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公开(公告)号：US20210028035A1
公开(公告)日：2021-01-28
申请号：US16833903
申请日：2020-03-30
Applicant: Samsung Electronics Co., Ltd.
Inventor： Myungjun Lee , Wookrae Kim , Jaehwang Jung , Myoungki Ahn
Abstract: Provided is an imaging ellipsometry (IE)-based inspection method including selecting a mode from among a first mode of an IE-based inspection device having a first field of view (FOV) and a second mode of an IE-based inspection device having a second FOV, measuring an inspection target by the IE-based inspection device based on the selected mode, and determining whether the inspection target is normal based on a result of the measuring, wherein the measuring of the inspection target comprises simultaneously measuring patterns included in a plurality of cells provided in a region of the inspection target, the region corresponding to an FOV of the selected mode.
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12.发明公开公开(公告)号：US20240353795A1
公开(公告)日：2024-10-24
申请号：US18736084
申请日：2024-06-06
Applicant: Samsung Electronics Co., Ltd.
Inventor： Seungbeom PARK , Sungmin Park , Jaehyeon Son , Heejun Ahn , Myungjun Lee
CPC classification number: G03H1/0005 , G01N21/9501 , G01N21/9503 , G02B21/0016 , G03H1/0443 , G03H1/16 , H01L22/12 , G03H2001/005 , G03H2001/045 , G03H2001/0452
Abstract: Provided is a holographic microscope including an input optical system configured to emit polarized input beam, a first beam splitter configured to emit an object beam by reflecting a portion of the polarized input beam, and emit a reference beam by transmitting a remaining portion of the polarized input beam, a reference optical system configured to separate the reference beam into a first reference beam and a second reference beam, a camera configured to receive the first reference beam and the second reference beam and the object beam that is reflected by an inspection object, the camera including a micro polarizer array, wherein a first polarization axis of the first reference beam is perpendicular to a second polarization axis of the second reference beam.
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公开(公告)号：US12038718B2
公开(公告)日：2024-07-16
申请号：US17060526
申请日：2020-10-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seungbeom Park , Sungmin Park , Jaehyeon Son , Heejun Ahn , Myungjun Lee
CPC classification number: G03H1/0005 , G01N21/9501 , G01N21/9503 , G02B21/0016 , G03H1/0443 , G03H1/16 , H01L22/12 , G03H2001/005 , G03H2001/045 , G03H2001/0452
Abstract: Provided is a holographic microscope including an input optical system configured to emit polarized input beam, a first beam splitter configured to emit an object beam by reflecting a portion of the polarized input beam, and emit a reference beam by transmitting a remaining portion of the polarized input beam, a reference optical system configured to separate the reference beam into a first reference beam and a second reference beam, a camera configured to receive the first reference beam and the second reference beam and the object beam that is reflected by an inspection object, the camera including a micro polarizer array, wherein a first polarization axis of the first reference beam is perpendicular to a second polarization axis of the second reference beam.
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公开(公告)号：US11972960B2
公开(公告)日：2024-04-30
申请号：US16833903
申请日：2020-03-30
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun Lee , Wookrae Kim , Jaehwang Jung , Myoungki Ahn
CPC classification number: H01L21/67288 , G01N21/211 , G01N21/9501 , G06T7/001 , H01L22/12 , G01N2021/1765 , G01N2201/12 , G01N2201/13 , G06T2207/30148
Abstract: Provided is an imaging ellipsometry (IE)-based inspection method including selecting a mode from among a first mode of an IE-based inspection device having a first field of view (FOV) and a second mode of an IE-based inspection device having a second FOV, measuring an inspection target by the IE-based inspection device based on the selected mode, and determining whether the inspection target is normal based on a result of the measuring, wherein the measuring of the inspection target comprises simultaneously measuring patterns included in a plurality of cells provided in a region of the inspection target, the region corresponding to an FOV of the selected mode.
