Optoelectronic component and a method of producing an optoelectronic component

    公开(公告)号:US10418535B2

    公开(公告)日:2019-09-17

    申请号:US15741876

    申请日:2016-07-28

    Abstract: An optoelectronic component includes a boundary layer is arranged between a semiconductor body and a metallic layer in a lateral direction, adjoins the semiconductor body at least in places, covers an active layer laterally, and has a lower refractive index compared to the semiconductor body, a metallic layer is configured to prevent the electromagnetic radiation generated during operation of the component and passes through the boundary layer from impinging on a mold body, the boundary layer is formed from a radiation-transmitting dielectric material having a refractive index of 1 to 2, and a layer thickness of the boundary layer is at least 400 nm and selected such that an amplitude of an evanescent wave, which is obtained in the event of total internal reflection at an interface between the boundary layer and the semiconductor body, is reduced to less than 37% of its original value within the boundary layer.

    Method of producing a radiation-emitting semiconductor component, and radiation-emitting semiconductor component

    公开(公告)号:US11195981B2

    公开(公告)日:2021-12-07

    申请号:US16607226

    申请日:2018-05-08

    Abstract: A method of manufacturing semiconductor device includes providing a radiation emitting semiconductor chip having a first main surface, applying a metallic seed layer to a second main surface opposite the first main surface, galvanically depositing first and second metallic volume regions on the seed layer, depositing an adhesion promoting layer on the volume regions, and applying a casting compound at least between contact points, wherein before the metallic volume regions are galvanically deposited, a dielectric layer is first applied to the seed layer over its entire surface and openings are produced in the dielectric layer by etching, and a material of the metallic volume regions is deposited through the openings of the dielectric layer, wherein the dielectric layer is underetched at boundaries to the openings and the underetches are filled with material of the metallic volume regions during the galvanical depositing of the metallic volume regions.

    Component and metod for producing a component

    公开(公告)号:US10236419B2

    公开(公告)日:2019-03-19

    申请号:US15758186

    申请日:2016-10-06

    Abstract: A component includes a semiconductor body, a carrier, and a stabilization layer arranged between the semiconductor body and the carrier in the vertical direction. The semiconductor body has a first semiconductor layer facing away from the carrier, a second semiconductor layer facing the carrier, and an active layer arranged between the first semiconductor layer and the second semiconductor layer. The carrier has a first via and a second via laterally spaced apart from the first via by means of an intermediate region. The first via is connected to the first semiconductor layer in an electrically conductive manner and the second via is connected to the second semiconductor layer in an electrically conductive manner. The stabilization layer is continuous, overlaps with the vias in a top view, and laterally bridges the intermediate region. The stabilization layer is electrically insulated from the vias and from the semiconductor body.

    Semiconductor Chip, Optoelectronic Device with a Semiconductor Chip, and Method for Producing a Semiconductor Chip
    19.
    发明申请
    Semiconductor Chip, Optoelectronic Device with a Semiconductor Chip, and Method for Producing a Semiconductor Chip 有权
    具有半导体芯片的半导体芯片,光电子器件以及用于制造半导体芯片的方法

    公开(公告)号:US20170033092A1

    公开(公告)日:2017-02-02

    申请号:US15303436

    申请日:2015-03-18

    Abstract: A semiconductor chip, an optoelectronic device including a semiconductor chip, and a method for producing a semiconductor chip are disclosed. In an embodiment the chip includes a semiconductor body with a first main surface and a second main surface arranged opposite to the first main surface, wherein the semiconductor body includes a p-doped sub-region, which forms part of the first main surface, and an n-doped sub-region, which forms part of the second main surface and a metallic contact element that extends from the first main surface to the second main surface and that is electrically isolated from one of the sub-regions.

    Abstract translation: 公开了半导体芯片,包括半导体芯片的光电子器件和半导体芯片的制造方法。 在一个实施例中,芯片包括具有第一主表面和与第一主表面相对布置的第二主表面的半导体本体,其中半导体主体包括形成第一主表面的一部分的p掺杂子区域,以及 形成第二主表面的一部分的n掺杂子区域和从第一主表面延伸到第二主表面并且与一个子区域电隔离的金属接触元件。

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