公开(公告)号：US09922804B2

公开(公告)日：2018-03-20

申请号：US14710100

申请日：2015-05-12

Applicant: Lam Research Corporation

Inventor： Darrell Ehrlich ,  Daniel Arthur Brown ,  Ian Kenworthy

IPC: H01J37/32 ,  H01L21/3065 ,  C23C16/455

CPC classification number: H01J37/32541 ,  C23C16/4557 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32522 ,  H01L21/3065 ,  Y10T29/49002 ,  Y10T29/49083 ,  Y10T29/49098 ,  Y10T29/49117 ,  Y10T29/49803

Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.

公开(公告)号：US20240304490A1

公开(公告)日：2024-09-12

申请号：US18670338

申请日：2024-05-21

Applicant: Lam Research Corporation

Inventor： Paul Albert Avanzino ,  Jerrel K. Antolik ,  Daniel Arthur Brown ,  Jason Lee Treadwell

IPC: H01L21/687 ,  H01L21/67 ,  H01L21/68

CPC classification number: H01L21/68742 ,  H01L21/67161 ,  H01L21/68

Abstract: Semiconductor processing tools are provided that include a support framework, semiconductor processing chambers arranged along an axis, an attachment point connected to the support framework, and a detachable hoist system. Each chamber includes a base portion fixedly mounted relative to the support framework and a removable top cover including one or more hoisting features. The detachable hoist system includes a vertical member including a top end including a complementary attachment point and a bottom end including a movement mechanism supported by a floor. The complementary attachment point is detachably connected to the attachment point. The detachable hoist system further includes a hoist arm connected to the vertical member. The hoist arm is configured to pivot about a vertical axis substantially perpendicular to the axis, and includes one or more links and a hoist feature engagement interface configured to engage with the hoisting features of any of the removable top covers.

公开(公告)号：US11282737B2

公开(公告)日：2022-03-22

申请号：US16969857

申请日：2019-02-15

Applicant: LAM RESEARCH CORPORATION

Inventor： Daniel Arthur Brown ,  Leonard John Sharpless ,  Allan Kent Ronne ,  Christopher William Burkhart

IPC: H01L21/677 ,  H01L21/687 ,  H01L21/683

Abstract: A substrate processing tool includes a plurality of process modules configured to process a semiconductor substrate. Each of the plurality of process modules is arranged at a different location within the substrate processing tool. A vacuum transfer module (VTM) includes a robot and is configured to move between a plurality of different positions corresponding to the different locations within the substrate processing tool to allow the robot to access respective ones of the plurality of process modules.

公开(公告)号：US10332729B2

公开(公告)日：2019-06-25

申请号：US15895367

申请日：2018-02-13

Applicant: LAM RESEARCH CORPORATION

Inventor： Darrell Ehrlich ,  Daniel Arthur Brown ,  Ian Kenworthy

IPC: H01J37/32 ,  H01L21/3065 ,  C23C16/455

Abstract: A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power supply boot on an upper surface of a thermal control plate and is located between the thermal control plate and a temperature-controlled top plate. The member is composed of an electrically insulating elastomeric material which can work over a large range of compressions and temperatures.

公开(公告)号：US10049862B2

公开(公告)日：2018-08-14

申请号：US15068508

申请日：2016-03-11

Applicant: Lam Research Corporation

Inventor： Daniel Arthur Brown ,  John Patrick Holland ,  Michael C. Kellogg ,  James E. Tappan ,  Jerrel K. Antolik ,  Ian Kenworthy ,  Theo Panagopoulos ,  Zhigang Chen

IPC: H01J37/32

Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.

公开(公告)号：US20160307743A1

公开(公告)日：2016-10-20

申请号：US15068508

申请日：2016-03-11

Applicant: Lam Research Corporation

Inventor： Daniel Arthur Brown ,  John Patrick Holland ,  Michael C. Kellogg ,  James E. Tappan ,  Jerrel K. Antolik ,  Ian Kenworthy ,  Theo Panagopoulos ,  Zhigang Chen

IPC: H01J37/32

CPC classification number: H01J37/32816 ,  H01J37/32082 ,  H01J37/32183 ,  H01J37/32651 ,  H01J37/32724

Abstract: A plasma chamber is provided to increase conductance within the plasma chamber and to increase uniformity of the conductance. A radio frequency (RF) path for supplying power to the plasma chamber is symmetric with respect to a center axis of the plasma chamber. Moreover, pumps used to remove materials from the plasma chamber are located symmetric with respect to the center axis. The symmetric arrangements of the RF paths and the pumps facilitate an increase in conductance uniformity within the plasma chamber.

Abstract translation: 提供等离子体室以增加等离子体室内的电导并增加电导的均匀性。 用于向等离子体室供电的射频（RF）路径相对于等离子体室的中心轴对称。 此外，用于从等离子体室移除材料的泵相对于中心轴线对称。 RF路径和泵的对称布置有助于提高等离子体室内的电导均匀性。

公开(公告)号：US20150279621A1

公开(公告)日：2015-10-01

申请号：US14730771

申请日：2015-06-04

Applicant: LAM RESEARCH CORPORATION

Inventor： Daniel Arthur Brown ,  Jeff A. Bogart ,  Ian J. Kenworthy

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  C23C16/45563 ,  C23C16/45578 ,  H01J37/321 ,  H01J37/32119 ,  H01J37/32449 ,  H01J37/32458 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32513 ,  H01J37/32522

Abstract: An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.

Abstract translation: 等离子体反应室的上腔室包括在上表面中具有用于接收热偶的盲孔的陶瓷窗口和电阻温度检测器，顶室接口，其包括上表面，真空密封在窗口的底部 以及气体注入系统，其包括安装在顶部腔室界面的侧壁中的8个侧注射器，以及气体输送系统，其包括从单个气体进料连接向8个喷射器提供对称气体流的管道。