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公开(公告)号:US20250040360A1
公开(公告)日:2025-01-30
申请号:US18632476
申请日:2024-04-11
Applicant: Samsung Display Co., LTD.
Inventor: Hee Sung YANG , Su Kyeong SHIN , Woo Jin CHO , Sang Gab KIM , Joon Hwa BAE
IPC: H10K59/124
Abstract: A display device includes: a substrate; a thin film transistor positioned on the substrate and including a source electrode, a drain electrode, and an active layer positioned between the source electrode and the drain electrode; a gate electrode positioned on the thin film transistor and overlapping the active layer in a plan view; a gate protection layer positioned on the gate electrode and overlapping the active layer in the plan view; an insulating layer positioned on the gate protection layer; and a gate cover layer positioned between side surfaces of the gate electrode and the insulating layer, where the gate cover layer includes a first portion and a second portion spaced apart from the first portion with the gate electrode interposed therebetween, and the first portion and the second portion are in contact with the gate protection layer.
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公开(公告)号:US20240251607A1
公开(公告)日:2024-07-25
申请号:US18628242
申请日:2024-04-05
Applicant: Samsung Display Co., Ltd.
Inventor: Byoung Kwon CHOO , Seung Bae KANG , Bong Gu KANG , Tae Joon KIM , Jeong Min PARK , Joon-Hwa BAE , Hee Sung YANG , Woo Jin CHO
CPC classification number: H10K59/123 , H10K50/84 , H10K50/865 , H10K59/38 , H10K59/40 , H10K71/00 , H10K59/1201
Abstract: A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.
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公开(公告)号:US20230292550A1
公开(公告)日:2023-09-14
申请号:US17975809
申请日:2022-10-28
Applicant: Samsung Display Co., LTD.
Inventor: Hyoung Sik KIM , Jong Hee PARK , Hong Sick PARK , Woo Jin CHO
CPC classification number: H01L27/3262 , H01L27/3223 , H01L27/3276 , H01L51/56 , H01L27/124 , H01L2227/323
Abstract: A display device includes: a substrate; a thin-film transistor disposed on the substrate and including a semiconductor layer; an interlayer insulating layer disposed on the thin-film transistor; a data conductive layer disposed on the interlayer insulating layer and including an auxiliary electrode and a transistor electrode connected to the semiconductor layer of the thin-film transistor, a via layer disposed on the data conductive layer; a pixel electrode layer disposed on the via layer and including: a pixel electrode and a dummy pixel electrode separated from the pixel electrode; an intermediate layer disposed on the pixel electrode layer; and a common electrode disposed on the intermediate layer. The auxiliary electrode includes a main conductive layer and an upper sub-conductive layer. Side surfaces of the main conductive layer of the auxiliary electrode are disposed inner than side surfaces of the upper sub-conductive layer of the auxiliary electrode.
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公开(公告)号:US20230197901A1
公开(公告)日:2023-06-22
申请号:US17881978
申请日:2022-08-05
Applicant: Samsung Display Co., LTD.
Inventor: Young Rok KIM , Kyu Soon PARK , Jong Hyun CHOUNG , Woo Jin CHO
CPC classification number: H01L33/382 , H01L27/156 , H01L33/005 , H01L33/62 , H01L2933/0016 , H01L2933/0066
Abstract: A display device comprises a via layer disposed on a substrate, a first electrode and a second electrode disposed on the via layer and spaced apart from each other, a first insulating layer disposed on the first electrode and the second electrode, light emitting elements disposed on the first insulating layer and disposed on the first electrode and the second electrode, a bank layer disposed on the first insulating layer and comprising a first opening in which the light emitting elements are disposed and a second opening spaced apart from the first opening, a second insulating layer disposed on the light emitting elements, and a first contact electrode and a second contact electrode disposed on the bank layer, the light emitting elements, and the second insulating layer while being spaced apart from each other.
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公开(公告)号:US20220384748A1
公开(公告)日:2022-12-01
申请号:US17787548
申请日:2020-02-14
Applicant: Samsung Display Co., LTD.
Inventor: Hyun Seok KIM , Hee Kyun SHIN , Jun Ho SIM , Tae Wook KANG , Woo Jin CHO
Abstract: A method for manufacturing a display apparatus according to an embodiment includes: preparing a carrier substrate and forming a sacrificial layer on a top surface of the carrier substrate, where the sacrificial layer includes a cover area and an exposure area located on at least one side of the cover area; forming a first flexible material having a bottom surface in contact with the sacrificial layer on a top surface of the cover area of the sacrificial layer to expose the exposure area of the sacrificial layer; and removing the exposure area of the sacrificial layer.
