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公开(公告)号：US06673521B2
公开(公告)日：2004-01-06
申请号：US09735404
申请日：2000-12-12
IPC分类号： G03F726
摘要： A process of silylation of object surfaces using a mixture of a silylation agent in admixture with an inert liquified gas, such as carbon dioxide.
摘要翻译： 使用甲硅烷基化剂与惰性液化气体如二氧化碳混合的混合物对甲基化表面的方法。
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公开(公告)号：US06656666B2
公开(公告)日：2003-12-02
申请号：US09742401
申请日：2000-12-22
IPC分类号： G03F700
CPC分类号： G03F7/30 , H01L21/0274
摘要： The invention relates generally to photolithographic techniques, and particularly, but not by way of limitation, to a method for preventing the collapse of the image pattern during the stage of drying the image. The invention also relates to structures fabricated using the inventive method.
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公开(公告)号：US06509136B1
公开(公告)日：2003-01-21
申请号：US09893267
申请日：2001-06-27
申请人： Dario L. Goldfarb , Kenneth John McCullough , David R. Medeiros , Wayne M. Moreau , John P. Simons , Charles J. Taft
发明人： Dario L. Goldfarb , Kenneth John McCullough , David R. Medeiros , Wayne M. Moreau , John P. Simons , Charles J. Taft
IPC分类号： G03F7027
CPC分类号： F26B21/14 , F26B5/005 , G03F7/162 , G03F7/168 , Y10S430/136
摘要： A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.
摘要翻译： 干燥设置在工件上的流延膜聚合物的方法。 在该方法中，设置在工件上的包含其中的挥发性有机化合物的浇铸聚合物膜与可以是液体二氧化碳或超临界二氧化碳的萃取剂接触。
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14.发明申请Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates 有权使用混合基材来增强铬或敏感基材上的图案化抗蚀剂型材公开(公告)号：US20080227030A1
公开(公告)日：2008-09-18
申请号：US10597904
申请日：2004-02-11
CPC分类号： G03F7/0045 , G03F1/78 , G03F7/0392 , G03F7/40 , Y10S430/143
摘要： Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.
摘要翻译： 通过使用包括室温固体碱和液体低蒸气压基料的基础添加剂的组合，可获得即使在困难的基材上也具有良好基础性能的抗蚀剂组合物。 该组合物在通常用于掩模制造的金属基材如含铬层上特别有用。
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公开(公告)号：US06686124B1
公开(公告)日：2004-02-03
申请号：US09524692
申请日：2000-03-14
IPC分类号： G03C176
摘要： A multifunctional polymer comprising a polymeric chain having chromophore groups and cross-linking sites is suitable as a resist material and especially as the underlayer for bilayer and top surface imaging strategies. The multifunctional polymer can function as an antireflective coating, planarizing layer or etch resistant hard mask.
摘要翻译： 包含具有发色团和交联位点的聚合物链的多官能聚合物适合作为抗蚀剂材料，特别是作为双层和顶表面成像策略的底层。 多功能聚合物可用作抗反射涂层，平坦化层或耐蚀刻硬掩模。
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公开(公告)号：US3996393A
公开(公告)日：1976-12-07
申请号：US454058
申请日：1974-03-25
申请人： Charles A. Cortellino , Edward Gipstein , William A. Hewett , Duane E. Johnson , Wayne M. Moreau
发明人： Charles A. Cortellino , Edward Gipstein , William A. Hewett , Duane E. Johnson , Wayne M. Moreau
IPC分类号： G03F7/039 , H01L21/027 , B05D3/06
CPC分类号： G03F7/039
摘要： It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 .times. 10.sup..sup.-6 coulombs/cm.sup.2.
