公开(公告)号：US10236159B2

公开(公告)日：2019-03-19

申请号：US15448308

申请日：2017-03-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi Tomimatsu ,  Makoto Sato ,  Atsushi Uemoto ,  Tatsuya Asahata ,  Yo Yamamoto

IPC: H01J37/20 ,  H01J37/302

Abstract: A charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.

公开(公告)号：US10014155B2

公开(公告)日：2018-07-03

申请号：US15181702

申请日：2016-06-14

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya Asahata ,  Akito Mori ,  Asumi Yuzuriha

IPC: H01J37/20 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/20292

Abstract: A microsample stage which fixes microsamples when the microsamples are analyzed by an analyzer includes a base, and middle supports which protrude from an upper surface of the base. A microsample-fixing portion protrudes from an upper surface of each middle support. An alignment mark associated with each microsample-fixing portion is configured to be recognized by a capturing image to determine a position of attachment of one or more microsamples to each microsample-fixing portion. The microsample stage is made by etching a silicon member, which can be automated to increase work efficiency.

公开(公告)号：US09620333B2

公开(公告)日：2017-04-11

申请号：US14833563

申请日：2015-08-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi Tomimatsu ,  Makoto Sato ,  Atsushi Uemoto ,  Tatsuya Asahata ,  Yo Yamamoto

IPC: H01J37/26 ,  H01J37/302 ,  H01J37/20

CPC classification number: H01J37/3023 ,  H01J37/20 ,  H01J2237/208 ,  H01J2237/31745

Abstract: A charged particle beam apparatus automatically prepares a sample piece from a sample and includes a charged particle beam irradiation optical system that irradiates a charged particle beam to a sample placed on a movable sample stage. A sample piece transferring unit holds and transfers a sample piece separated and extracted from the sample, and a holder support holds a sample piece holder to which the sample piece is transferred. A computer controls a position of an object based on a template prepared from an image of the object acquired by irradition with the charged particle beam and position information acquired from the image of the object. The sample piece transferring unit includes a needle that transfers the sample piece separated and extrated from the sample, and a needle actuting mechanism that actuates the needle. The computer controls the needle actuating mechanism so as to approach the needle to the sample piece using the template formed from an absorbed current image acquired by irradiating the needle with the charged particle beam.

公开(公告)号：US09368323B2

公开(公告)日：2016-06-14

申请号：US14601497

申请日：2015-01-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi Uemoto ,  Xin Man ,  Tatsuya Asahata

IPC: H01J37/26

CPC classification number: H01J37/265 ,  H01J2237/15 ,  H01J2237/30483

Abstract: A cross-section processing observation apparatus includes an ion beam control unit which controls a charged particle beam generation-focusing portion and a deflector, and a DAC which converts an input digital signal into an analog signal which is to be input to the deflector. A field-of-view setting portion sets a value of a field of view of a charged particle beam where the scanning performed by the deflector is performed on the basis of a set value of a slice amount, and the field-of-view setting portion is configured to set a value of one-nth of the slice amount, where n is a first natural number, as an input digital value “1” of the digital/analog converter and to set a value obtained by multiplying said value set as the input digital value “1” by a second natural number as a value of the field of view.

Abstract translation: 横截面处理观察装置包括控制带电粒子束产生聚焦部分和偏转器的离子束控制单元和将输入数字信号转换为要被输入到偏转器的模拟信号的DAC。 视野设定部设定基于切片量的设定值进行由偏转器执行的扫描的带电粒子束的视场的值，并且视野设定 部分被配置为将数字/模拟转换器的输入数字值“1”作为数字/模拟转换器的输入数字值“1”，将其中n是第一自然数的片数量的十进制值设置为将所设置的值设置为 输入数字值“1”作为视场的值的第二自然数。

公开(公告)号：US09336987B2

公开(公告)日：2016-05-10

申请号：US14526172

申请日：2014-10-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota Torikawa ,  Tatsuya Asahata ,  Makoto Sato ,  Atsushi Uemoto

IPC: H01J37/304 ,  H01J37/317

CPC classification number: H01J37/3045 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A charged particle beam apparatus including a column irradiating a sample with a charged particle beam, a detector detecting a secondary particle emitted from the sample, an image data generating section generating image data indicating two-dimensional distribution of an amount of the secondary particle detected by the detector, and a controller that respectively sets first and second position adjustment irradiation frames for first and second beam condition on a surface of the sample in the image data, form a first and second irradiation traces by respectively irradiating the first and second position adjustment irradiation frames with the charged particle beams of the first and second beam conditions, correct a position of the second processing irradiation frame, based on a position displacement amount between a predetermined position of the first irradiation trace and a predetermined position of the second irradiation trace.

