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公开(公告)号:US20090212015A1
公开(公告)日:2009-08-27
申请号:US11886596
申请日:2006-03-17
CPC分类号: B23K15/0046 , H05H1/46 , H05H2001/4622
摘要: Methods and apparatus are provided for plasma-assisted processing multiple work pieces in a manufacturing line. The manufacturing line can include a plurality of microwave cavities, each of the microwave cavities igniting and sustaining a microwave plasma. Work pieces can be shuttled between the plurality of microwave cavities on a conveyance system that controls the positioning of each of the work pieces.
摘要翻译: 提供了用于在生产线中等离子体辅助处理多个工件的方法和装置。 制造线可以包括多个微波腔,每个微波腔点燃和维持微波等离子体。 工件可以在控制每个工件的定位的输送系统上的多个微波腔之间穿梭。
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公开(公告)号:US07465362B2
公开(公告)日:2008-12-16
申请号:US10513607
申请日:2003-05-07
申请人: Devendra Kumar , Satyendra Kumar
发明人: Devendra Kumar , Satyendra Kumar
IPC分类号: C23C8/36
摘要: Methods and systems (10) for plasma-assisted nitrogen surface-treatments are provided. The method can include subjecting a gas (24) to electromagnetic radiation (26) in the presence of a plasma catalyst (100, 120, 140) to initiate a plasma containing nitrogen. The surface region of an object can be exposed to the plasma for a period of time sufficient to transfer at least some of the nitrogen from the plasma to the object through the surface region.
摘要翻译: 提供了等离子体辅助氮表面处理的方法和系统(10)。 该方法可以包括在等离子体催化剂(100,120,140)的存在下使气体(24)进行电磁辐射(26)以引发含有氮的等离子体。 物体的表面区域可以暴露于等离子体足以将至少一些氮从等离子体传递到物体的时间段通过表面区域。
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13.
公开(公告)号:US07227097B2
公开(公告)日:2007-06-05
申请号:US10430415
申请日:2003-05-07
申请人: Satyendra Kumar , Devendra Kumar
发明人: Satyendra Kumar , Devendra Kumar
IPC分类号: B23K10/00
CPC分类号: H05B6/68 , B01D53/92 , B01D2258/01 , B01D2259/818 , B01J19/088 , B01J19/126 , B01J2219/00063 , B01J2219/00193 , B01J2219/002 , B01J2219/00213 , B01J2219/0024 , B01J2219/0892 , B01J2219/0894 , B01J2219/1269 , B82Y10/00 , B82Y30/00 , C22B4/005 , F01N3/202 , F01N3/206 , F01N13/10 , F01N2240/28 , F01N2610/08 , H01J37/32009 , H01J37/32192 , H01J37/32302 , H01J37/32366 , H01J2237/0206 , H01J2237/33 , H01J2237/336 , H01J2237/338 , H05B6/6402 , H05B6/806 , H05B2206/044 , H05H1/46 , H05H2001/4607 , H05H2001/4652 , Y02B40/143 , Y02T10/26
摘要: Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another.
摘要翻译: 提供了使用多种辐射源的等离子体辅助方法和装置。 在一个实施例中,等离子体通过使处理空腔中的气体在等离子体催化剂存在下具有频率小于约333GHz的电磁辐射来点燃,等离子体催化剂可能是被动的或有源的。 控制器可用于延迟一个辐射源相对于另一辐射源的激活。
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公开(公告)号:US07132621B2
公开(公告)日:2006-11-07
申请号:US10430426
申请日:2003-05-07
申请人: Satyendra Kumar , Devendra Kumar
发明人: Satyendra Kumar , Devendra Kumar
IPC分类号: B23K10/00
CPC分类号: H05B6/68 , B01D53/92 , B01D2258/01 , B01D2259/818 , B01J19/088 , B01J19/126 , B01J2219/00063 , B01J2219/00193 , B01J2219/002 , B01J2219/00213 , B01J2219/0024 , B01J2219/0892 , B01J2219/0894 , B01J2219/1269 , B82Y10/00 , B82Y30/00 , C22B4/005 , F01N3/202 , F01N3/206 , F01N13/10 , F01N2240/28 , F01N2610/08 , H01J37/32009 , H01J37/32192 , H01J37/32302 , H01J37/32366 , H01J2237/0206 , H01J2237/33 , H01J2237/336 , H01J2237/338 , H05B6/6402 , H05B6/806 , H05B2206/044 , H05H1/46 , H05H2001/4607 , H05H2001/4652 , Y02B40/143 , Y02T10/26
摘要: Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.
