公开(公告)号：US4165930A

公开(公告)日：1979-08-28

申请号：US830036

申请日：1977-09-02

申请人： Kazuya Matsumoto ,  Susumu Matsumura ,  Noriyuki Nose ,  Youichi Okuno

发明人： Kazuya Matsumoto ,  Susumu Matsumura ,  Noriyuki Nose ,  Youichi Okuno

IPC分类号： G03B17/20 ,  G03H1/00 ,  G03H1/04 ,  G03H1/22

CPC分类号： G03H1/22 ,  G03H1/0248 ,  G03H1/0406 ,  G03H1/0408 ,  G03H1/2249 ,  G03H1/265 ,  G03H2001/221 ,  G03H2001/2231 ,  G03H2001/2234 ,  G03H2001/2284 ,  G03H2001/2615 ,  G03H2210/20 ,  G03H2222/34 ,  G03H2227/02 ,  G03H2240/11

摘要： A camera having a holographic indicator in which a reconstructed image of hologram and an image of an object formed by an image forming optical system are formed on the same plane, so that the reconstructed image and the object's image can be observed at the same diopter through a common observation optical system.

摘要翻译： 具有全息指示器的照相机，其中在同一平面上形成全息图的重建图像和由图像形成光学系统形成的物体的图像，使得可以以相同的屈光度来观察重建图像和物体的图像 常见的观察光学系统。

公开(公告)号：US5459573A

公开(公告)日：1995-10-17

申请号：US291747

申请日：1994-08-17

申请人： Naoto Abe ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Noriyuki Nose

发明人： Naoto Abe ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G01D5/26 ,  G03F9/00 ,  H01L21/68 ,  H01L31/12 ,  H01L33/00 ,  H01S5/06 ,  H01S5/062 ,  H01S5/0683 ,  G01N21/86

CPC分类号： G03F9/7088 ,  G03F9/7049 ,  H01L21/68 ,  H01L21/682 ,  H01S5/06835 ,  H01S5/06216

摘要： A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.

摘要翻译： 一种可用于对准掩模和半导体晶片的位置检测装置，其中由半导体激光器产生的激光束通过预定的光学系统投射到形成在掩模和晶片上的对准标记，并且由标记反射的光被 用于产生电信号的累积型传感器，根据电信号检测掩模和晶片之间的相对位置关系。 为了获得适当的标记信号，控制入射在累积传感器上的光量。 在该装置中，半导体激光器的发射光强度保持恒定，并且通过控制半导体激光器的工作周期来控制入射到积聚传感器上的光量。 此外，半导体激光器的激活定时从累积型传感器的累积开始到半导体激光器在其致动之后被热稳定所需的时间前进。 由积累传感器产生的标记检测信号是精确的。

公开(公告)号：US5262257A

公开(公告)日：1993-11-16

申请号：US3867

申请日：1993-01-11

申请人： Yasuaki Fukuda ,  Noriyuki Nose

发明人： Yasuaki Fukuda ,  Noriyuki Nose

IPC分类号： G03F1/22 ,  G03F9/00

CPC分类号： G03F1/22 ,  G03F9/70

摘要： A mask structure according to an aspect of the invention includes a base having a first zone for an alignment pattern and a second zone for a circuit pattern; an alignment pattern forming material with which the alignment pattern is formed in the first zone; and a circuit pattern forming material with which the circuit pattern is formed in the second zone; wherein the alignment pattern forming material and the circuit pattern forming material are different from each other.

