公开(公告)号：US20240319595A1

公开(公告)日：2024-09-26

申请号：US18612246

申请日：2024-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoon PARK ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hyeran KIM ,  Chanjae AHN ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:




A description of Formula 1 is provided herein.

公开(公告)号：US20240319594A1

公开(公告)日：2024-09-26

申请号：US18493192

申请日：2023-10-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chanjae AHN ,  Cheol KANG ,  Minsang KIM ,  Beomseok KIM ,  Changki KIM ,  Hana KIM ,  Hyeran KIM ,  Changheon LEE ,  Sungwon CHOI ,  Hyunseok CHOI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F212/28 ,  C08F220/1806 ,  C08F220/1807 ,  G03F7/038

Abstract: Provided are a resist composition and a pattern forming method using the same. The resist composition includes a polymer including a first repeating unit repeating unit Formula 1, a photoacid generator, and an organic solvent.




In Formula 1, L11 to L13, a11 to a13, A11 to A13, R11 to R14, b12 to b14, and p are the same as described in the detailed description.

公开(公告)号：US20240317672A1

公开(公告)日：2024-09-26

申请号：US18483911

申请日：2023-10-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dmitry ANDROSOV ,  Cheol KANG ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Beomseok KIM ,  Hana KIM ,  Hoyoon PARK

IPC: C07C69/94 ,  G03F7/038 ,  G03F7/039

CPC classification number: C07C69/94 ,  G03F7/0385 ,  G03F7/039 ,  C07C2601/08 ,  C07C2603/54

Abstract: Disclosed are a polycarboxylate compound represented by Formula 1 below, a resist composition including the same, and a method of forming a pattern using the same.




In Formula 1, A11, X11, m11, n11, R13 and b13 are as described in the specification.

公开(公告)号：US20240234031A1

公开(公告)日：2024-07-11

申请号：US18351171

申请日：2023-07-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Narae HAN ,  Jeonggyu SONG ,  Beomseok KIM ,  Cheheung KIM ,  Haeryong KIM ,  Jooho LEE

IPC: H01G4/10 ,  H01L29/51 ,  H01L29/94 ,  H10B12/00

CPC classification number: H01G4/10 ,  H01L28/60 ,  H01L28/65 ,  H01L29/511 ,  H01L29/517 ,  H01L29/94 ,  H10B12/31 ,  H01G4/008

Abstract: A semiconductor device includes a first electrode, a second electrode spaced apart from the first electrode, a dielectric layer between the first electrode and the second electrode and including a metal oxide represented by MaOb, and a leakage current reducing layer on the dielectric layer between the first electrode and the second electrode and including an inorganic compound represented by Alx1Lx2Oy1Xy2, where a, b, M, L, X, x1, x2, y1, and y2 are as described in the description.

公开(公告)号：US20240170212A1

公开(公告)日：2024-05-23

申请号：US18350600

申请日：2023-07-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeonggyu SONG ,  Eunae CHO ,  Narae HAN ,  Beomseok KIM ,  Cheheung KIM ,  Jooho LEE ,  Wonsik CHOI

IPC: H01G4/10 ,  H01L29/51 ,  H01L29/94 ,  H10B12/00

CPC classification number: H01G4/10 ,  H01L28/60 ,  H01L28/65 ,  H01L29/511 ,  H01L29/517 ,  H01L29/94 ,  H10B12/31 ,  H01G4/1236

Abstract: A capacitor, a semiconductor device, and an electronic apparatus including the semiconductor device are disclosed. The capacitor includes a first electrode; a second electrode disposed apart from the first electrode; a dielectric film between the first electrode and the second electrode; and a leakage current reducing layer provided on the dielectric film between the first electrode and the second electrode and including MxAlyOz.

公开(公告)号：US20240124635A1

公开(公告)日：2024-04-18

申请号：US18164841

申请日：2023-02-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Beomseok KIM ,  Chanjae AHN ,  Jungha CHAE ,  Sungwon CHOI

IPC: C08F228/06 ,  G03F7/038 ,  G03F7/20

CPC classification number: C08F228/06 ,  G03F7/038 ,  G03F7/2004

Abstract: Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2, and free of a repeating unit of which a structure changes by an acid:




In Formulae 1 and 2, R11 to R16, b12, X−, R21 to R24, b22, and Y are as described in the specification.

公开(公告)号：US20220237833A1

公开(公告)日：2022-07-28

申请号：US17717937

申请日：2022-04-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Gyehyun KIM ,  Yoonhee CHOI ,  Keunjoo KWON ,  Beomseok KIM ,  Sangwon LEE ,  Youjin LEE ,  Taeyoung JANG

IPC: G06T11/00 ,  G06T7/50 ,  G06K9/62 ,  G06T11/60

Abstract: A system and method for providing a weather effect in an image includes selecting at least one weather texture image indicating weather, and providing a weather effect in the image by overlapping the selected weather texture image on the image.