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    Extreme ultraviolet light generation system
    12.
    发明授权
    Extreme ultraviolet light generation system 有权

    公开(公告)号：US10555408B2

    公开(公告)日：2020-02-04

    申请号：US15956983

    申请日：2018-04-19

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya Yanagida ,  Osamu Wakabayashi

    IPC: H05G2/00 ,  H01S3/107 ,  H01S3/223 ,  H01S3/06 ,  H01S3/11 ,  H01S3/08 ,  H01S3/23 ,  H01S3/16 ,  H01S3/00

    Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

    Extreme ultraviolet light source apparatus
    15.
    发明授权
    Extreme ultraviolet light source apparatus 有权
    极紫外光源设备

    公开(公告)号：US08841641B2

    公开(公告)日：2014-09-23

    申请号：US13903811

    申请日：2013-05-28

    Applicant: Gigaphoton Inc.

    Inventor： Kouji Kakizaki ,  Shinji Nagai ,  Tatsuya Yanagida

    IPC: G01N21/33 ,  G21K5/02 ,  H05H1/00

    CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

    Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

    Abstract translation: 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。

    Extreme ultraviolet light generating apparatus using differing laser beam diameters
    16.
    发明授权
    Extreme ultraviolet light generating apparatus using differing laser beam diameters 有权

    公开(公告)号：US10582601B2

    公开(公告)日：2020-03-03

    申请号：US15972590

    申请日：2018-05-07

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya Yanagida

    IPC: H05G2/00 ,  G03F7/20

    Abstract: An extreme ultraviolet light generating apparatus includes a target supply unit configured to output a target toward a predetermined region, a laser system configured to output a first laser beam with which the target is irradiated, a second laser beam with which the target is irradiated after being irradiated with the first laser beam, and a third laser beam with which the target is irradiated after being irradiated with the second laser beam, and an optical system configured to cause an irradiation beam diameter of the second laser beam at the target to be larger than an irradiation beam diameter of the third laser beam at the target.

    Extreme ultraviolet light generation apparatus
    17.
    发明授权
    Extreme ultraviolet light generation apparatus 有权

    公开(公告)号：US09986629B2

    公开(公告)日：2018-05-29

    申请号：US15017000

    申请日：2016-02-05

    Applicant: Gigaphoton Inc.

    Inventor： Toru Suzuki ,  Tamotsu Abe ,  Osamu Wakabayashi ,  Tatsuya Yanagida

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

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