摘要翻译： 根据本发明的一个方面的掩模结构包括具有用于对准图案的第一区域和用于电路图案的第二区域的底座; 对准图案形成材料，其中在所述第一区域中形成所述对准图案; 以及在所述第二区域中形成所述电路图案的电路图案形成材料; 其中所述对准图案形成材料和所述电路图案形成材料彼此不同。

公开(公告)号：US5182615A

公开(公告)日：1993-01-26

申请号：US563420

申请日：1990-08-07

申请人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

发明人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70691 ,  G03F9/7049

摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

公开(公告)号：US5148038A

公开(公告)日：1992-09-15

申请号：US804514

申请日：1991-12-10

申请人： Noriyuki Nose ,  Naoto Abe

发明人： Noriyuki Nose ,  Naoto Abe

IPC分类号： G03F9/00

CPC分类号： G03F9/7076 ,  G03F9/7023

摘要： A device for detecting a positional relationship between opposed first and second objects. The device includes a light source for projecting light to the first and second objects; a photodetecting system for detecting two lights from one of the first and second objects illuminated by the light from the light source, the photodetecting system detecting those two lights the position of incidence of each of which on a predetermined plane is changeable with the positional relationship between the first and second objects in a direction perpendicular to the direction in which the first and second objects are opposed; a position detecting system for detecting the positional relationship between the first and second objects in a direction perpendicular to the opposing direction of the first and second objects, on the basis of the relationship of the two lights, on the predetermined plane, as detected by the photodetecting system; and an interval detecting system for detecting the positional relationship between the first and second objects in the opposing direction, by using at least one of the two lights detected by the photodetecting system.

公开(公告)号：US5033856A

公开(公告)日：1991-07-23

申请号：US517514

申请日：1990-04-30

申请人： Noriyuki Nose ,  Yukichi Niwa

发明人： Noriyuki Nose ,  Yukichi Niwa

IPC分类号： G01B11/24

CPC分类号： G01B11/24

摘要： A three-dimensional shape measuring apparatus having a high performance and a reduced drive energy is disclosed. At least a portion of an in-focus state detection optical system having an internal light source is movable while maintaining a light path near an object lens of the optical system. A distance of movement of the movable portion which is moved with auto-focusing operation for an object is measured and the three-dimensional shape is measured precisely with a high stroke. An inclination angle measuring optical system which shares the light path near the object lens with the in-focus state detection optical system and has an internal light source is provided in a common casing. Thus, the distance of movement of the movable part of the in-focus state detection optical system and an inclination angle are simultaneously measured so that the three-dimensional shape can be more precisely measured.

摘要翻译： 公开了具有高性能和降低的驱动能量的三维形状测量装置。 具有内部光源的聚焦状态检测光学系统的至少一部分可移动，同时保持靠近光学系统的物镜的光路。 测量用于物体的自动聚焦操作移动的可移动部分的移动距离，并且以高冲程精确地测量三维形状。 在共同的壳体内设置倾斜角度测量光学系统，该倾斜角度测量光学系统与聚焦状态检测光学系统共享物镜附近的光路并具有内部光源。 因此，可以同时测量对焦状态检测光学系统的可动部分的移动距离和倾斜角度，从而可以更精确地测量三维形状。

公开(公告)号：US4783153A

公开(公告)日：1988-11-08

申请号：US942791

申请日：1986-12-17

申请人： Nobuo Kushibiki ,  Noriyuki Nose ,  Takeshi Baba ,  Toshiyuki Nakajima ,  Masahiro Okuda

发明人： Nobuo Kushibiki ,  Noriyuki Nose ,  Takeshi Baba ,  Toshiyuki Nakajima ,  Masahiro Okuda

IPC分类号： G02B3/00 ,  G02B1/00 ,  G02B3/12 ,  G02B3/14 ,  G02B26/08 ,  G02B1/06 ,  G02B15/00

CPC分类号： G02B1/00 ,  G02B26/0875 ,  G02B3/14

摘要： A variable-focus optical device comprises an elastomeric member having a gradient of shear modulus along its optical axis, and a deforming member having an aperture adapted for causing projection or sinking of the elastomeric member therethrough or thereat to deform the surface of the elastomeric member. The gradient of shear modulus is preferably one of continuously decreasing from the surface toward the inside of the elastomeric member. The gradient of shear modulus is provided by a concentration gradient of an inorganic substance such as silica dispersed in an elastomeric substance such as polysilioxane.

