公开(公告)号：US20210389667A9

公开(公告)日：2021-12-16

申请号：US17081000

申请日：2020-10-27

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  C07D317/70 ,  C07C381/12 ,  C07C309/17 ,  C07D327/04 ,  C07C309/12 ,  C07C65/10 ,  C07C59/115 ,  C07C69/63 ,  C07C65/05

Abstract: A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20250116922A1

公开(公告)日：2025-04-10

申请号：US18985206

申请日：2024-12-18

Applicant: JSR CORPORATION

Inventor： Takuya OMIYA ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Yuushi MATSUMURA ,  Nozomi TERADA

IPC: G03F7/004 ,  C08F2/50 ,  C08F20/10

Abstract: A radiation-sensitive resin composition includes a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid, and which has a first structural unit represented by the following formula (1); a radiation-sensitive acid generating agent; and an acid diffusion control agent having a monovalent radiation-sensitive onium cation and a monovalent organic acid anion.

公开(公告)号：US20240385518A1

公开(公告)日：2024-11-21

申请号：US18691090

申请日：2022-09-01

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Natsuko KINOSHITA ,  Takuhiro TANIGUCHI ,  Takuya OMIYA

IPC: G03F7/004 ,  G03F7/039

Abstract: A radiation-sensitive resin composition includes a resin including a structural unit (I) represented by formula (1). Ra is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; Ar1 is a substituted or unsubstituted divalent aromatic hydrocarbon group having 6 to 20 carbon atoms; m is 0 or 1; L1 is a single bond, or —O—, *—COO—, a divalent hydrocarbon group having 1 to 20 carbon atoms, or a combination thereof, and * is a bond on an Ar1 side; Ar2 is a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms and substituted with X; X is an iodine atom or a bromine atom; and n1 is an integer of 1 to nmax, wherein nmax is the number of Xs when all hydrogen atoms in the monovalent aromatic hydrocarbon group represented by the Ar2 are substituted with X.

公开(公告)号：US20230384676A1

公开(公告)日：2023-11-30

申请号：US18135838

申请日：2023-04-18

Applicant: JSR CORPORATION

Inventor： Takuya OMIYA ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Yuushi MATSUMURA ,  Natsuko KINOSHITA

IPC: G03F7/039 ,  C08F136/16 ,  C07C69/653

CPC classification number: G03F7/0397 ,  C08F136/16 ,  C07C69/653

Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. R1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; L1 represents a single bond or —COO-L-; L represents a substituted or unsubstituted alkanediyl group; R2 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; L2 represents a single bond or a divalent linking group; and Ar represents a group obtained by removing (n+1) hydrogen atoms from an aromatic ring. R3 is independently a halogen atom, a halogenated hydrocarbon group, a hydroxy group, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or a monovalent alkyl ether group having 1 to 10 carbon atoms, and at least one R3 is a halogen atom or a halogenated hydrocarbon group.

公开(公告)号：US20230236501A1

公开(公告)日：2023-07-27

申请号：US18100031

申请日：2023-01-23

Applicant: JSR CORPORATION

Inventor： Natsuko KINOSHITA ,  Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA

IPC: G03F7/004 ,  C07C381/12 ,  C07C65/24 ,  C07C323/62 ,  C07D333/76 ,  C07D327/08 ,  C07C69/92 ,  C08F220/18 ,  C08F212/14

CPC classification number: G03F7/0045 ,  C07C381/12 ,  C07C65/24 ,  C07C323/62 ,  C07D333/76 ,  C07D327/08 ,  C07C69/92 ,  C08F220/1812 ,  C08F212/22 ,  C08F220/1811 ,  C08F220/1807 ,  C07C2601/08

Abstract: A radiation-sensitive resin composition includes: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; a radiation-sensitive acid generator; and a compound represented by formula (1). Ar1 represents a group obtained by removing (a+b+2) hydrogen atoms from an aromatic hydrocarbon ring having 6 to 30 ring atoms; R1 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms; L1 represents a divalent linking group; R2 represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms; a is an integer of 0 to 10, b is an integer of 1 to 10, wherein a sum of a and b is no greater than 10; and X+ represents a monovalent radiation-sensitive onium cation.

公开(公告)号：US20220334481A1

公开(公告)日：2022-10-20

申请号：US17854048

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Hayato NAMAI ,  Kazuya KIRIYAMA ,  Ken MARUYAMA

IPC: G03F7/039 ,  C08G75/20

Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.