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公开(公告)号:US20060233682A1
公开(公告)日:2006-10-19
申请号:US10513606
申请日:2003-05-07
IPC分类号: B01J19/08
CPC分类号: B01J19/088 , B01D53/92 , B01D2258/01 , B01D2259/806 , B01D2259/818 , B01J2219/0883 , B01J2219/0892 , F01N3/0892
摘要: Methods and apparatus are provided for plasma-assisted engine exhaust treatment. In one embodiment, an engine exhaust treatment system includes at least one conduit with an inlet portion (215), an outlet portion (216), an intermediate portion (205), and at least one plasma cavity (210). The inlet portion is configured to connect to an engine block (510) and receive an exhaust gas. The outlet portion emits the exhaust gas after plasma treatment. The intermediate portion conveys the exhaust gas from the inlet portion to the outlet portion. In one embodiment, one or more plasma cavities (342, 344, 346) are located proximate to the inlet portion for treating the exhaust gas. The system also includes an electromagnetic radiation source (340) connected to the cavities for supplying radiation to the cavities, wherein the radiation has a frequency less than about 333 GHz. Exhaust gas treatments that use plasma catalysts (70, 170) are also provided.
摘要翻译: 提供了等离子体辅助发动机排气处理的方法和装置。 在一个实施例中,发动机排气处理系统包括具有入口部分(215),出口部分(216),中间部分(205)和至少一个等离子体腔(210)的至少一个管道。 入口部分被配置成连接到发动机缸体(510)并接收废气。 出口部分在等离子体处理后排出废气。 中间部分将废气从入口部分输送到出口部分。 在一个实施例中,一个或多个等离子体空腔(342,344,346)位于入口部分附近以用于处理废气。 该系统还包括连接到空腔的电磁辐射源(340),用于向空腔提供辐射,其中辐射具有小于约333GHz的频率。 还提供了使用等离子体催化剂(70,170)的废气处理。
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公开(公告)号:US20060228497A1
公开(公告)日:2006-10-12
申请号:US11384104
申请日:2006-03-17
CPC分类号: C23C16/452 , B82Y30/00 , C23C16/40 , H01J37/3244 , H05H1/46 , H05H2001/4607
摘要: Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various coating processes. In one embodiment, the surface of an object can be coated by forming a plasma in a cavity by subjecting a gas to an amount of electromagnetic radiation power in the presence of a plasma catalyst and adding at least one coating material to the plasma. The material is allowed to deposit on the surface of the object to form a coating. Various plasma catalysts are also provided. Coatings can include any material, for example, carbon nanotubes, BaTiO3, Cr2O3, hafnium oxide, 3Al2O3.2SiO2, Al2O3, SiAlON, MgAl2O4, TiN, and TiO2.
摘要翻译: 提供了用于点燃,调节和维持用于各种涂覆过程的等离子体的方法和装置。 在一个实施例中,可以通过在等离子体催化剂的存在下对气体进行一定量的电磁辐射能量并且在等离子体中加入至少一种涂层材料来在空腔中形成等离子体来涂覆物体的表面。 允许材料沉积在物体的表面上以形成涂层。 还提供了各种等离子体催化剂。 涂层可以包括任何材料,例如碳纳米管,BaTiO 3,Cr 2 O 3,氧化铪,3Al 2, 3SiO 2,Al 2 O 3,SiAlON,MgAl 2 O 3,N 2 O 3, O 3,TiN和TiO 2。
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公开(公告)号:US20050253529A1
公开(公告)日:2005-11-17
申请号:US10513220
申请日:2003-05-07
申请人: Satyendra Kumar , Devendra Kumar
发明人: Satyendra Kumar , Devendra Kumar
CPC分类号: C01B3/342 , B01J19/088 , B01J19/126 , B01J2219/0809 , B01J2219/083 , B01J2219/0835 , B01J2219/0869 , B01J2219/0886 , B01J2219/0892 , C01B2203/04 , C01B2203/0861 , C01B2203/1041 , H05H1/46 , H05H2001/4607
摘要: Methods and apparatus are provided for plasma-assisted gas production. In one embodiment, a gas, which includes at least one atomic or molecular species, can flow into a cavity (305). The gas can be subjected to electromagnetic radiation having a frequency less than about 333 GHz (optionally in the presence of a plasma catalyst) such that a plasma (310) forms in the cavity (305). A filter (315) capable of passing the atomic or molecular species, but preventing others from passing, can be in fluid communication with the cavity (305). In this way, the selected species can be extracted and collected, for storage or immediate use.
