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公开(公告)号：US6147177A
公开(公告)日：2000-11-14
申请号：US253497
申请日：1999-02-19
申请人： Saikumar Jayaraman , Brian Leslie Goodall , Larry Funderburk Rhodes , Robert Adam Shick , Richard Vicari , Robert David Allen , Juliann Opitz , Ratnam Sooriyakumaran , Thomas Wallow
发明人： Saikumar Jayaraman , Brian Leslie Goodall , Larry Funderburk Rhodes , Robert Adam Shick , Richard Vicari , Robert David Allen , Juliann Opitz , Ratnam Sooriyakumaran , Thomas Wallow
IPC分类号： C08F4/80 , C08F32/08 , C08F232/08 , C08G61/06 , C08G61/08 , G03F7/004 , G03F7/038 , G03F7/039 , C08F132/08
CPC分类号： C08F232/08 , C08G61/08 , G03F7/0045 , G03F7/0382 , G03F7/039 , Y10S430/115
摘要： Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
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公开(公告)号：US08754139B2
公开(公告)日：2014-06-17
申请号：US12390127
申请日：2009-02-20
申请人： Robert David Allen , Na Young-Hye , Ratnam Sooriyakumaran , Masaki Fujiwara , Kazuhiro Yamanaka
发明人： Robert David Allen , Na Young-Hye , Ratnam Sooriyakumaran , Masaki Fujiwara , Kazuhiro Yamanaka
IPC分类号： C08J5/20
CPC分类号： C08G69/28 , B01D61/025 , B01D61/027 , B01D67/0006 , B01D69/02 , B01D69/125 , B01D71/56 , B01D2323/40 , B01D2325/30 , C08G69/26 , C08G69/42 , Y02A20/131
摘要： A polymeric membrane includes an active layer on a support. The active layer includes a polymer with a backbone, and the backbone has attached thereto at least one fluoroalcohol moiety.
摘要翻译： 聚合物膜包括载体上的活性层。 活性层包括具有主链的聚合物，并且主链已连接至少一个氟代醇部分。
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公开(公告)号：US08168366B2
公开(公告)日：2012-05-01
申请号：US12253072
申请日：2008-10-16
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/60 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.
摘要翻译： 本发明涉及一种辐射敏感光刻胶组合物。 组合物包含包含至少两种单体的聚合物。 第一单体具有酸可裂解的叔酯基。 第二单体是酸性单体。 聚合物的酸可裂解酯基具有惊人的低活化能，这导致光刻工艺中抗蚀剂图像的改善。
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14.发明授权Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials 有权基于多面体低聚倍半硅氧烷的压印材料和使用多面体低聚倍半硅氧烷的压印材料的压印工艺公开(公告)号：US08026293B2
公开(公告)日：2011-09-27
申请号：US12053893
申请日：2008-03-24
申请人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
发明人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
IPC分类号： C08F283/12
CPC分类号： B05D3/067 , C09D183/04 , C09D183/06 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/311 , H01L21/3122 , H01L21/31695 , H01L21/76807 , H01L21/76817 , H01L21/7682 , H01L2221/1047 , H05K3/1258
摘要： A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.
摘要翻译： 通过压印基于倍半硅氧烷的可聚合组合物形成低介电对比度结构的方法。 所述印记组合物包括：一个或多个多面体倍半硅氧烷低聚物，其各自具有一个或多个可聚合基团，其中所述一个或多个可聚合基团中的每一个与所述一个或多个多面体倍半硅氧烷低聚物的不同硅原子结合; 和一种或多种可聚合稀释剂，所述稀释剂占组合物的至少50重量％。
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公开(公告)号：US07910290B2
公开(公告)日：2011-03-22
申请号：US12128129
申请日：2008-05-28
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译： 使用面漆组合物形成图像的方法。 提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。
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公开(公告)号：US20110008727A1
公开(公告)日：2011-01-13
申请号：US12253072
申请日：2008-10-16
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/60 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.
