公开(公告)号：US11137692B2

公开(公告)日：2021-10-05

申请号：US16313972

申请日：2018-11-29

Applicant: KLA-TENCOR CORPORATION

Inventor： Yoel Feler ,  Mark Ghinovker ,  Alexander Svizher ,  Vladimir Levinski ,  Inna Tarshish-Shapir

IPC: G03F7/20 ,  G03F9/00

Abstract: Metrology targets, design methods and measurement methods thereof are provided with periodic structure(s) which are oblique with respect to orthogonal production axes X and Y of the lithography tool—enabling more accurate overlay measurements of devices having diagonal (oblique, tilted) elements such as DRAM devices. One or more oblique periodic structure(s) may be used to provide one- or two-dimensional signals, with respect to one or more layers, possibly providing overlay measurements for multiple steps applied to one layer. The oblique periodic structure(s) may be used to modify current metrology target designs (e.g., imaging targets and/or scatterometry targets) or to design new targets, and measurement algorithms may be adjusted respectively to derive signals from the oblique periodic structure(s) and/or to provide pre-processed images thereof. The disclosed targets are process compatible and reflect more accurately the device overlays with respect to various process steps.

公开(公告)号：US20190250504A1

公开(公告)日：2019-08-15

申请号：US15776588

申请日：2018-04-16

Applicant: KLA-TENCOR CORPORATION

Inventor： Yoel Feler ,  Vladimir Levinski ,  Roel Gronheid ,  Sharon Aharon ,  Evgeni Gurevich ,  Anna Golotsvan ,  Mark Ghinovker

IPC: G03F1/84 ,  G03F7/20 ,  G06F17/50 ,  G03F1/26

CPC classification number: G03F1/84 ,  G01N21/00 ,  G03F1/26 ,  G03F1/44 ,  G03F7/70283 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/5068

Abstract: Metrology methods and targets are provided for reducing or eliminating a difference between a device pattern position and a target pattern position while maintaining target printability, process compatibility and optical contrast—in both imaging and scatterometry metrology. Pattern placement discrepancies may be reduced by using sub-resolved assist features in the mask design which have a same periodicity (fine pitch) as the periodic structure and/or by calibrating the measurement results using PPE (pattern placement error) correction factors derived by applying learning procedures to specific calibration terms, in measurements and/or simulations. Metrology targets are disclosed with multiple periodic structures at the same layer (in addition to regular target structures), e.g., in one or two layers, which are used to calibrate and remove PPE, especially when related to asymmetric effects such as scanner aberrations, off-axis illumination and other error sources.

公开(公告)号：US10242290B2

公开(公告)日：2019-03-26

申请号：US14152562

申请日：2014-01-10

Applicant: KLA-Tencor Corporation

Inventor： Inna Tarshish-Shapir ,  Yoel Feler ,  Anat Marchelli ,  Berta Dinu ,  Vladimir Levinski ,  Boris Efraty ,  Nuriel Amir ,  Mark Ghinovker ,  Amnon Manassen ,  Sigalit Robinzon

IPC: G01R31/28 ,  G06K9/52 ,  G06T7/00 ,  H01L21/66 ,  G01N21/47

Abstract: Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.

公开(公告)号：US20180348648A1

公开(公告)日：2018-12-06

申请号：US15571427

申请日：2017-06-06

Applicant: KLA-Tencor Corporation

Inventor： Yoel Feler ,  Vladimir Levinski

IPC: G03F7/20

Abstract: Metrology target designs on the reticle and on the wafer, and target design and processing methods are provided. Target designs comprise coarse pitched periodic structures having fine pitched sub-elements, which vary in sub-element CD and/or height, an orthogonal periodic structure, perpendicular to the measurement direction, with an orthogonal unresolved pitch among periodically recurring bars, which provide a calibration parameter for achieving well-printed targets. Orthogonal periodic structures may be designed on the reticle and be unresolved, or be applied in cut patterns on the process layer, with relatively low sensitivity to the cut layer overlay. Designed targets may be used for overlay metrology as well as for measuring process parameters such as scanner aberrations and pitch walk.