摘要翻译: 提供了等离子体辅助气体生产的方法和装置。 在一个实施方案中,包括至少一种原子或分子种类的气体可以流入空腔(305)。 气体可以经受频率小于约333GHz的电磁辐射(任选在存在等离子体催化剂的情况下),使得在空腔(305)中形成等离子体(310)。 能够使原子或分子物质通过但防止其他物质通过的过滤器(315)可以与空腔(305)流体连通。 以这种方式,可以提取和收集所选择的物种,用于储存或立即使用。
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公开(公告)号:US06658118B1
公开(公告)日:2003-12-02
申请号:US09445373
申请日:1999-12-06
IPC分类号: A61F1106
CPC分类号: F16L55/0333 , G10K11/161 , G10K11/178
摘要: Apparatus for suppressing fluid-borne noise in a fluid conduit (12 or 12a) that includes a vibration sensor (36, 36a or 36b) for operative coupling to the conduit for providing an electrical sensor signal as a function of fluid pressure fluctuations in the conduit. A piezoelectric actuator (40, 40a or 40b) is adapted to be mounted on the conduit for imparting pressure fluctuations to fluid in the conduit. An electronic controller (38, 38a or 38b) is responsive to the sensor signal for energizing the actuator 180° out of phase with fluid pressure fluctuations sensed by the sensor. The sensor may be either closely coupled to the actuator, or separate from the actuator and disposed upstream of the actuator with respect to the direction of fluid flow through the conduit. The sensor in the preferred embodiments of the invention comprises a piezoelectric sensor, and the actuator comprises a stack of piezoelectric elements.
摘要翻译: 一种用于抑制流体导管(12或12a)中的流体噪声的装置,其包括用于与导管有效耦合的振动传感器(36,36a或36b),用于提供作为导管中的流体压力波动的函数的电传感器信号 。 压电致动器(40,40a或40b)适于安装在导管上,以对管道中的流体施加压力波动。 电子控制器(38,38a或38b)响应于传感器信号,用于通过传感器感测到的流体压力波动与致动器180°异相激励。 传感器可以紧密地联接到致动器,或者与致动器分离,并且相对于通过导管的流体流动的方向设置在致动器的上游。 本发明优选实施例中的传感器包括压电传感器,并且致动器包括一叠压电元件。
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公开(公告)号:US07560657B2
公开(公告)日:2009-07-14
申请号:US10513605
申请日:2003-05-07
IPC分类号: B23K10/00
CPC分类号: B23K10/02 , H05H1/46 , H05H2001/4607
摘要: Methods and apparatus are provided for plasma-assisted processing multiple work pieces in a manufacturing line. In one embodiment, the method can include placing the work pieces in movable carriers, moving the carriers on a conveyor into an irradiation zone, flowing a gas into the irradiation zone, igniting the gas in the irradiation zone to form a plasma (e.g., by subjecting the gas to electromagnetic radiation in the presence of a plasma catalyst), sustaining the plasma for a period of time sufficient to at least partially plasma process at least one of the work pieces in the irradiation zone, and advancing the conveyor to move the at least one plasma-processed work piece out of the irradiation zone. Various types of plasma catalysts are also provided.
摘要翻译: 提供了用于在生产线中等离子体辅助处理多个工件的方法和装置。 在一个实施例中,该方法可以包括将工件放置在可移动的载体中,将传送器上的载体移动到照射区域中,使气体流入照射区域,点燃照射区域中的气体以形成等离子体(例如, 在等离子体催化剂的存在下对气体进行电磁辐射),将等离子体维持足以至少部分等离子体处理照射区域中的至少一个工件的时间段,并且使输送机前进 在照射区域外的至少一个等离子体处理的工件。 还提供了各种类型的等离子体催化剂。
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20.
公开(公告)号:US20070164680A1
公开(公告)日:2007-07-19
申请号:US11590058
申请日:2006-10-31
申请人: Satyendra Kumar , Devendra Kumar
发明人: Satyendra Kumar , Devendra Kumar
CPC分类号: H05B6/68 , B01D53/92 , B01D2258/01 , B01D2259/818 , B01J19/088 , B01J19/126 , B01J2219/00063 , B01J2219/00193 , B01J2219/002 , B01J2219/00213 , B01J2219/0024 , B01J2219/0892 , B01J2219/0894 , B01J2219/1269 , B82Y10/00 , B82Y30/00 , C22B4/005 , F01N3/202 , F01N3/206 , F01N13/10 , F01N2240/28 , F01N2610/08 , H01J37/32009 , H01J37/32192 , H01J37/32302 , H01J37/32366 , H01J2237/0206 , H01J2237/33 , H01J2237/336 , H01J2237/338 , H05B6/6402 , H05B6/806 , H05B2206/044 , H05H1/46 , H05H2001/4607 , H05H2001/4652 , Y02B40/143 , Y02T10/26
摘要: Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a radiation cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another radiation source.
摘要翻译: 提供了使用多种辐射源的等离子体辅助方法和装置。 在一个实施例中,通过使辐射腔中的气体在等离子体催化剂存在下具有小于约333GHz的频率的电磁辐射来点燃等离子体,等离子体催化剂可能是被动的或有源的。 控制器可用于相对于另一辐射源延迟一个辐射源的激活。
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