公开(公告)号：US06801561B2

公开(公告)日：2004-10-05

申请号：US09960875

申请日：2001-09-21

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： H01S3223

CPC分类号： H01S3/225 ,  H01S3/1055 ,  H01S3/106

摘要： An excimer or molecular fluorine laser system a wavefront compensating optic within its resonator for adjusting the curvature of the wavefront of the beam for compensating wavefront distortions and thereby enhancing the spectral purity of the beam. The wavefront compensating optic may be a plate, such as a null lens. One or both surfaces of the null lens may be adjustable and/or have an adjustable curvature for controlling the wavefront distortion compensation. A multi-compartment enclosure may be included having at least one optical component of the line-narrowing unit within each compartment. An atmosphere within at least one compartment is preferably controlled for controlling the spectral purity of the beam by controlling an amount of wavefront distortion compensation. The wavefront compensating optic may be sealably disposed between adjacent compartments.

摘要翻译： 准分子或分子氟激光系统在其谐振器内的波前补偿光学器件，用于调整波束的波前的曲率以补偿波前失真，从而增强光束的光谱纯度。 波前补偿光学元件可以是板，例如零透镜。 零透镜的一个或两个表面可以是可调节的和/或具有用于控制波前失真补偿的可调曲率。 可以包括多隔室外壳，其具有每个隔室内的线条变窄单元的至少一个光学部件。 优选地控制至少一个室内的气氛，以通过控制波前失真补偿量来控制光束的光谱纯度。 波前补偿光学元件可以密封地设置在相邻的隔室之间。

公开(公告)号：US06717973B2

公开(公告)日：2004-04-06

申请号：US09883097

申请日：2001-06-13

申请人： Dirk Basting ,  Sergei Govorkov ,  Juergen Kleinschmidt ,  Peter Lokai ,  Uwe Stamm

发明人： Dirk Basting ,  Sergei Govorkov ,  Juergen Kleinschmidt ,  Peter Lokai ,  Uwe Stamm

IPC分类号： H01S320

CPC分类号： H01S3/225 ,  B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/4257 ,  G03F7/70025 ,  G03F7/70558 ,  G03F7/70808 ,  H01S3/0014 ,  H01S3/0315 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/1062 ,  H01S3/134 ,  H01S3/137 ,  H01S3/2258

摘要： A F2-laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.

摘要翻译： F2激光器包括填充有包括分子氟的气体混合物的放电室，用于在包括初级线和次级线的157nm和158nm之间的波长范围内产生光谱发射，多个电极与用于生产的电源电路 用于激发分子氟的脉冲放电，包括放电室的谐振器和用于产生具有小于1ms的带宽的激光束的干涉仪，以及耦合在反馈环路中的波长监测器，用于监测光谱分布 的激光束。 处理器基于监测的光谱分布来控制干涉测量装置的干涉光谱，使得光谱分布内的边带基本上最小化。

公开(公告)号：US06700915B2

公开(公告)日：2004-03-02

申请号：US09843604

申请日：2001-04-25

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： H01S3225

CPC分类号： G03F7/70025 ,  H01S3/1392 ,  H01S3/225

摘要： A gas discharge laser system for generating a laser beam, such as an excimer or molecular fluorine laser system, includes a laser resonator with an optical element for making wavefront corrections such as an adaptable optical element, a phase conjugating mirror, or a retroreflector array. The resonator preferably also has one or more line-narrowing optical elements for narrowing the bandwidth of the laser beam. One of the resonator reflectors or a transmissive or reflective intracavity optical element of the laser may include the adaptable optical element, phase conjugating mirror or retroreflector plate. A beam expander may be disposed before the adaptable optical element, phase conjugating mirror or retroreflector array for increasing the radius of curvature of the wavefront of the laser beam. A detection and control system including a processor and a detector may be used for controlling the contour of the wavefront correcting optical element in a feedback loop.

