BiCMOS tri-state output driver
    11.
    发明授权
    BiCMOS tri-state output driver 失效
    BiCMOS三态输出驱动器

    公开(公告)号:US5512847A

    公开(公告)日:1996-04-30

    申请号:US321012

    申请日:1994-10-06

    摘要: In an input level converter for TTL--CMOS level conversion (or other conversion to CMOS) for an internal logic block operating with CMOS levels, an output transistor for executing the charge or discharge of the output capacitance thereof is formed of a bipolar transistor. Thus, the propagation delay times and their capacitance-dependencies of the input level converter can be lessened. Similarly, in an output level converter for CMOS--TTL level conversion (or other conversion from CMOS) for the internal logic block operating with the CMOS levels, an output transistor for executing the charge or discharge of the output load capacitance thereof is formed of a bipolar transistor. Thus, the propagation delay times and their capacitance-dependencies of the output level converter can also be lessened.

    摘要翻译: 在用于CMOS电平工作的内部逻辑块的TTL-CMOS电平转换(或其他转换为CMOS)的输入电平转换器中,用于执行其输出电容的充电或放电的输出晶体管由双极晶体管形成。 因此,可以减小输入电平转换器的传播延迟时间及其电容依赖性。 类似地,在用于CMOS电平操作的内部逻辑块的用于CMOS-TTL电平转换(或来自CMOS的其它转换)的输出电平转换器中,用于执行其输出负载电容的充电或放电的输出晶体管由 双极晶体管。 因此,也可以减小输出电平转换器的传播延迟时间及其电容依赖性。

    Transistor with base/emitter encirclement configuration
    13.
    发明授权
    Transistor with base/emitter encirclement configuration 失效
    具有基极/发射极环绕配置的晶体管

    公开(公告)号:US4024568A

    公开(公告)日:1977-05-17

    申请号:US617809

    申请日:1975-09-29

    摘要: In a transistor wherein a second conductivity type region is formed surrounding a first conductivity type region in a principal surface electrodes are formed on a surface of the first conductivity type region, an electrode of the second conductivity type region is formed in a manner to encircle the first-mentioned electrodes, and electrodes of the first conductivity type region are led outside the electrode of the second conductivity type region through an insulating film, whereby concentration of current is prevented.

    摘要翻译: 在第一导电类型区域的表面上形成有在主表面电极周围形成围绕第一导电类型区域的第二导电类型区域的晶体管,以包围第一导电类型区域的方式形成第二导电类型区域的电极 首先提到的电极和第一导电类型区域的电极通过绝缘膜被引导到第二导电类型区域的电极外面,从而防止电流集中。

    Method of design for testability, method of design for integrated circuits and integrated circuits
    14.
    发明授权
    Method of design for testability, method of design for integrated circuits and integrated circuits 失效
    一种通过功能块测试功能块上的集成电路的方法

    公开(公告)号:US06708315B2

    公开(公告)日:2004-03-16

    申请号:US09789524

    申请日:2001-02-22

    IPC分类号: G06F1750

    CPC分类号: G01R31/3181

    摘要: A design for testability is applied so as to enable significant reduction in test time of an actual integrated circuit. First, an integrated circuit is full-scan designed on a block-by-block basis and test input patterns are generated (S11). Then, one of the blocks to which the design for testability has not been allocated is selected (S12), and a full-scan design is allocated thereto (S14). Test points are inserted into a block that has more than a prescribed number of parallel test input patterns when that block is full-scan designed (YES in S15) (S16).