摘要翻译： 可变焦光学装置包括具有沿其光轴的剪切模量梯度的弹性体构件，以及具有孔的变形构件，其适于使弹性构件穿过其中或在其上突出或下沉以使弹性体构件的表面变形。 剪切模量的梯度优选是从弹性体构件的表面向内部连续减小的梯度。 剪切模量的梯度由分散在诸如聚硅氧烷的弹性体物质中的无机物质如二氧化硅的浓度梯度提供。

公开(公告)号：US4436398A

公开(公告)日：1984-03-13

申请号：US476398

申请日：1983-03-22

申请人： Kiyonobu Endo ,  Noriyuki Nose

发明人： Kiyonobu Endo ,  Noriyuki Nose

IPC分类号： G02B27/10 ,  G03B7/099 ,  G03B13/08 ,  G02B5/02

CPC分类号： G02B27/108 ,  G02B27/1006 ,  G02B27/1086 ,  G03B7/09976 ,  G03B2217/005

摘要： A device for splitting an incident light on an image forming optical system by a relief type diffraction grating. The device is constructed of a transparent substrate and a transparent filling layer having substantially the same refractive index as that of the transparent substrate, and the relief type diffraction grating is formed on the interface between the substrate and the filling layer. With such an arrangement, the reflectively diffracted light is detected by the photodetector without any undue influence in the image-formation based on the transmissively diffracted light.

摘要翻译： 一种用于通过浮雕型衍射光栅将入射光分解在成像光学系统上的装置。 该装置由透明基板和与透明基板的折射率基本相同的透明填充层构成，并且浮雕型衍射光栅形成在基板和填充层之间的界面上。 通过这样的布置，由光检测器检测反射衍射光，而不会在基于透射衍射光的图像形成中产生任何不适当的影响。

公开(公告)号：US6018395A

公开(公告)日：2000-01-25

申请号：US766928

申请日：1996-12-16

申请人： Makiko Mori ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Hirohisa Ohta ,  Noriyuki Nose

发明人： Makiko Mori ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Hirohisa Ohta ,  Noriyuki Nose

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： An alignment method useable with an original having a pattern and a substrate having a surface area on which the pattern of the original is printed. The alignment method comprises detecting plural marks, calculating plural times, the amount of rotational deviation on the basis of different combinations of marks, calculating the quantity of rotational correction of the original and the substrate by using the computed rotational deviations, and aligning on the basis of the calculated quantity of the rotational deviation.

摘要翻译： 可用于具有图案的原稿的对准方法和具有印刷原稿图案的表面积的基板。 对准方法包括基于不同的标记组合来检测多个标记，多次计算旋转偏差量，通过使用计算出的旋转偏差来计算原件和基板的旋转校正量，并基于 的计算量的旋转偏差。

公开(公告)号：US5742386A

公开(公告)日：1998-04-21

申请号：US799879

申请日：1997-02-13

申请人： Noriyuki Nose ,  Minoru Yoshii ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

发明人： Noriyuki Nose ,  Minoru Yoshii ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

IPC分类号： G01N21/88 ,  G01N21/47 ,  G01N21/94 ,  G01N21/956 ,  G03F7/20 ,  H01L21/027 ,  G01N21/00

CPC分类号： G01N21/4738 ,  G01N21/94 ,  G01N21/956

摘要： An apparatus for detecting foreign matter on a substrate includes an optical system for projecting a light beam onto a pellicle and a pattern surface, a first detector for detecting scattered light from foreign matter on the pattern surface, a second detector for detecting information relating to the reflectivity or the transmittance of the pellicle by detecting a light beam reflected by the pellicle, and a correction unit for correcting an output signal from the first detector using an output signal from the second detector.

摘要翻译： 用于检测基板上的异物的装置包括：用于将光束投射到防护薄膜组件和图案表面上的光学系统;用于检测来自图案表面上异物的散射光的第一检测器，用于检测与图案表面有关的信息的第二检测器; 通过检测由防护薄膜组件反射的光束来检测防护薄膜组件的反射率或透射率;以及校正单元，用于使用来自第二检测器的输出信号来校正来自第一检测器的输出信号。