SEMICONDUCTOR DEVICE
    20.
    发明申请
    SEMICONDUCTOR DEVICE 有权
    半导体器件

    公开(公告)号:US20110128780A1

    公开(公告)日:2011-06-02

    申请号:US13024252

    申请日:2011-02-09

    IPC分类号: G11C11/00

    摘要: At the time of, for example, a set operation (SET) for making a phase-change element in a crystalline state, a pulse of a voltage Vreset required for melting the element is applied to the phase-change element, and subsequently a pulse of a voltage Vset that is lower than Vreset and is required for crystallizing the element is applied thereto. And, the magnitude of this voltage Vset is then changed depending on the ambient temperature so that the magnitude of the voltage Vset is small as the temperature becomes high (TH). In this manner, a margin of a write operation between the set operation and a reset operation (RESET) for making the element to be in amorphous state is improved.

    摘要翻译: 在例如用于使相变元件处于结晶状态的设定操作(SET)时,将元件熔化所需的电压Vreset的脉冲施加到相变元件,随后将脉冲 的电压Vset低于Vreset,并且是将元件结晶所需要的。 而且,该电压Vset的大小然后根据环境温度而改变,使得随着温度变高(TH),电压Vset的大小较小。 以这种方式,提高了设置操作和用于使元件处于非晶态的复位操作(RESET)之间的写入操作余量。