Abstract:
An electromagnetic (EM) sensor includes a front end module generating an EM signal using electromagnetic waves transmitted from an external source, a sensor memory storing a portion of a plurality of machine learning models used to recognize the EM signal, and a microcontroller unit for recognizing the external electronic device emitting the electromagnetic waves by inputting feature values extracted from the EM signal to the machine learning models. If the machine learning models stored in the sensor memory are not able to recognize the external device, the feature values may be transmitted to a main processor, and the main processor may compare the feature values to another set of machine learning models.
Abstract:
An electromagnetic (EM) sensor includes a front-end module, a memory, and a microcontroller unit. The front-end module generates an electromagnetic signal using externally introduced electromagnetic waves. The memory stores a first reference signal and a second reference signal generated from multiple probability models required to recognize the electromagnetic signal. The microcontroller unit compares the electromagnetic signal with the first reference signal and the second reference signal, to determine whether the electromagnetic signal is a valid signal.
Abstract:
Semiconductor devices are provided. A semiconductor device includes a semiconductor substrate. The semiconductor device includes first and second source/drain regions in the semiconductor substrate. Moreover, the semiconductor device includes a multi-layer device isolation region in the semiconductor substrate between the first and second source/drain regions. The multi-layer device isolation region includes a protruding portion that protrudes away from the semiconductor substrate beyond respective uppermost surfaces of the first and second source/drain regions.
Abstract:
A catalyst for reforming hydrocarbons may include an inorganic oxide and a catalyst metal supported on the inorganic metal oxide. At least a portion of the catalyst metal may be supported in the form of a solid-solution particle. The catalyst metal may include a first metal (selected from cobalt, iron, copper, and manganese); nickel; and magnesium.
Abstract:
A semiconductor device includes a second insulating layer disposed on a substrate and that includes a first trench that extends in a first direction, a first via disposed in the first hole, a first interconnection layer disposed in the first trench on the first via and that has an upwardly upper region, and a third insulating layer disposed on the second insulating layer and that includes a second hole and a second trench connected to the second hole. The first trench has inclined side surfaces such that a width of the first trench increases in a direction toward the substrate, the second hole has inclined side surfaces such that a width of the second hole decreases in the direction toward the substrate, and a lower portion of the second hole is wider than an upper surface of the first interconnection layer.
Abstract:
A method of forming a carbon coating includes heat treating lithium transition metal composite oxide Li0.9+aMbM′cNdOe, in an atmosphere of a gas mixture including carbon dioxide and compound CnH(2n+2−a)[OH]a, or compound CnH(2n), wherein M and M′ are different from each other and are selected from Ni, Co, Mn, Mo, Cu, Fe, Cr, Ge, Al, Mg, Zr, W, Ru, Rh, Pd, Os, Ir, Pt, Sc, Ti, V, Ga, Nb, Ag, Hf, Au, Cs, B, and Ba, and N is different from M and M′ and is selected from Ni, Co, Mn, Mo, Cu, Fe, Cr, Ge, Al, Mg, Zr, W, Ru, Rh, Pd, Os, Ir, Pt, Sc, Ti, V, Ga, Nb, Ag, Hf, Au, Cs, B, Ba, and a combination thereof, or selected from B, F, S, and P, and at least one of the M, M′, and N comprises Ni, Co, Mn, Mo, Cu, or Fe.
Abstract:
A method of forming a carbon coating includes heat treating lithium transition metal composite oxide Li0.9+aMbM′cNdOe, in an atmosphere of a gas mixture including carbon dioxide and compound CnH(2n+2−a)[OH]a, wherein n is 1 to 20 and a is 0 or 1, or compound CnH(2n), wherein n is 2 to 6, wherein 0≦a≦1.6, 0≦b≦2, 0≦c≦2, 0≦d≦2, b, c, and d are not simultaneously equal to 0, e ranges from 1 to 4, M and M′ are different from each other and are selected from Ni, Co, Mn, Mo, Cu, Fe, Cr, Ge, Al, Mg, Zr, W, Ru, Rh, Pd, Os, Ir, Pt, Sc, Ti, V, Ga, Nb, Ag, Hf, Au, Cs, B, and Ba, and N is different from M and M′ and is selected from Ni, Co, Mn, Mo, Cu, Fe, Cr, Ge, Al, Mg, Zr, W, Ru, Rh, Pd, Os, Ir, Pt, Sc, Ti, V, Ga, Nb, Ag, Hf, Au, Cs, B, Ba, and a combination thereof, or selected from Ti, V, Si, B, F, S, and P, and at least one of the M, M′, and N comprises Ni, Co, Mn, Mo, Cu, or Fe.
Abstract:
A catalyst for reforming hydrocarbons may include a nickel nanoparticle having a controlled crystal facet, the controlled crystal facet being a surface of the nickel nanoparticle and including a {100} face, a {111} face, or a combination thereof. The present disclosure also relates to a production method thereof and a method of reforming hydrocarbons using the same.
Abstract:
A method of preparing graphene includes supplying a gas on a metal catalyst, the gas including CO2, CH4, and H2O, and reacting and cooling the resultant.
Abstract:
Semiconductor devices having improved performance and reliability. For example, a semiconductor device may include a substrate, an active pattern extending in a first direction, on the substrate, a plurality of gate structures on the active pattern, each including a gate electrode that crosses the active pattern. A lower active contact may be connected to a source/drain pattern. A trench may expose the lower active contact, and a width of a bottom surface of the trench in the first direction may be greater than a width of an upper surface of the lower active contact in the first direction. An etching stop film may be along the bottom surface of the trench and side walls of the trench, and have an uppermost surface coplanar with an upper surface of an upper active contact that extends through the etching stop film and is connected to the lower active contact.