摘要翻译： 用于产生激光束的气体放电激光系统，例如受激准分子或分子氟激光系统，包括具有用于进行波前校正的光学元件的激光谐振器，例如适应性光学元件，相位共轭反射镜或后向反射器阵列。 谐振器优选地还具有用于使激光束的带宽变窄的一个或多个线狭窄的光学元件。 谐振器反射器之一或激光器的透射或反射腔内光学元件可以包括适应性光学元件，相位共轭反射镜或后向反射板。 光束扩展器可以设置在适应光学元件，相位共轭反射镜或后向反射器阵列之前，用于增加激光束的波前的曲率半径。 可以使用包括处理器和检测器的检测和控制系统来控制反馈回路中的波前校正光学元件的轮廓。

公开(公告)号：US08975543B2

公开(公告)日：2015-03-10

申请号：US13129173

申请日：2009-11-17

申请人： Frank Hakemeyer ,  Christian Starke ,  Juergen Kleinschmidt

发明人： Frank Hakemeyer ,  Christian Starke ,  Juergen Kleinschmidt

IPC分类号： H01H19/00 ,  H01H21/00 ,  H03J1/06 ,  G04C23/46 ,  H01H19/02 ,  H01H19/03 ,  H01H19/58

CPC分类号： H03J1/06 ,  G04C23/46 ,  H01H19/001 ,  H01H19/025 ,  H01H19/03 ,  H01H19/585

摘要： An electric terminal module includes a plurality of electric contact elements configured to connect to electric conductors and a housing including an opening in at least one side wall thereof. A printed circuit board is disposed in the housing. The printed circuit board includes a circuit arrangement having a plurality of electric components configured to perform a specific function and a mount. An adjusting device is operable to change at least one electric characteristic quantity of the circuit arrangement. The adjusting device is mounted directly onto the printed circuit board on the mount and is operable from outside the housing through the opening so as to swivel or turn.

摘要翻译： 电气端子模块包括被配置为连接到电导体的多个电接触元件和在其至少一个侧壁中包括开口的壳体。 印刷电路板设置在壳体中。 印刷电路板包括具有被配置为执行特定功能的多个电气部件和安装件的电路装置。 调节装置可操作以改变电路装置的至少一个电特性量。 调节装置直接安装在安装座上的印刷电路板上，并可通过开口从壳体的外部操作以便旋转或转动。

公开(公告)号：US08426834B2

公开(公告)日：2013-04-23

申请号：US13239564

申请日：2011-09-22

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： G01J3/10

CPC分类号： H05G2/008 ,  H05G2/003

摘要： The invention relates to a method and an apparatus for generating EUV radiation from a gas discharge plasma. The object of the invention, to generate EUV radiation from a gas discharge plasma by with is optimized conversion efficiency of the EUV emission while locally limiting the electric discharge channel, is met in that a channel-generating beam of pulsed high-energy radiation is supplied in at least two partial beams which are focused in a pulse-synchronized manner into a superposition region along a spacing axis between the electrodes, and an electrically conductive discharge channel is generated along the superposition region due to an ionization at least of a buffer gas present in the discharge space, wherein the pulsed high-energy radiation of the channel-generating beam is triggered in such a way that the discharge channel is generated before a discharge current pulse has reached its maximum value.

摘要翻译： 本发明涉及一种用于从气体放电等离子体产生EUV辐射的方法和装置。 本发明的目的是为了从气体放电等离子体产生EUV辐射，在局部限制放电通道的同时，优化了EUV发射的转换效率，因为提供了脉冲高能辐射的通道产生束 在沿着电极之间的间隔轴以脉冲同步方式聚焦成叠加区域的至少两个部分光束中，并且由于至少存在缓冲气体的电离而沿着叠加区域产生导电放电通道 在放电空间中，其中以使得在放电电流脉冲已经达到其最大值之前产生放电通道的方式触发通道产生束的脉冲高能辐射。

