Information Processing Device For Identifying The Type Of Recording Medium And Method For Forming Area On Recording Medium Executed In Information Processing Device
    12.
    发明申请
    Information Processing Device For Identifying The Type Of Recording Medium And Method For Forming Area On Recording Medium Executed In Information Processing Device 审中-公开
    用于识别记录介质类型的信息处理设备和在信息处理设备中执行的记录介质上的形成区域的方法

    公开(公告)号:US20070201321A1

    公开(公告)日:2007-08-30

    申请号:US10597224

    申请日:2005-01-18

    申请人: Shinji Sasaki

    发明人: Shinji Sasaki

    IPC分类号: G11B7/00

    摘要: Different formats, whose defect management methods differ based on the presence or absence of a cartridge, are adopted for information storage media having the same physical characteristics. An information processing apparatus is capable of mounting a storage medium having a data recording area. The data recording area includes a user area to which logical addresses are allocated in accordance with recording units. The information processing apparatus includes: a determination section for, based on physical characteristics of the mounted storage medium, determining which one of a first storage medium accommodated in a cartridge and a second storage medium not accommodated in a cartridge has been mounted; a processor for, based on a result of determination, giving an instruction that, when the second storage medium has been mounted, the data recording area be formed as the user area and a spare area, and giving an instruction that, when the first storage medium has been mounted, all area of the data recording area be formed as the user area; and a recording section for, based on the instruction, forming the user area and/or the spare area in the data recording area of the mount storage medium. The spare area is to be used as a substitute if a defect exists in a recording unit of the user area.

    摘要翻译: 对于具有相同物理特性的信息存储介质,采用不同格式的缺陷管理方式根据盒的存在或不存在而不同。 信息处理装置能够安装具有数据记录区域的存储介质。 数据记录区域包括根据记录单元向其分配逻辑地址的用户区域。 所述信息处理装置包括:确定部,其基于所安装的存储介质的物理特性,确定容纳在盒中的第一存储介质中的哪一个和未容纳在盒中的第二存储介质中的哪一个已经被安装; 一种处理器,用于基于确定结果,给出当第二存储介质已被安装时数据记录区域被形成为用户区域和备用区域的指令,并给出当第一存储器 介质已经安装,数据记录区域的所有区域都形成用户区域; 以及记录部分,用于根据该指令在安装存储介质的数据记录区域中形成用户区域和/或备用区域。 如果在用户区域的记录单元中存在缺陷,备用区域将被用作替代。

    Plasma processing apparatus
    18.
    发明授权
    Plasma processing apparatus 失效
    等离子体处理装置

    公开(公告)号:US4831963A

    公开(公告)日:1989-05-23

    申请号:US9685

    申请日:1987-02-02

    摘要: A plasma processing apparatus which is effective for surface processing uses a reactive gas activated by plasma excited by microwave energy. Generation and maintaining of the plasma excited by the microwave energy are different where pressure in the gas chamber is above 0.1 Torr. Generating a high density plasma and maintaining the plasma includes the use of a protrudent window which extends into the activating chamber which also operates as a cavity resonator. Oxidation of resist formed on the surface of VLSI may be provided and damage by charge particles prevented by use of a magnetic field.

    摘要翻译: 对表面处理有效的等离子体处理装置使用由微波能量激发的等离子体激活的反应气体。 由微波能量产生的等离子体的产生和维持在气室中的压力高于0.1托时是不同的。 产生高密度等离子体并保持等离子体包括使用延伸到激活室中的凸起窗口,其也作为空腔谐振器工作。 可以提供形成在VLSI表面上的抗蚀剂的氧化,并且通过使用磁场防止电荷颗粒的损坏。

    Gas cluster-ion irradiation apparatus
    20.
    发明授权
    Gas cluster-ion irradiation apparatus 失效
    气体簇离子照射装置

    公开(公告)号:US07405394B2

    公开(公告)日:2008-07-29

    申请号:US11173023

    申请日:2005-07-05

    IPC分类号: B01D59/44

    摘要: In a cluster ion beam irradiation apparatus including an apparatus for measuring size and energy distribution of gas cluster ions by using the time of flight (TOF) mass spectrometry, a unit for applying a retarding voltage is disposed in a stage preceding a TOF measuring instrument including a drift tube and a current measuring instrument. By measuring the size and energy distribution of the gas cluster ions and adjusting ionization conditions, cluster ions having predetermined energy and size are supplied to a work surface. In addition, a product of a pressure in an ion transportation device and an ion transportation length is controlled so as to satisfy the relation P×L≦30/N2/3/E1/2 Pa·m, where N is the size of gas cluster ions used for irradiation, and E is kinetic energy (eV) of the gas cluster ions.

    摘要翻译: 在包括用于通过使用飞行时间(TOF)质谱法测量气体簇离子的尺寸和能量分布的装置的集束离子束照射装置中,在TOF测量仪器之前的阶段中设置用于施加延迟电压的单元,包括 漂移管和电流测量仪器。 通过测量气体团簇离子的尺寸和能量分布并调节电离条件,将具有预定能量和尺寸的簇离子供应到工作表面。 此外,控制离子输送装置中的压力和离子输送长度的乘积,以满足关系式PxL <= 30 / N 2/3 / E 1/2 Pa.m,其中N是用于照射的气体簇离子的大小,E是气体簇离子的动能(eV)。