Abstract translation: 一种带电粒子束装置，包括用带电粒子束照射样品的柱，检测从样品发射的二次粒子的检测器，图像数据生成部，生成表示由二次粒子的量的二维分布的二维分布的图像数据， 所述检测器和控制器分别在所述图像数据的样品的表面上分别设置用于第一和第二光束条件的第一和第二位置调整照射帧，通过分别照射所述第一和第二位置调整照射来形成第一和第二照射迹线 具有第一和第二光束条件的带电粒子束的帧，基于第一照射迹线的预定位置和第二照射迹线的预定位置之间的位置偏移量来校正第二处理照射帧的位置。

公开(公告)号：US09245713B2

公开(公告)日：2016-01-26

申请号：US14470135

申请日：2014-08-27

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin Man ,  Tatsuya Asahata ,  Atsushi Uemoto

IPC: G21K5/04 ,  H01J37/317 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/317 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/24475 ,  H01J2237/2802 ,  H01J2237/31749

Abstract: A charged particle beam apparatus for processing a tip end portion of a sample into a needle shape, includes an ion beam irradiation unit that irradiates the tip end portion with ion beams, an electron beam irradiation unit that irradiates the tip end portion with electron beams, a secondary electron detection unit that detects secondary electrons generated at the tip end portion by the irradiation with the electron beams, and an EBSD detection unit that detects diffracted electrons generated at the tip end portion by the irradiation with the electron beams.

Abstract translation: 一种用于将样品的尖端处理成针状的带电粒子束装置包括：用离子束照射前端部的离子束照射单元，用电子束照射前端部的电子束照射单元， 二次电子检测单元，其通过照射电子束来检测在前端部分产生的二次电子;以及EBSD检测单元，其通过用电子束的照射检测在前端部分产生的衍射电子。

公开(公告)号：US09218937B2

公开(公告)日：2015-12-22

申请号：US14617273

申请日：2015-02-09

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Hidekazu Suzuki ,  Yo Yamamoto

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J37/3023 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/208 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2602

Abstract: A charged particle beam apparatus includes: a charged particle beam column configured to irradiate an irradiation target with a charged particle beam; a detector configured to detect secondary charged particles emitted from the irradiation target by the irradiation of the charged particle beam; a needle arranged in an irradiation area of the charged particle beam; a needle actuator configured to actuate the needle; and a controller configured to control the needle actuator to actuate the needle along a movement route that is configured by a preset target position and preset way points. The controller controls the needle actuator to set an actuating direction of the needle for each of the way points.

Abstract translation: 带电粒子束装置包括：带电粒子束柱，被配置为用照射目标的带电粒子束; 检测器，被配置为通过照射带电粒子束来检测从照射目标物发射的二次带电粒子; 布置在带电粒子束的照射区域中的针; 针致动器，其构造成致动所述针; 以及控制器，被配置为控制针致动器沿着由预设目标位置和预设路线点构成的移动路线致动针。 控制器控制针致动器以为每个路点设置针的致动方向。

公开(公告)号：US11749493B2

公开(公告)日：2023-09-05

申请号：US17027291

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yoshihiro Koyama ,  Tatsuya Asahata ,  Masahiro Kiyohara ,  Tsunghan Yang

IPC: H01J37/08 ,  H01J37/09

CPC classification number: H01J37/08 ,  H01J37/09 ,  H01J2237/0805 ,  H01J2237/31749

Abstract: A liquid metal ion source (50) includes: a reservoir (10) configured to hold an ion material (M) forming a liquid metal; a needle electrode (20); an extraction electrode (22) configured to cause an ion of the ion material to be emitted from a distal end of the needle electrode; a beam diaphragm (24), which is arranged on a downstream side of the extraction electrode, and is configured to limit a beam diameter of the ion; and a vacuum chamber (30) configured to accommodate and hold the reservoir, the needle electrode, the extraction electrode, and the beam diaphragm in vacuum, wherein the liquid metal ion source further includes an oxidizing gas introducing portion (40), and wherein the oxidizing gas introducing portion communicates to the vacuum chamber, and is configured to introduce an oxidizing gas into a periphery of the needle electrode.

公开(公告)号：US11335534B2

公开(公告)日：2022-05-17

申请号：US17027341

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Takuma Aso ,  Xin Man ,  Makoto Sato ,  Tatsuya Asahata

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/30 ,  H01J37/26

Abstract: The particle beam irradiation apparatus includes: an irradiation unit configured to radiate a particle beam; a first detection unit configured to detect first particles; a second detection unit configured to detect second particles; an image forming unit configured to form an observation image based on a first signal obtained by the detection of the first particles, which is performed by the first detection unit, and to form an observation image based on a second signal obtained by the detection of the second particles, which is performed by the second detection unit; and a control unit configured to calculate a brightness of a first region in the formed first observation image and perform a brightness adjustment of the first detection unit based on a first target brightness as a first brightness adjustment when the brightness of the first region is different from the first target brightness.

公开(公告)号：US11239046B2

公开(公告)日：2022-02-01

申请号：US17030992

申请日：2020-09-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana Muraki ,  Atsushi Uemoto ,  Tatsuya Asahata

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/22 ,  H01J37/304 ,  H01J37/30

Abstract: To stabilize automated MS, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform control of a position with respect to a target, based on: a result of second determination about the position, which is executed depending on a result of first determination about the position; and information including an image that is obtained by irradiation with the charged particle beam.