公开(公告)号：USD626516S1

公开(公告)日：2010-11-02

申请号：US29346208

申请日：2009-10-28

申请人： Frank Hakemeyer ,  Christian Starke ,  Juergen Kleinschmidt

设计人： Frank Hakemeyer ,  Christian Starke ,  Juergen Kleinschmidt

公开(公告)号：US07541604B2

公开(公告)日：2009-06-02

申请号：US11560118

申请日：2006-11-15

申请人： Sven Goetze ,  Harald Ebel ,  Juergen Kleinschmidt ,  Imtiaz Ahmad

发明人： Sven Goetze ,  Harald Ebel ,  Juergen Kleinschmidt ,  Imtiaz Ahmad

IPC分类号： H01J17/26 ,  H01J35/00

CPC分类号： H01J17/28 ,  H01J7/26 ,  H05G2/003

摘要： The invention is directed to an arrangement for the generation of short-wavelength radiation based on a hot plasma generated by gas discharge and to a method for the production of coolant-carrying electrode housings. It is the object of the invention to find a novel possibility for gas discharge based short-wavelength radiation sources with high average radiation output in quasi-continuous discharge operation by which efficient cooling principles can be implemented using inexpensive and simple means in order to prevent a temporary melting of the electrode surfaces and, therefore, to ensure a long lifetime of the electrodes. According to the invention, this object is met in that special cooling channels for circulating coolant are integrated in electrode collars of the electrode housings. The cooling channels are advanced radially up to within a few millimeters of the highly thermally stressed surface regions and are connected by necked-down channel portions which are arranged coaxial to the axis of symmetry and which are provided with channel structures for increasing the inner surface and for increasing the flow rate of the coolant.

摘要翻译： 本发明涉及一种用于产生基于由气体放电产生的热等离子体的短波长辐射的装置以及用于制造承载冷却剂的电极壳体的方法。 本发明的目的是在准连续放电操作中找到具有高平均辐射输出的基于气体放电的短波长辐射源的新颖可能性，通过该方法可以使用廉价和简单的方法来实现有效的冷却原理，以便防止 暂时熔化电极表面，因此确保电极寿命长。 根据本发明，由于用于循环冷却剂的特殊冷却通道集成在电极壳体的电极环中，所以满足了该目的。 冷却通道从高度受热应力的表面区域径向推进到几毫米以内，并且通过与对称轴线同轴设置的颈缩通道部分连接，并且设置有用于增加内表面的通道结构， 以增加冷却剂的流量。

公开(公告)号：US20060273732A1

公开(公告)日：2006-12-07

申请号：US11421144

申请日：2006-05-31

申请人： Vladimir Korobochko ,  Alexander Keller ,  Juergen Kleinschmidt

发明人： Vladimir Korobochko ,  Alexander Keller ,  Juergen Kleinschmidt

IPC分类号： H01J7/24 ,  H05B31/26

CPC分类号： H05G2/003 ,  H05G2/005

摘要： The invention is directed to an arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma. It is the object of the invention to find a novel possibility for generating intensive short-wavelength radiation, particularly EUV radiation, based on a gas discharge plasma which achieves a long life of the electrode system along with a high total efficiency of the radiation source without substantially increasing the dimensions of the discharge unit. This object is met, according to the invention, in that exclusively suitably shaped vacuum insulation areas which have the shape of an annular gap and which are formed depending on the product of gas pressure (p) and interelectrode distance (d) between the cathode and anode are provided for insulating the cathode and anode from one another in a cylindrically symmetric electrode arrangement for reliable suppression of electron arcing.

摘要翻译： 本发明涉及一种用于产生基于气体放电等离子体的强烈的短波长辐射的装置。 本发明的目的是发现基于气体放电等离子体产生强烈的短波长辐射，特别是EUV辐射的新型可能性，其能够实现电极系统的长寿命以及辐射源的高总效率而没有 大大增加了放电单元的尺寸。 根据本发明，符合本发明的目的在于，具有环形间隙形状的完全合适形状的真空绝缘区域，其取决于气体压力（p）和阴极和（d）之间的电极间距离（d）的乘积而形成 阳极被提供用于将阴极和阳极彼此隔离成圆柱形对称电极布置，以可靠地抑制电子弧。

公开(公告)号：US06946669B2

公开(公告)日：2005-09-20

申请号：US10772910

申请日：2004-02-05

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： H05G2/00 ,  G21J1/00 ,  G21K5/00