公开(公告)号：US09934353B2

公开(公告)日：2018-04-03

申请号：US14974732

申请日：2015-12-18

Applicant: KLA-Tencor Corporation

Inventor： Mohamed El Kodadi ,  Nuriel Amir ,  Roie Volkovich ,  Vladimir Levinski ,  Yoel Feler ,  Daniel Kandel ,  Nadav Gutman ,  Stilian Pandev ,  Dzimtry Sanko

IPC: G06F17/50 ,  G03F7/20 ,  G01N21/47

CPC classification number: G06F17/5081 ,  G01N21/4785 ,  G03F7/70641 ,  G03F7/70683 ,  G06F17/5072

Abstract: Target designs and methods are provided, which relate to periodic structures having elements recurring with a first pitch in a first direction. The elements are periodic with a second pitch along a second direction that is perpendicular to the first direction and are characterized in the second direction by alternating, focus-sensitive and focus-insensitive patterns with the second pitch. In the produced targets, the first pitch may be about the device pitch and the second pitch may be several times larger. The first, focus-insensitive pattern may be produced to yield a first critical dimension and the second, focus-sensitive pattern may be produced to yield a second critical dimension that may be equal to the first critical dimension only when specified focus requirements are satisfied, or provide scatterometry measurements of zeroth as well as first diffraction orders, based on the longer pitch along the perpendicular direction.

公开(公告)号：US20150204664A1

公开(公告)日：2015-07-23

申请号：US14161398

申请日：2014-01-22

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Daniel Kandel ,  Yoel Feler ,  Noam Sapiens ,  Irina Paykin ,  Alexander Svizher ,  Meir Aloni ,  Guy BEN DOV ,  Hadar Shalmoni ,  Vladimir Levinski

IPC: G01B11/27

CPC classification number: G01N21/01 ,  G01B11/272 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/068 ,  G02B27/4255 ,  G02B27/4272 ,  G03F7/70633 ,  G03F7/70683

Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.

Abstract translation: 提供了计量方法，系统和目标，实现了并行范例。 使用具有周期性结构的相邻小区来提取覆盖误差，例如通过引入可控相移或图像偏移，这使得能够进行覆盖的算法计算。 周期性结构被设计为展现旋转对称性以支持计算并减少误差。

公开(公告)号：US11302544B2

公开(公告)日：2022-04-12

申请号：US16467968

申请日：2019-05-06

Applicant: KLA-TENCOR CORPORATION

Inventor： Roie Volkovich ,  Renan Milo ,  Liran Yerushalmi ,  Moran Zaberchik ,  Yoel Feler ,  David Izraeli

IPC: H01L21/67 ,  G05B19/418

Abstract: A method for measurement of misregistration in the manufacture of semiconductor device wafers, the method including measuring misregistration between layers of a semiconductor device wafer at a first instance and providing a first misregistration indication, measuring misregistration between layers of a semiconductor device wafer at a second instance and providing a second misregistration indication, providing a misregistration measurement difference output in response to a difference between the first misregistration indication and the second misregistration indication, providing a baseline difference output and ameliorating the difference between the misregistration measurement difference output and the baseline difference output.

公开(公告)号：US20210175132A1

公开(公告)日：2021-06-10

申请号：US17179379

申请日：2021-02-18

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Evgeni Gurevich ,  Ido Adam ,  Yoel Feler ,  Dror Alumot ,  Yuval Lamhot ,  Noga Sella ,  Yaron De Leeuw ,  Tal Yaziv ,  Eltsafon Ashwal-Island ,  Lilach Saltoun ,  Tom Leviant

IPC: H01L21/66 ,  G06F16/28 ,  G03F9/00 ,  G03F7/20

Abstract: Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.

公开(公告)号：US10197922B2

公开(公告)日：2019-02-05

申请号：US15302052

申请日：2016-08-04

Applicant: KLA-Tencor Corporation

Inventor： Nadav Gutman ,  Yoel Feler ,  Vladimir Levinski ,  Oded Kaminsky

IPC: G03F7/20

Abstract: Focus metrology methods and modules are provided, which use aerial-images-based transformations to share measurement information derived from multiple targets and/or to design additional targets to specified compliant targets, which enable simple adjustment of focus targets to changing production conditions. Methods comprise positioning two or more focus targets in each wafer field, conducting focus measurements of the targets, transforming the focus measurements into a single set of results for each field, using a transformation between the targets that is based on the aerial images thereof, and deriving focus results from the single sets of results; and possibly designing the focus targets from specified targets using aerial image parameters of the specified targets.

公开(公告)号：US20180047646A1

公开(公告)日：2018-02-15

申请号：US15540409

申请日：2017-02-23

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Evgeni Gurevich ,  Ido Adam ,  Yoel Feler ,  Dror Alumot ,  Yuval Lamhot ,  Noga Sella ,  Yaron Deleeuw ,  Tal Yaziv ,  Eltsafon Ashwal ,  Lilach Saltoun ,  Tom Leviant

IPC: H01L21/66 ,  G03F7/20 ,  G06F17/30 ,  G03F9/00

CPC classification number: H01L22/20 ,  G03F7/70633 ,  G03F9/7003 ,  G06F16/285 ,  H01L22/12

Abstract: Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.