorine-containing gas generation unit to form a mixed gas, the treatment tank comprising a treatment region where the mixed gas is introduced and a light irradiation unit for irradiating the treatment region with light to degrade the pollutants contained in the mixed gas, and an exhaust unit for exhausting the degradation-treated gas from the treatment region of the treatment tank.

公开(公告)号：US06795169B2

公开(公告)日：2004-09-21

申请号：US10382874

申请日：2003-03-07

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B2742

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.

摘要翻译： 一种具有多个投影光学系统的曝光装置，其中每个投影光学系统将预定图案投影到基板上并在基板上形成曝光场。 曝光装置还包括保持基板并沿至少沿直线延伸的扫描方向移动的基板台。 多个曝光区域沿着与扫描方向交叉的方向排列，并且投影光学系统和基板沿着扫描方向在图案投影操作期间相对移动。

公开(公告)号：US06765217B1

公开(公告)日：2004-07-20

申请号：US09302075

申请日：1999-04-28

申请人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

发明人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

IPC分类号： G01N2100

CPC分类号： H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective optical system and the E×B in a different direction to a detector via an imaging optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

摘要翻译： 公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。 在典型的系统中，照射光束从光源发射，通过照射光学系统，并进入维恩滤光片（“ExB”）。 当通过ExB时，照射光束通过物镜光学系统并入射到物体表面上。 这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。 理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该距离稳定。