公开(公告)号：US20170092205A1

公开(公告)日：2017-03-30

申请号：US14864409

申请日：2015-09-24

Applicant: Pixtronix, Inc.

Inventor： Chin-Yuan Ho ,  Javier Villarreal ,  Hung-Chien Lin

IPC: G09G3/34

CPC classification number: G02B26/023

Abstract: This disclosure provides systems, methods, and apparatus for providing protective coatings on electromechanical systems (EMS) devices. A display apparatus can include an electrostatic actuation assembly for controlling the position of a suspended portion of a display element. The electrostatic actuation assembly can include a load beam, drive beam, and a coating disposed over a portion of the drive beam. The coating can include a plurality of raised tabs spaced apart from each other. One or both of the size of the raised tabs and a pitch between raised tabs can be varied along a surface of the drive beam. The voltage used to actuate the actuator is, in part, related to the shape and relative position of the load and drive beams. The raised tabs can be sized, spaced, or positioned to affect a desired rest position and rest shape of the drive beam relative to the load beam.

公开(公告)号：US09134530B2

公开(公告)日：2015-09-15

申请号：US13800418

申请日：2013-03-13

Applicant: Pixtronix, Inc.

Inventor： Javier Villarreal ,  Timothy Brosnihan ,  Mark B. Andersson ,  Edward Buckley ,  Eugene Fike

IPC: G09G5/00 ,  H05K13/00 ,  G02B26/02 ,  B81B3/00

CPC classification number: G02B26/02 ,  B81B3/0054 ,  B81B2201/045 ,  G02B26/023 ,  G09G5/003

Abstract: This disclosure provides systems, methods and apparatus for modulating light to form an image on a display, as well as methods manufacturing such apparatus. The display apparatus includes shutters having asymmetric light obstructing portions extending out from opposing sides of a shutter aperture along an axis of motion of the shutter. Actuators move the shutters laterally along the axis of motion to move the shutter between fully closed, partially open, and fully open states to modulate light, thereby forming an image.

Abstract translation: 本公开提供了用于调制光以在显示器上形成图像的系统，方法和装置，以及制造这种装置的方法。 显示装置包括具有不对称光阻挡部分的快门，该光束阻挡部分沿着快门的运动轴线从快门孔的相对侧延伸出来。 致动器沿着运动轴线横向移动百叶窗，以在完全关闭，部分打开和完全打开状态之间移动快门以调制光，从而形成图像。

公开(公告)号：US20140268274A1

公开(公告)日：2014-09-18

申请号：US13842882

申请日：2013-03-15

Applicant: PIXTRONIX, INC.

Inventor： Timothy Brosnihan ,  Javier Villarreal ,  Michael Andrew Gingras

IPC: G02B5/00 ,  B29D11/00 ,  G02B26/02

CPC classification number: G02B5/005 ,  B29D11/0074 ,  B81C1/00317 ,  B81C2201/0108 ,  G02B26/023

Abstract: This disclosure provides systems, methods and apparatus for displaying images. Some such apparatus include an array of display elements coupled to a substrate and an elevated aperture layer (EAL) suspended over the array of display elements. The EAL is coupled to the substrate, and includes, for each of the display elements, at least one aperture for allowing passage of light therethrough. Methods for manufacturing such apparatus include at least one of forming etch holes through the EAL, employing an at least partially sublimatable sacrificial mold, employing a two phase release process, and releasing the apparatus such that a portion of a sacrificial mold remains surrounding portions of the apparatus.

Abstract translation: 本公开提供了用于显示图像的系统，方法和装置。 一些这样的设备包括耦合到基板的显示元件阵列和悬挂在显示元件阵列上的升高的孔径层（EAL）。 所述EAL耦合到所述基板，并且对于每个所述显示元件包括用于允许光通过的至少一个孔。 用于制造这种设备的方法包括至少一个通过EAL形成蚀刻孔，使用至少部分可升华的牺牲模具，采用两相释放过程，并且释放该设备使得牺牲模具的一部分保持围绕 仪器。

公开(公告)号：US20160096729A1

公开(公告)日：2016-04-07

申请号：US14508342

申请日：2014-10-07

Applicant: Pixtronix, Inc.