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公开(公告)号:US20200020869A1
公开(公告)日:2020-01-16
申请号:US16404058
申请日:2019-05-06
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Byunghoon KANG , Seung Jun MOON , Dongkyun SEO , Hee Kyun SHIN , Junho SIM , Woo Jin CHO
Abstract: A method of manufacturing a flexible display device including preparing a support substrate, forming a first adhesive layer having a positive charge on the support substrate, the first adhesive layer including a polymer electrolyte and a graphene oxide, forming a second adhesive layer having a negative charge on the first adhesive layer, the second adhesive layer including a graphene oxide, forming a flexible substrate on the second adhesive layer, forming a display unit on the flexible substrate, and separating the support substrate and the flexible substrate.
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公开(公告)号:US20190148414A1
公开(公告)日:2019-05-16
申请号:US16243702
申请日:2019-01-09
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hyun Jin CHO , Joon-Hwa BAE , Byoung Kwon CHOO , Byung Hoon KANG , Kwang Suk KIM , Woo Jin CHO , Jun Hyuk CHEON
IPC: H01L27/12 , B24B31/00 , H01L21/3105 , G09G3/3233 , C09G1/02
CPC classification number: H01L27/1248 , B24B31/00 , C09G1/02 , G09G3/3233 , G09G2300/0819 , G09G2300/0847 , H01L21/02164 , H01L21/0217 , H01L21/31053 , H01L22/26 , H01L27/1244 , H01L27/1255 , H01L27/1262 , H01L27/3258 , H01L27/3262 , H01L27/3265 , H01L27/3276 , H01L29/78675 , H01L2227/323
Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.
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公开(公告)号:US20180047762A1
公开(公告)日:2018-02-15
申请号:US15671638
申请日:2017-08-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Joon-Hwa BAE , Byoung Kwon CHOO , Byung Hoon KANG , Woo Jin CHO , Hyun Jin CHO , Jun Hyuk CHEON , Jee-Hyun LEE
IPC: H01L27/12 , H01L21/02 , H01L29/786
CPC classification number: H01L27/1285 , H01L21/02532 , H01L21/02658 , H01L21/02675 , H01L21/02697 , H01L21/30625 , H01L21/31053 , H01L21/3212 , H01L21/76834 , H01L27/1222 , H01L27/127 , H01L29/66757 , H01L29/78672 , H01L29/7869 , H01L29/78696
Abstract: A method of manufacturing a transistor display panel and a transistor display panel, the method including forming a polycrystalline silicon layer on a substrate; forming an active layer by patterning the polycrystalline silicon layer; forming a first insulating layer covering the substrate and the active layer; exposing the active layer by polishing the first insulating layer using a polishing apparatus; and forming a second insulating layer that contacts the first insulating layer and the active layer, wherein exposing the active layer by polishing the first insulating layer includes coating a first slurry on a surface of the first insulating layer, the first slurry reducing a polishing rate of the active layer.
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公开(公告)号:US20250089536A1
公开(公告)日:2025-03-13
申请号:US18661996
申请日:2024-05-13
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Young Rok KIM , Woo Jin CHO
IPC: H10K59/80 , H10K59/12 , H10K59/122 , H10K59/131 , H10K59/38 , H10K71/60
Abstract: Provided is a display device comprising an interlayer insulating layer on a substrate and having a first trench and a second trench, a first reflective electrode inside the first trench, a second reflective electrode inside the second trench, a first-first electrode on the interlayer insulating layer and connected to the first reflective electrode, a first-second electrode on the interlayer insulating layer and connected to the second reflective electrode, a second electrode on the first-first electrode and the first-second electrode, a first color filter on the second electrode to overlap the first-first electrode, and a second color filter on the second electrode to overlap the first-second electrode, wherein the interlayer insulating layer includes insulating layers, at least two of the insulating layers contain different materials, and at least one of the first trench or the second trench penetrates the insulating layers containing different materials of the interlayer insulating layer.
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公开(公告)号:US20230268356A1
公开(公告)日:2023-08-24
申请号:US18155982
申请日:2023-01-18
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Yong-Hwan RYU , Woo Jin CHO , Jong-Hyun CHOUNG , Jae Uoon KIM , Sun-Jin SONG , Hyun Duck CHO
CPC classification number: H01L27/1288 , G03F7/0035 , G03F7/0382 , H01L27/1262 , C23F1/00
Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.
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