CPC分类号： H05G2/003

摘要： The arrangement for generating EUV radiation based on electrically triggered gas discharges with high repetition rates and high average outputs. The object of the invention, to find a novel possibility for generating EUV radiation based on a gas discharge pumped plasma which permits the generation of EUV pulse sequences with a pulse repetition frequency of greater than 5 kHz at pulse energies of at least 10 mJ/sr without having to tolerate increased electrode wear, is met according to the invention in that a plurality of source modules of identical construction, each of which generates a radiation-emitting plasma and has bundled EUV radiation, are arranged in a vacuum chamber so as to be uniformly distributed around an optical axis of the source in its entirety in order to provide successive radiation pulses at a point on the optical axis, so that a reflector device which is supported so as to be rotatable around the optical axis deflects the radiation delivered by the source modules in the direction of the optical axis successively with respect to time. A synchronization device triggers the source modules in a circularly successive manner depending upon the actual rotational position of the reflector device and adjusts a preselected pulse repetition frequency by means of the rotating speed.

摘要翻译： 基于电触发气体放电产生具有高重复率和高平均输出的EUV辐射的装置。 本发明的目的是为了发现基于气体放电泵浦等离子体产生EUV辐射的新颖可能性，其允许以至少10mJ / s的脉冲能量产生具有大于5kHz的脉冲重复频率的EUV脉冲序列 根据本发明，不需要耐受增加的电极磨损，因为具有相同结构的多个源模块，每个源模块都产生辐射发射等离子体并且具有捆绑的EUV辐射，被布置在真空室中，以便是 整体上围绕光源的光轴均匀分布，以便在光轴上的一个点处提供连续的辐射脉冲，使得被支撑为可围绕光轴旋转的反射器装置偏转由光轴传送的辐射 源模块相对于时间连续地在光轴的方向上。 同步装置根据反射器装置的实际旋转位置以循环连续的方式触发源模块，并通过转速调节预选的脉冲重复频率。

公开(公告)号：US06914920B2

公开(公告)日：2005-07-05

申请号：US10360372

申请日：2003-02-07

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： H01S3/097 ,  H01S3/225 ,  H01S3/10 ,  G05F1/00 ,  H01S3/13 ,  H01S3/22 ,  H01S3/223

CPC分类号： H01S3/09705 ,  H01S3/225

摘要： The invention is directed to a method for the energy stabilization of a gas discharge-pumped radiation source that is operated in defined pulse sequences, particularly for suppression of overshooting and undershooting of excimer lasers and EUV radiation sources in burst operation. It is the object of the invention to find a novel possibility for the stabilization of the energy emission of a gas discharge-pumped radiation source that is operated in defined pulse sequences (bursts) which makes it possible to take into account a temporary behavior of the radiation source at the beginning of every burst without repeated recalibration of the energy-voltage curve. In a method with proportional regulation of the charging voltage as a function of the measured pulse energy, the object stated above is met according to the invention in that the pulse energy En(p) to be adjusted for a current pulse in the current burst is calculated from the pulse energy of the preceding pulse in the current burst and an identical pulse En(p-1) of a preceding precursor burst, wherein the precursor burst is an unregulated model burst and the high voltage which is to be adjusted currently for the current pulse is calculated from the current pulse energy En(p) by dividing by the rise dE/dU of the function of the pulse energy depending on the charging voltage in the linear operating range of the radiation source.

摘要翻译： 本发明涉及一种用于以限定的脉冲序列操作的气体放电泵浦辐射源的能量稳定的方法，特别是用于在突发操作中抑制准分子激光器和EUV辐射源的过冲和下冲。 本发明的目的是找到一种新颖的可能性，用于稳定以限定的脉冲序列（脉冲串）操作的气体放电泵浦辐射源的能量发射，这使得有可能考虑到 辐射源在每次突发开始时不会重复重新校准能量 - 电压曲线。 在根据本发明的充电电压成比例地调节作为测量脉冲能量的函数的方法中，符合上述目的，因为脉冲能量E（p）< 根据当前脉冲串中的先前脉冲的脉冲能量和相同的脉冲E（n-1）来计算当前脉冲串中的电流脉冲的“/ SUP” / SUP>，其中前兆脉冲串是未调节的模型脉冲串，并且根据当前脉冲能量E SUP计算当前针对当前脉冲要调整的高电压 >（p）除以脉冲能量的函数的上升dE / dU，这取决于在辐射源的线性工作范围内的充电电压。