Semiconductor device including an integrated resistor and method of producing thereof

    公开(公告)号:US10957686B2

    公开(公告)日:2021-03-23

    申请号:US16744693

    申请日:2020-01-16

    Abstract: A semiconductor device of an embodiment includes a transistor device in a semiconductor die including a semiconductor body. The transistor device includes transistor cells connected in parallel and covering at least 80% of an overall active area at a first surface of the semiconductor body. The semiconductor device further includes a control terminal contact area at the first surface electrically connected to a control electrode of each of the transistor cells. A first load terminal contact area at the first surface electrically connected to a first load terminal region of each of the transistor cells. The semiconductor device further includes a resistor in the semiconductor die and electrically coupled between the control terminal contact area and the first load terminal contact area, and a pn junction diode electrically connected in series with the resistor. A method of producing the semiconductor device is also described.

    Semiconductor device including transistor device

    公开(公告)号:US10186508B2

    公开(公告)日:2019-01-22

    申请号:US15792492

    申请日:2017-10-24

    Abstract: A semiconductor device of an embodiment includes a transistor device in a semiconductor die including a semiconductor body. The transistor device includes transistor cells connected in parallel and covering at least 80% of an overall active area at a first surface of the semiconductor body. The semiconductor device further includes a control terminal contact area at the first surface electrically connected to a control electrode of each of the transistor cells. A first load terminal contact area at the first surface electrically connected to a first load terminal region of each of the transistor cells. The semiconductor device further includes a resistor in the semiconductor die and electrically coupled between the control terminal contact area and the first load terminal contact area.

    Semiconductor package with leadframe

    公开(公告)号:US10319671B2

    公开(公告)日:2019-06-11

    申请号:US15985313

    申请日:2018-05-21

    Abstract: A semiconductor package includes a leadframe, a first transistor chip connected to a first island of the leadframe in a drain-down configuration, and a second transistor chip connected to a second island of the leadframe in the same drain-down configuration as the first transistor chip. The first and the second islands of the leadframe are mutually electrically isolated from one another. The first island includes an extension which extends beyond a perimeter of the first transistor chip in a direction towards the second island and overlaps the second transistor chip. The first transistor chip and the second transistor chip are electrically interconnected with one another via the extension of the first island and a first electric connection element electrically connecting the extension to the second transistor chip to form a half bridge circuit.

    Rectifying Devices and Rectifier Arrangements
    18.
    发明申请
    Rectifying Devices and Rectifier Arrangements 审中-公开
    整流器件和整流器布置

    公开(公告)号:US20160072376A1

    公开(公告)日:2016-03-10

    申请号:US14849655

    申请日:2015-09-10

    Abstract: A rectifying device includes a power transistor, a gate control circuit and a capacitor structure arranged on a single semiconductor die. The power transistor includes a source or emitter terminal connected to a first terminal of the rectifying device, a drain or collector terminal connected to a second terminal of the rectifying device, and a gate. The gate control circuit is operable to control a gate voltage at the gate of the power transistor based on at least one parameter relating to at least one of a voltage and a current between the first terminal and the second terminal.

    Abstract translation: 整流装置包括布置在单个半导体管芯上的功率晶体管,栅极控制电路和电容器结构。 功率晶体管包括连接到整流装置的第一端子的源极或发射极端子,连接到整流装置的第二端子的漏极或集电极端子以及栅极。 栅极控制电路可操作以基于与第一端子和第二端子之间的电压和电流中的至少一个有关的至少一个参数来控制功率晶体管的栅极处的栅极电压。

    Dual gate MOSFET devices and pre-charging techniques for DC link capacitors

    公开(公告)号:US11955974B2

    公开(公告)日:2024-04-09

    申请号:US17810163

    申请日:2022-06-30

    CPC classification number: H03K3/011 H03K17/6871

    Abstract: This disclosure is directed to a dual gate metal oxide semiconductor field effect transistor (MOSFET) device formed in a semiconductor material, as well as circuits and techniques for using the dual gate MOSFET device. In some examples, the dual gate MOSFET device may comprise a first MOSFET formed in the semiconductor material, and a second MOSFET formed in the semiconductor material, wherein the first MOSFET and the second MOSFET are arranged in parallel in the semiconductor material, wherein the first MOSFET and the second MOSFET include a common drain node and a common source node, and wherein the first MOSFET and the second MOSFET define different transfer characteristics.

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