公开(公告)号：US07282711B2

公开(公告)日：2007-10-16

申请号：US10491939

申请日：2002-10-04

Applicant: Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

Inventor： Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

IPC: H01J37/21

CPC classification number: H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/216 ,  H01J2237/2446 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3045

Abstract: The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.

Abstract translation: 本发明提供了用于用具有电子束源阵列（3）的一次电子束（14）探测或构造非透明样品（20）以产生多个一次电子束（14）的电子多光束装置（1）， 电子传感器（12），其具有用于检测一次电子束（14）的电子和至少一个阳极（7）的电子传感器段（12a），以将一次电子束（14）引向电子传感器（12）。 电子传感器（12）用于检查一次电子束（14），校准一次电子束（14）的位置，并可能在探测之前或之后校准一次电子束的最终聚焦长度（13）和电流 构造不透明样品（20）的上表面（20a）。 此外，提供了检查一次电子束（14），调整最终聚焦长度（13）和校准多个电子束装置（1）的方法。

公开(公告)号：US07800075B2

公开(公告)日：2010-09-21

申请号：US12194220

申请日：2008-08-19

Applicant: Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.

Abstract translation: 用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。 上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。 可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

公开(公告)号：US20080308751A1

公开(公告)日：2008-12-18

申请号：US12194220

申请日：2008-08-19

Applicant: Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

IPC: A61N5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.

Abstract translation: 用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。 上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。 可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

公开(公告)号：US20080258060A1

公开(公告)日：2008-10-23

申请号：US11923407

申请日：2007-10-24

Applicant: JUERGEN FROSIEN ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

Inventor： JUERGEN FROSIEN ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

IPC: G01N23/00

CPC classification number: H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/2448 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

Abstract translation: 提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。 偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。 检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。

公开(公告)号：US07427765B2

公开(公告)日：2008-09-23

申请号：US11243363

申请日：2005-10-03

Applicant: Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William J. DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard L. Lozes ,  Henry Thomas Pearce-Percy ,  Dieter Winkler ,  Steven T. Coyle ,  Helmut Banzhof

IPC: A61N5/00 ,  G21G5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.

Abstract translation: 电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。 在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是一半 在写平面处电子束对着的角度。 光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。 还描述了用于电子束柱的多功能模块。

公开(公告)号：US20080185514A1

公开(公告)日：2008-08-07

申请号：US11925598

申请日：2007-10-26

Applicant: JUERGEN FROSIEN ,  Helmut Banzhof

Inventor： JUERGEN FROSIEN ,  Helmut Banzhof

IPC: B01D59/44

CPC classification number: H01J49/288 ,  H01J37/05 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/0805 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

Abstract translation: 描述了离子束装置。 离子束装置包括用于产生离子束的离子束源，沿着第一轴发射的离子束，适于使离子束成形的孔单元，以及适于使离子束的离子偏转的消色差偏转单元， 预定质量的偏转角。 无彩色偏转单元包括：用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。 该装置还包括质量分离孔，其适于阻挡具有不同于预定质量的质量的离子，并允许具有预定质量的离子侵入质量分离器，以及具有第二光轴的物镜，其中第二光轴为 相对于第一轴倾斜。

公开(公告)号：US20070085033A1

公开(公告)日：2007-04-19

申请号：US11243363

申请日：2005-10-03

Applicant: Benyamin Buller ,  William DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler ,  Steven Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler ,  Steven Coyle ,  Helmut Banzhof

IPC: G21G5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is the half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.

Abstract translation: 电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。 在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是半 在写平面处电子束对着的角度。 光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。 还描述了用于电子束柱的多功能模块。