Inventor： Javier Villarreal ,  Timothy Brosnihan ,  Chin-Yuan Ho ,  Hung-Chien Lin

IPC: B81C1/00 ,  B81B7/02 ,  G06T1/20 ,  B81B3/00

CPC classification number: G06T1/20 ,  B81B2201/045 ,  B81B2201/047 ,  B81B2203/0307 ,  B81C1/0019 ,  B81C2201/0108 ,  B81C2201/0132 ,  B81C2201/014 ,  B81C2201/0181 ,  G02B26/02

Abstract: This disclosure provides systems, methods and apparatus including processes that use two layers of resist, with a layer of etch stop material in between. The two layers of resist may be etched in separate processes to form devices having vias with sidewalls that extend through both layers of resist

Abstract translation: 本公开提供了包括使用两层抗蚀剂的工艺的系统，方法和设备，其间具有一层蚀刻停止材料。 可以在单独的工艺中蚀刻两层抗蚀剂，以形成具有延伸穿过两层抗蚀剂的侧壁的通路的器件

公开(公告)号：US09235046B2

公开(公告)日：2016-01-12

申请号：US13754548

申请日：2013-01-30

Applicant: Pixtronix, Inc.

Inventor： Javier Villarreal ,  Timothy J. Brosnihan ,  Jasper L. Steyn ,  Richard S. Payne ,  Stephen R. Lewis

IPC: G06F3/038 ,  G09G5/00 ,  G02B26/02 ,  G09G3/22 ,  B81B3/00

CPC classification number: G02B26/02 ,  B81B3/007 ,  B81B2201/045 ,  B81B2203/0163 ,  B81B2203/051 ,  B81C2201/053 ,  B81C2201/112 ,  G02B26/023 ,  G09G3/22

Abstract: This disclosure provides systems, methods and apparatus for providing relatively thinner and less stiff compliant beams for a shutter assembly. A protective coating is deposited and patterned over the shutter assembly before it is released from a sacrificial mold over which the shutter assembly is formed. Because some primary surfaces of the compliant beams are in contact with the sacrificial mold, these primary surfaces are not coated with the protective coating. Therefore, when the shutter assembly is finally released, the resulting compliant beams are relatively thinner and less stiff providing a reduction in an actuation voltage used to operate the shutter assembly. In some instances, the protective coating is patterned into discontinuous segments before release.

Abstract translation: 本公开提供了用于为快门组件提供相对较薄且较不硬的柔性梁的系统，方法和装置。 在从快门组件形成的牺牲模具释放之前，将保护涂层沉积并在其上形成图案。 由于柔性梁的一些主表面与牺牲模具接触，所以这些主表面没有涂覆保护涂层。 因此，当快门组件最终被释放时，所产生的柔性梁相对较薄并且较不硬，从而降低用于操作闸板组件的致动电压。 在一些情况下，保护性涂层在释放之前被图案化成不连续段。

公开(公告)号：US09176317B2

公开(公告)日：2015-11-03

申请号：US13800400

申请日：2013-03-13

Applicant: Pixtronix, Inc.

Inventor： Javier Villarreal ,  Timothy Brosnihan ,  Mark B. Andersson

IPC: G02B26/02 ,  G02B27/00

CPC classification number: G02B26/02 ,  G02B26/023 ,  G02B27/0018

Abstract: This disclosure provides systems, methods and apparatus for modulating light to form an image on a display, as well as methods manufacturing such apparatus. The display apparatus includes dual-level shutter assemblies. Each dual-level shutter assembly includes front and rear light obstructing levels positioned adjacent to respective front and rear light blocking layers. The front and rear light blocking layers define apertures providing optical paths from a backlight to the front of the display. The dual-level shutters selectively obstruct these optical paths to generate an image.

Abstract translation: 本公开提供了用于调制光以在显示器上形成图像的系统，方法和装置，以及制造这种装置的方法。 显示装置包括双层快门组件。 每个双水平快门组件包括邻近相应的前后遮光层定位的前光和后光阻挡层。 前后遮光层限定了从背光到显示器前部的光路的孔。 双层百叶窗选择性地阻挡这些光路以产生图像。

公开(公告)号：US20140268275A1

公开(公告)日：2014-09-18

申请号：US13843135

申请日：2013-03-15

Applicant: PIXTRONIX, INC.