摘要翻译： 本发明涉及一种辐射敏感光刻胶组合物。 组合物包含包含至少两种单体的聚合物。 第一单体具有酸可裂解的叔酯基。 第二单体是酸性单体。 聚合物的酸可裂解酯基具有惊人的低活化能，这导致光刻工艺中抗蚀剂图像的改善。
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17.发明授权Low activation energy dissolution modification agents for photoresist applications 有权用于光刻胶应用的低活化能溶解改性剂公开(公告)号：US07358029B2
公开(公告)日：2008-04-15
申请号：US11239507
申请日：2005-09-29
申请人： Robert David Allen , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert David Allen , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
CPC分类号： G03F7/0045 , C07J9/005 , C07J17/00 , G03F7/0392 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/115
摘要： A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution modification agent composition. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups.
摘要翻译： 包括聚合物，光致酸产生剂和溶解改性剂的光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图像的方法和溶解改性剂组合物。 溶解改性剂不溶于含水碱性显影剂中，并且抑制聚合物在显影剂中的溶解，直至酸被光致酸性发生剂暴露于光化辐射为止，因此溶解改性剂在合适的温度下变得可溶于显影剂， 允许聚合物溶解在显影剂中。 DMA是用酸不稳定的乙氧基乙基，四氢呋喃基和天竺葵酰基保护的葡糖苷，胆酸盐，柠檬酸盐和金刚烷二羧酸盐。
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公开(公告)号：USRE38282E1
公开(公告)日：2003-10-21
申请号：US09895624
申请日：2001-06-28
IPC分类号： G03F7004
CPC分类号： G03F7/0758 , G03F7/0045 , Y10S430/111
摘要： The invention relates to a process for forming bilayer resist images with a chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation-sensitive acid generator and a vinyl polymer having an acid-cleavable silylethoxy group and (ii) an organic underlayer. The bilayer resist is used in the manufacture of integrated circuits.
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公开(公告)号：US06177228B1
公开(公告)日：2001-01-23
申请号：US08928308
申请日：1997-09-12
申请人： Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas I. Wallow , Gregory Michael Wallraff
发明人： Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas I. Wallow , Gregory Michael Wallraff
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/107 , Y10S430/111
摘要： The present invention relates to a radiation-sensitive resist composition comprising a radiation-sensitive acid generator and a copolymer binder formed by the reaction of (a) an acrylate or methacrylate monomer having a photogenerated acid cleavable substituent and (b) an acrylate or methacrylate monomer having a polar non photoacid cleavable substituent.
摘要翻译： 本发明涉及一种辐射敏感抗蚀剂组合物，其包含辐射敏感性酸产生剂和通过（a）具有光生酸可切割取代基的丙烯酸酯或甲基丙烯酸酯单体与（b）丙烯酸酯或甲基丙烯酸酯单体的反应形成的共聚物粘合剂 具有极性非光致酸可切割取代基。
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20.发明申请POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IMPRINT PROCESS USING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS 失效基于聚硅氧烷基硅烷基紫外线的印刷材料的聚合低密度硅树脂基印刷材料和印刷工艺公开(公告)号：US20110256713A1
公开(公告)日：2011-10-20
申请号：US13170221
申请日：2011-06-28
申请人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
发明人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
IPC分类号： H01L21/288 , H01L21/283
CPC分类号： B05D3/067 , C09D183/04 , C09D183/06 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/311 , H01L21/3122 , H01L21/31695 , H01L21/76807 , H01L21/76817 , H01L21/7682 , H01L2221/1047 , H05K3/1258
摘要： A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; andone or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.
摘要翻译： 通过压印基于倍半硅氧烷的可聚合组合物形成低介电对比度结构的方法。 所述印记组合物包括：一个或多个多面体倍半硅氧烷低聚物，其各自具有一个或多个可聚合基团，其中所述一个或多个可聚合基团中的每一个与所述一个或多个多面体倍半硅氧烷低聚物的不同硅原子结合; 和一种或多种可聚合稀释剂，所述稀释剂占组合物的至少50重量％。
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