Graphene switching device having tunable barrier
    12.
    发明授权
    Graphene switching device having tunable barrier 有权
    石墨烯开关装置具有可调屏障

    公开(公告)号:US09048310B2

    公开(公告)日:2015-06-02

    申请号:US13964353

    申请日:2013-08-12

    Abstract: According to example embodiments, a graphene switching devices having a tunable barrier includes a semiconductor substrate that includes a first well doped with an impurity, a first electrode on a first area of the semiconductor substrate, an insulation layer on a second area of the semiconductor substrate, a graphene layer on the insulation layer and extending onto the semiconductor substrate toward the first electrode, a second electrode on the graphene layer and insulation layer, a gate insulation layer on the graphene layer, and a gate electrode on the gate insulation layer. The first area and the second area of the semiconductor substrate may be spaced apart from each other. The graphene layer is spaced apart from the first electrode. A lower portion of the graphene layer may contact the first well. The first well is configured to form an energy barrier between the graphene layer and the first electrode.

    Abstract translation: 根据示例实施例,具有可调谐屏障的石墨烯开关器件包括半导体衬底,其包括掺杂有杂质的第一阱,在半导体衬底的第一区域上的第一电极,在半导体衬底的第二区域上的绝缘层 在所述绝缘层上的石墨烯层,并且朝向所述第一电极延伸到所述半导体衬底上,所述石墨烯层和绝缘层上的第二电极,所述石墨烯层上的栅极绝缘层和所述栅极绝缘层上的栅极电极。 半导体衬底的第一区域和第二区域可以彼此间隔开。 石墨烯层与第一电极间隔开。 石墨烯层的下部可以接触第一孔。 第一阱被配置为在石墨烯层和第一电极之间形成能量势垒。

    Memory devices including two-dimensional material, methods of manufacturing the same, and methods of operating the same
    14.
    发明授权
    Memory devices including two-dimensional material, methods of manufacturing the same, and methods of operating the same 有权
    包括二维材料的存储器件,其制造方法及其操作方法

    公开(公告)号:US09349802B2

    公开(公告)日:2016-05-24

    申请号:US14265965

    申请日:2014-04-30

    Abstract: Disclosed are memory devices including a two-dimensional (2D) material, methods of manufacturing the same, and methods of operating the same. A memory device may include a transistor, which includes graphene and 2D semiconductor contacting the graphene, and a capacitor connected to the transistor. The memory device may include a first electrode, a first insulation layer, a second electrode, a semiconductor layer, a third electrode, a second insulation layer, and a fourth electrode which are sequentially arranged. The second electrode may include the graphene, and the semiconductor layer may include the 2D semiconductor. Alternatively, the memory device may include first and second electrode elements, a graphene layer between the first and second electrode elements, a 2D semiconductor layer between the graphene layer and the first electrode element, and a dielectric layer between the graphene layer and the second electrode.

    Abstract translation: 公开了包括二维(2D)材料,其制造方法及其操作方法的存储器件。 存储器件可以包括晶体管,其包括与石墨烯接触的石墨烯和2D半导体以及连接到晶体管的电容器。 存储器件可以包括依次布置的第一电极,第一绝缘层,第二电极,半导体层,第三电极,第二绝缘层和第四电极。 第二电极可以包括石墨烯,并且半导体层可以包括2D半导体。 或者,存储器件可以包括第一和第二电极元件,在第一和第二电极元件之间的石墨烯层,在石墨烯层和第一电极元件之间的2D半导体层,以及在石墨烯层和第二电极之间的电介质层 。

    Graphene switching device including tunable barrier
    18.
    发明授权
    Graphene switching device including tunable barrier 有权
    石墨烯开关装置包括可调屏障

    公开(公告)号:US08742400B2

    公开(公告)日:2014-06-03

    申请号:US13861726

    申请日:2013-04-12

    Abstract: A graphene switching device includes a first electrode and an insulating layer in first and second regions of the semiconductor substrate, respectively, a plurality of metal particles on a surface of the semiconductor substrate between the first and second regions, a graphene layer on the plurality of metal particles and extending on the insulating layer, a second electrode on the graphene layer in the second region and configured to face the insulating layer, a gate insulating layer configured to cover the graphene layer, and a gate electrode on the gate insulating layer. The semiconductor substrate forms an energy barrier between the graphene layer and the first electrode.

    Abstract translation: 石墨烯开关装置在半导体衬底的第一和第二区域中分别包括第一电极和绝缘层,在第一和第二区域之间的半导体衬底的表面上的多个金属颗粒,多个 金属颗粒并在绝缘层上延伸,在第二区域中的石墨烯层上的第二电极,并且被配置为面对绝缘层,构造成覆盖石墨烯层的栅极绝缘层和栅极绝缘层上的栅电极。 半导体衬底在石墨烯层和第一电极之间形成能量势垒。

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