Inventor： Timothy Brosnihan ,  Stephen English ,  Javier Villarreal ,  Richard Payne ,  Mark Kline ,  Stephen R. Lewis ,  Nesbitt Hagood ,  Eugene Fike

IPC: G02B26/02 ,  H05K13/00 ,  B81B7/00

CPC classification number: H05K13/00 ,  B81B7/008 ,  G02B26/023 ,  Y10T29/49155

Abstract: This disclosure provides systems, methods and apparatus for displaying images. Some such apparatus include a transparent substrate, a display element formed on the substrate, a light blocking elevated aperture layer (EAL) supported over the substrate by an anchor formed on the substrate, and an electrical interconnect disposed on the EAL for carrying an electrical signal to the display element. The electrical interconnect can include one or more of a data voltage interconnect, a scan-line interconnect or a global interconnect. In some implementations, a dielectric layer can separate the electrical interconnect from the EAL. The EAL can include an aperture formed through it that corresponds to the display element. In some implementations, a second electrical interconnect disposed on the substrate can be electrically coupled to a plurality of display elements.

Abstract translation: 本公开提供了用于显示图像的系统，方法和装置。 一些这样的设备包括透明基板，形成在基板上的显示元件，通过形成在基板上的锚支撑在基板上的遮光升高孔径层（EAL）以及设置在EAL上的用于承载电信号的电互连 到显示元件。 电互连可以包括数据电压互连，扫描线互连或全局互连中的一个或多个。 在一些实施方案中，电介质层可以将电互连与EAL分离。 EAL可以包括通过它形成的对应于显示元件的孔。 在一些实现中，布置在基板上的第二电互连可以电耦合到多个显示元件。

公开(公告)号：US20140218374A1

公开(公告)日：2014-08-07

申请号：US13759769

申请日：2013-02-05

Applicant: PIXTRONIX, INC.

Inventor： Jianru Shi ,  Richard S. Payne ,  Timothy J. Brosnihan ,  Eugene Fike ,  Edward Buckley ,  Javier Villarreal

IPC: G02B26/02

CPC classification number: G02B26/02 ,  B81B3/00 ,  G02B26/023

Abstract: This disclosure provides systems, methods and apparatus for providing multi-level multi-state shutter assemblies. The shutter assembly includes at least a first shutter at a first height over a substrate and a second shutter at a second height over the substrate. Both the first shutter and the second shutter can be operated in an open or closed state for passing or partially blocking light propagating through an aperture. In some implementations, the shutter assembly can operate in four states: a fully transmissive state, a fully obstructive state and two partially transmissive states based on the open or closed states of the first and second shutters.

Abstract translation: 本公开提供了用于提供多级多状态快门组件的系统，方法和装置。 快门组件至少包括位于衬底上的第一高度处的第一快门和在衬底上的第二高度处的第二快门。 第一快门和第二快门都可以在打开或关闭状态下操作，以通过或部分阻挡通过孔传播的光。 在一些实施方案中，快门组件可以以四种状态操作：基于第一和第二快门的打开或关闭状态的完全透射状态，完全阻塞状态和两个部分透射状态。

公开(公告)号：US20140210864A1

公开(公告)日：2014-07-31

申请号：US13754548

申请日：2013-01-30

Applicant: PIXTRONIX, INC.

Inventor： Javier Villarreal ,  Timothy J. Brosnihan ,  Jasper L. Steyn ,  Richard S. Payne ,  Stephen R. Lewis

IPC: G02B26/02 ,  G09G3/22

CPC classification number: G02B26/02 ,  B81B3/007 ,  B81B2201/045 ,  B81B2203/0163 ,  B81B2203/051 ,  B81C2201/053 ,  B81C2201/112 ,  G02B26/023 ,  G09G3/22

Abstract: This disclosure provides systems, methods and apparatus for providing relatively thinner and less stiff compliant beams for a shutter assembly. A protective coating is deposited and patterned over the shutter assembly before it is released from a sacrificial mold over which the shutter assembly is formed. Because some primary surfaces of the compliant beams are in contact with the sacrificial mold, these primary surfaces are not coated with the protective coating. Therefore, when the shutter assembly is finally released, the resulting compliant beams are relatively thinner and less stiff providing a reduction in an actuation voltage used to operate the shutter assembly. In some instances, the protective coating is patterned into discontinuous segments before release.

Abstract translation: 本公开提供了用于为快门组件提供相对较薄且较不硬的柔性梁的系统，方法和装置。 在从快门组件形成的牺牲模具释放之前，将保护涂层沉积并在其上形成图案。 由于柔性梁的一些主表面与牺牲模具接触，所以这些主表面没有涂覆保护涂层。 因此，当快门组件最终被释放时，所产生的柔性梁相对较薄并且较不硬，从而降低用于操作闸板组件的致动电压。 在一些情况下，保护性涂层在释放之前被图案化成不连续段。