    摘要翻译: 应用可测试性的设计,以便能够显着降低实际集成电路的测试时间。 首先,逐块地设计集成电路,并生成测试输入模式(S11)。 然后,选择其中尚未分配用于可测试性设计的块之一(S12),并且分配全扫描设计(S14)。 当该块被全扫描设计时(S15中为“是”),将测试点插入具有超过规定数量的并行测试输入模式的块中(S16)。

    Bicmos gate array
    16.
    发明授权
    Bicmos gate array 失效
    二门门阵列

    公开(公告)号:US4879480A

    公开(公告)日:1989-11-07

    申请号:US240450

    申请日:1988-09-02

    摘要: In an input level converter for TTL - CMOS level conversion (or other conversion to CMOS) for an internal logic block operating with CMOS levels, an output transistor for executing the charge or discharge of the output capacitance thereof is formed of a bipolar transistor. Thus, the propagation delay times and their capacitance-dependencies of the input level converter can be lessened. Similarly, in an output level converter for CMOS - TTL level conversion (or other conversion from CMOS) for the internal logic block operating with the CMOS levels, an output transistor for executing the charge or discharge of the output load capacitance thereof is formed of a bipolar transistor. Thus, the propagation delay times and their capacitance-dependencies of the output level converter can also be lessened.

    摘要翻译: 在用于CMOS电平工作的内部逻辑块的TTL-CMOS电平转换(或其他转换为CMOS)的输入电平转换器中,用于执行其输出电容的充电或放电的输出晶体管由双极晶体管形成。 因此,可以减小输入电平转换器的传播延迟时间及其电容依赖性。 类似地,在用于CMOS电平操作的内部逻辑块的用于CMOS-TTL电平转换(或来自CMOS的其它转换)的输出电平转换器中,用于执行其输出负载电容的充电或放电的输出晶体管由 双极晶体管。 因此,也可以减小输出电平转换器的传播延迟时间及其电容依赖性。

    Etching method for flattening a silicon substrate utilizing an
anisotropic alkali etchant
    18.
    发明授权
    Etching method for flattening a silicon substrate utilizing an anisotropic alkali etchant 失效
    用于平铺使用各向异性碱性蚀刻剂的硅基材的蚀刻方法

    公开(公告)号:US4056413A

    公开(公告)日:1977-11-01

    申请号:US729710

    申请日:1976-10-05

    摘要: An epitaxial silicon layer is grown on a principal surface of the (100) crystal face of a silicon single crystal having a depressed portion in the principal surface. The epitaxial silicon layer is flattened by etching, the epitaxial silicon layer being formed to a sufficient thickness so that the side surfaces of the crystal face (111) of a new depressed portion as viewed in a vertical section (the new depressed portion being formed in a surface of the epitaxial silicon layer in correspondence with the first-mentioned depressed portion) intersect at a level which is, at the lowest, the final plane of the etching. The etching is anisotropic etching with an alkali etchant, by which the epitaxial silicon layer is etched down to the final plane.

    High-breakdown-voltage resistance element for integrated circuit with a
plurality of multilayer, overlapping electrodes
    20.
    发明授权
    High-breakdown-voltage resistance element for integrated circuit with a plurality of multilayer, overlapping electrodes 失效
    具有多个多层重叠电极的集成电路的高耐击穿电压元件

    公开(公告)号:US4423433A

    公开(公告)日:1983-12-27

    申请号:US156015

    申请日:1980-06-03

    CPC分类号: H01L29/8605

    摘要: A high-breakdown-voltage resistance element comprises a semiconductor body, an impurity layer disposed in a surface region of the semiconductor body to provide a resistor body, a first electrode connected to one end of the resistor body through a contact hole in a first insulating film formed on the surface of the semiconductor body, and a second electrode connected to the other end of the resistor body through another contact hole in the insulating film. A second insulating film is formed on the first and second electrodes, and a third electrode is connected to the first electrode through a contact hole in the second insulating film, so that the entire surface of the resistor body and adjacent areas are covered with the first, second and third electrodes.

    摘要翻译: 高耐压电阻元件包括半导体本体,设置在半导体本体的表面区域中以提供电阻体的杂质层,通过第一绝缘体中的接触孔与电阻体的一端连接的第一电极 形成在半导体本体的表面上的膜,以及通过绝缘膜中的另一接触孔与电阻体的另一端连接的第二电极。 第二绝缘膜形成在第一和第二电极上,第三电极通过第二绝缘膜中的接触孔连接到第一电极,使得电阻体和相邻区域的整个表面被第一电极 ,第二和第三电极。