摘要翻译： 已经发现，通过使用具有至少一百万分子量的聚合物，正性聚合物电子束抗蚀剂的敏感性提高了一个数量级以上，从而使得所需辐射降至3×10 6库伦/ cm2。
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公开(公告)号：US06420088B1
公开(公告)日：2002-07-16
申请号：US09602967
申请日：2000-06-23
申请人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Wu-Song Huang , Ranee Kwong , Wayne M. Moreau
发明人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Wu-Song Huang , Ranee Kwong , Wayne M. Moreau
IPC分类号： G03C1825
CPC分类号： C08G77/20 , C08G77/38 , G03F7/0757 , G03F7/091 , Y10S430/151
摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
摘要翻译： 特征在于存在具有侧生发色团部分的含SiO聚合物的抗反射组合物是光刻工艺中有用的抗反射涂层/硬掩模组合物。 这些组合物提供突出的光学，机械和蚀刻选择性，同时适用于使用旋涂应用技术。 所述组合物在用于在基材上，尤其是金属或半导体层上配置下层材料层的光刻工艺中特别有用。
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公开(公告)号：US5821036A
公开(公告)日：1998-10-13
申请号：US960105
申请日：1997-10-27
CPC分类号： G03F7/322
摘要： A method and composition for developing positive photoresists is illustrated. The developer of the present invention includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class most preferably present in an amount of from 10 to 30 ppm. A particularly preferred surfactant includes sulfonyl and amine moieties.
摘要翻译： 示出了用于开发正性光致抗蚀剂的方法和组合物。 本发明的显影剂包括氢氧化铵水性碱和氟化烷基烷氧基化物类的表面活性剂，最优选以10至30ppm的量存在。 特别优选的表面活性剂包括磺酰基和胺部分。
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19.发明授权Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene 失效包含聚羟基苯乙烯的聚甲基丙烯酸甲酯共聚物的光致抗蚀剂组合物
公开(公告)号：US5561194A
公开(公告)日：1996-10-01
申请号：US412806
申请日：1995-03-29
申请人： Kathleen M. Cornett , Judy B. Dorn , Margaret C. Lawson , Leo L. Linehan , Wayne M. Moreau , Randolph J. Smith , Gary T. Spinillo
发明人： Kathleen M. Cornett , Judy B. Dorn , Margaret C. Lawson , Leo L. Linehan , Wayne M. Moreau , Randolph J. Smith , Gary T. Spinillo
CPC分类号： G03F7/0233
摘要： A polyalkylmethacrylate co-polymer of polyhydroxystyrene has been found to be an ideal blending partner in a novolak photoresist composition. The preferred co-polymer is poly(p-hydroxystyrene)-co-(methyl methacrylate). The co-polymer is fully miscible with novolaks and has a high thermal stability (>150.degree. C.).
摘要翻译： 已经发现聚羟基苯乙烯的聚烷基甲基丙烯酸酯共聚物在酚醛清漆光致抗蚀剂组合物中是理想的掺合配合物。 优选的共聚物是聚（对羟基苯乙烯） - 共 - （甲基丙烯酸甲酯）。 共聚物与酚醛清漆完全混溶，具有高热稳定性（> 150℃）。
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公开(公告)号：US5272042A
公开(公告)日：1993-12-21
申请号：US761183
申请日：1991-09-17
申请人： Robert D. Allen , William R. Brunsvold , Burton J. Carpenter , William D. Hinsberg , Joseph LaTorre , Michael G. McMaster , Melvin W. Montgomery , Wayne M. Moreau , Logan L. Simpson , Robert J. Tweig , Gregory M. Wallraff
发明人： Robert D. Allen , William R. Brunsvold , Burton J. Carpenter , William D. Hinsberg , Joseph LaTorre , Michael G. McMaster , Melvin W. Montgomery , Wayne M. Moreau , Logan L. Simpson , Robert J. Tweig , Gregory M. Wallraff
CPC分类号： G03F7/039 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S430/127
摘要： Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.
摘要翻译： 公开了一种正性光致抗蚀剂。 光致抗蚀剂具有基本上水和碱不溶性的光不稳定聚合物作为其聚合物组分。 光致抗蚀剂还包括能够形成强酸的光酸产生剂。 该光酸产生剂可以是衍生自N-羟基酰胺或N-羟基酰亚胺的磺酸酯。 最后，光致抗蚀剂组合物包括适当的光敏剂。
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