公开(公告)号：US20100085547A1

公开(公告)日：2010-04-08

申请号：US12566060

申请日：2009-09-24

申请人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： B41F3/30 ,  A61N5/06

CPC分类号： H05G2/001 ,  H05G2/003

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置 并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。

公开(公告)号：US20130327955A1

公开(公告)日：2013-12-12

申请号：US13686633

申请日：2012-11-27

申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

IPC分类号： H05G2/00

CPC分类号： H05G2/006 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G21K1/06 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.

摘要翻译： 辐射源被配置为产生极紫外辐射。 辐射源包括在其中使用中产生等离子体的腔室，以及蒸发表面，该蒸发表面构造成蒸发由等离子体形成的副产物并被发射到蒸发表面的材料。 用于在平版印刷设备的等离子体辐射源中除去或来自等离子体辐射源的副产物材料的方法包括在等离子体中蒸发在使用中发射到该表面的材料。

公开(公告)号：US08405055B2

公开(公告)日：2013-03-26

申请号：US12566060

申请日：2009-09-24

申请人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： H05H1/42

CPC分类号： H05G2/001 ,  H05G2/003

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置 并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。

公开(公告)号：US20120267550A1

公开(公告)日：2012-10-25

申请号：US13449030

申请日：2012-04-17

申请人： Sjoerd Nicolaas Lambertus DONDERS ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

发明人： Sjoerd Nicolaas Lambertus DONDERS ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

IPC分类号： F28D15/00 ,  F25B29/00 ,  G21K5/08 ,  F28F27/00

CPC分类号： G03F7/70858 ,  F28D15/0266

摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.

摘要翻译： 用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。

公开(公告)号：US08610089B2

公开(公告)日：2013-12-17

申请号：US13449030

申请日：2012-04-17

申请人： Sjoerd Nicolaas Lambertus Donders ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

发明人： Sjoerd Nicolaas Lambertus Donders ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

IPC分类号： H01J5/00

CPC分类号： G03F7/70858 ,  F28D15/0266

摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.

摘要翻译： 用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。

公开(公告)号：US09897930B2

公开(公告)日：2018-02-20

申请号：US13057583

申请日：2009-07-22

申请人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

发明人： Leonid Aizikovitch Sjmaenok ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70916

摘要： A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

公开(公告)号：US20110143269A1

公开(公告)日：2011-06-16

申请号：US13058783

申请日：2009-07-29

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

IPC分类号： G03F7/20 ,  H05G2/00 ,  G03B27/54 ,  G03F1/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70941 ,  G21K1/062 ,  G21K1/10

摘要： A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

摘要翻译： 光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。 在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。 在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

公开(公告)号：US20110019174A1

公开(公告)日：2011-01-27

申请号：US12919741

申请日：2009-02-24

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  G02B5/22 ,  G02B5/26 ,  G03B27/72

CPC分类号： G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

摘要： An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

摘要翻译： 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

公开(公告)号：US09529283B2

公开(公告)日：2016-12-27

申请号：US13058783

申请日：2009-07-29

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

IPC分类号： G21K5/04 ,  G03F7/20 ,  B82Y10/00 ,  G02B5/20 ,  G21K1/06 ,  G21K1/10

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70941 ,  G21K1/062 ,  G21K1/10

摘要： A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

摘要翻译： 光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。 在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。 在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

公开(公告)号：US08345223B2

公开(公告)日：2013-01-01

申请号：US12919741

申请日：2009-02-24

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B27/14

CPC分类号： G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

摘要： An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

摘要翻译： 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。