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公开(公告)号：US11275034B2
公开(公告)日：2022-03-15
申请号：US17022249
申请日：2020-09-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kyungwon Yun , Taewan Kim , Seungbeom Park , Jaehyeon Son , Myungjun Lee , Jaehwang Jung
IPC: G01N21/956 , G01N21/45
Abstract: An inspection apparatus includes: a light source that generates and outputs light; a stage on which an inspection target is arranged; an irradiation optical system that irradiates light from the light source to the inspection target; a detector that receives the light diffracted from the inspection target and generates diffraction image; and a detector moving device configured to move the detector on a z-axis, which is an optical axis of the light, and an x-y plane perpendicular to the z-axis. Furthermore, while the detector moves on the x-y plane and the z-axis through the detector moving device, the detector generates a plurality of the diffraction images with different positions on the x-y plane and the z-axis with respect to the inspection target, and thus simultaneously implements phase retrieval and super resolution of diffraction images.
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Patent Agency Ranking
公开(公告)号：US20210396510A1
公开(公告)日：2021-12-23
申请号：US17156049
申请日：2021-01-22
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kwangsoo Kim , Sungyoon Ryu , Daejun Park , Seong Yun , Seungryeol Oh , Sujin Lee , Jaeyong Lee , Minho Rim , Chungsam Jun , Myungjun Lee
Abstract: Provided is a through-focus image-based metrology device including an optical device, and a computing device configured to acquire at least one through-focus image of a target from the optical device, generate an intensity profile based on the acquired at least one through-focus image, and perform metrology on the target based on the generated intensity profile, wherein the optical device includes a stage on which the target is disposed, the stage being configured to move by one step in at least one direction based on control of the computing device, and to acquire the at least one through-focus image, an image sensor disposed on the stage, an objective lens disposed between the image sensor and the stage, the objective lens being configured to transmit reflected light from the target, and a light source configured to emit illumination light to the target through the objective lens.
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公开(公告)号：US12228499B2
公开(公告)日：2025-02-18
申请号：US18111229
申请日：2023-02-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang Jung , Yasuhiro Hidaka , Mitsunori Numata , Wookrae Kim , Jinseob Kim , Myungjun Lee
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US12002698B2
公开(公告)日：2024-06-04
申请号：US17174731
申请日：2021-02-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun Lee , Changhyeong Yoon , Wookrae Kim , Jaehwang Jung , Jinseob Kim
CPC classification number: H01L21/67288 , G01N21/4788 , G01N21/8851 , G01N21/9501 , G01N2201/021 , G01N2201/0636 , G06N20/00
Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.
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公开(公告)号：US20240060907A1
公开(公告)日：2024-02-22
申请号：US18340394
申请日：2023-06-23
Applicant: Samsung Electronics Co., Ltd.
Inventor： Youngsun Choi , Soonyang Kwon , Kwangrak Kim , Jiwoong Kim , Jangryul Park , Myungjun Lee
CPC classification number: G01N21/9501 , G01N21/31 , G01N2201/068 , G02B21/248
Abstract: In a focus control method of a spectroscopic measuring apparatus, the spectroscopic measuring apparatus having a first objective lens and a second objective lens equipped with a microsphere is provided. A sample is placed on a stage. A spectrum is obtained while moving the second objective lens vertically downward. A light intensity function that changes with a distance from a sample surface is obtained from the spectrum. A focal position of the second objective lens is determined from a threshold value of the light intensity function.
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公开(公告)号：US20230408401A1
公开(公告)日：2023-12-21
申请号：US18194909
申请日：2023-04-03
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jaehyeon Son , Jinwoo Ahn , Juntaek Oh , Hankyoul Moon , Myungjun Lee , Eunsoo Hwang
CPC classification number: G01N21/211 , G01J4/04 , G01B11/24 , G01N2021/213
Abstract: In a method of measuring an alignment error, light is incident on a surface of a reference wafer having a known polarization transmittance at the surface. An image signal is obtained from the reference wafer at a set of angles including a first combination of values of a polarizer angle and an analyzer angle. Polarization transmittance of optical equipment including a polarizer and an analyzer is calculated from the image signal of the reference wafer. Light is incident on a surface of a measurement target wafer having a structure on the surface thereof. An image signal is obtained from the measurement wafer at a set of angles including a second combination of values of the polarizer angle and the analyzer angle. At least a portion of Mueller matrix is generated from the image signal of the measurement wafer.
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