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11.
公开(公告)号:US20160322098A1
公开(公告)日:2016-11-03
申请号:US14700135
申请日:2015-04-29
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Mohammed HASAN TAUFIQUE , Hidehiro FUJIWARA , Hung-Jen LIAO , Yen-Huei CHEN
IPC: G11C11/419
CPC classification number: G11C11/419 , G11C7/12 , G11C7/22 , G11C11/412
Abstract: A memory device includes a first inverter, a second inverter cross-coupled with the first inverter, an accessing unit, and a switching unit. The accessing unit is configured to discharge an output of the first inverter and charge an output of the second inverter according to signals provided by a first word line and a second word line. The switching unit is configured to disconnect a power from the first inverter and the second inverter according to a signal provided by the first word line.
Abstract translation: 存储器件包括第一反相器,与第一反相器交叉耦合的第二反相器,存取单元和切换单元。 访问单元被配置为对第一反相器的输出进行放电,并根据由第一字线和第二字线提供的信号对第二反相器的输出进行充电。 开关单元被配置为根据由第一字线提供的信号来断开来自第一逆变器和第二逆变器的电力。
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公开(公告)号:US20230380129A1
公开(公告)日:2023-11-23
申请号:US18362786
申请日:2023-07-31
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Hidehiro FUJIWARA , Wei-Min CHAN , Chih-Yu LIN , Yen-Huei CHEN , Hung-Jen LIAO
IPC: H10B10/00 , H01L27/02 , H01L21/321 , H01L21/768 , H01L23/528
CPC classification number: H10B10/12 , H01L27/0207 , H01L21/321 , H01L21/76838 , H01L23/5283
Abstract: A device includes first and second gate electrodes, a word line and a first metal island. The first gate electrode corresponds to transistors of a memory cell. The second gate electrode is separated from the first gate electrode and corresponds to the transistors. The word line is coupled to the memory cell and located between the first and the second gate electrodes. The first metal island is configured to couple a first power supply to the memory cell. A first boundary of the first metal island is located between first and second boundaries of the first gate electrode and is located between first and second boundaries of the word line, and each of the first boundary of the first gate electrode and the first boundary of the word line is located between first and second boundaries of the first metal island.
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公开(公告)号:US20210398589A1
公开(公告)日:2021-12-23
申请号:US17035118
申请日:2020-09-28
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Yi-Hsin NIEN , Wei-Chang ZHAO , Chih-Yu LIN , Hidehiro FUJIWARA , Yen-Huei CHEN , Ru-Yu WANG
IPC: G11C11/419 , G11C11/412 , G11C5/06
Abstract: A memory device includes a first program line and a second program line. A first portion of the first program line is formed in a first conductive layer, and a second portion of the first program line is formed in a second conductive layer above the first conductive layer. A first portion of the second program line is formed in the first conductive layer. A second portion of the second program line is formed in the second conductive layer. A third portion of the second program line is formed in a third conductive layer above the second conductive layer. The first portion and the second portion of the first program line have sizes that are different from each other, and the first portion, the second portion and the third portion of the second program line have sizes that are different from each other.
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公开(公告)号:US20210265363A1
公开(公告)日:2021-08-26
申请号:US17320091
申请日:2021-05-13
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Hidehiro FUJIWARA , Wei-Min CHAN , Chih-Yu LIN , Yen-Huei CHEN , Hung-Jen LIAO
IPC: H01L27/11 , H01L27/02 , H01L21/321 , H01L21/768 , H01L23/528
Abstract: A device is disclosed that includes a fin structure disposed below a first metal layer, extending along a column direction, and corresponding to at least one transistor of a memory bit cell, a word line disposed in the first metal layer and extending along a row direction, a first metal island disposed in the first metal layer separated from the word line, and a first connection metal line disposed in a second metal layer above the first metal layer, extending along the column direction, and configured to couple a power supply through the first metal island to the fin structure. In a layout view, the first connection metal line is separated from the fin structure, and the fin structure crosses over the word line and the first metal island. A method is also disclosed herein.
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公开(公告)号:US20210183418A1
公开(公告)日:2021-06-17
申请号:US17128831
申请日:2020-12-21
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hidehiro FUJIWARA , Yen-Huei CHEN
IPC: G11C7/12 , G11C5/14 , H03K19/003 , G11C7/10 , G11C7/08
Abstract: The present disclosure describes various exemplary memory storage devices that can be programmed to bypass one or more memory cells in a bypass mode of operation. The various exemplary memory storage devices can adjust, for example, pull-up or pull-down, the electronic data as the electronic data passes through these exemplary memory storage devices in the bypass mode of operation. In some situations, the various exemplary memory storage devices may introduce an unwanted bias into the electronic data as the electronic data passes through these exemplary memory storage devices in the bypass mode of operation. The various exemplary memory storage devices can pull-down the electronic data and/or pull-up the electronic data as the electronic data is passing through these exemplary memory storage devices in the bypass mode of operation to compensate for this unwanted bias.
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公开(公告)号:US20180151227A1
公开(公告)日:2018-05-31
申请号:US15689497
申请日:2017-08-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hidehiro FUJIWARA , Ching-Wei WU
CPC classification number: G11C16/08 , G11C5/025 , G11C5/063 , G11C8/08 , G11C8/10 , G11C8/20 , G11C16/105 , G11C16/3481 , G11C29/024 , G11C29/025 , G11C29/14 , G11C29/783
Abstract: A data storage device can detect for a failure in decoding of an x-bit row address and/or a y-bit column of an (x+y)-bit address. The data storage device decodes the x-bit row address and/or the y-bit column address to provide wordlines (WLs) and/or bitlines (BLs) to access one or more cells from among a memory array of the data storage device. The data storage device compares one or more subsets of the WLs and/or of the BLs to each other to detect for the failure. The data storage device determines the failure is present in the decoding of the x-bit row address and/or the y-bit column of the (x+y)-bit address when one or more WL and/or BL from among the one or more subsets of the WLs and/or the BLs differ.
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公开(公告)号:US20180151226A1
公开(公告)日:2018-05-31
申请号:US15799253
申请日:2017-10-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hidehiro FUJIWARA , Hung-Jen LIAO , Hsien-Yu PAN , Chih-Yu LIN , Yen-Huei CHEN , Chien-Chen LIN
Abstract: A cell structure is disclosed. The cell structure includes a first unit comprising a first group of transistors and a first data latch, a second unit comprising a second group of transistors and a second data latch a read port unit comprising a plurality of p-type transistors, a search line and a complementary search line, the search line and the complementary search line function as input of the cell structure, and a master line, the master line functions as an output of the cell structure, the first unit is coupled to the second unit, both the first and the second units are coupled to the read port unit. According to some embodiments, the first data latch comprises a first and a second p-type transistors, a first and a second n-type transistors.
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公开(公告)号:US20220383947A1
公开(公告)日:2022-12-01
申请号:US17818386
申请日:2022-08-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hidehiro FUJIWARA , Chih-Yu LIN , Sahil Preet Singh , Hsien-Yu PAN , Yen-Huei CHEN , Hung-Jen LIAO
IPC: G11C11/419 , G11C11/412
Abstract: The present disclosure describes embodiments of a write assist circuit. The write assist circuit can include a control circuit and a voltage generator. The control circuit can be configured to receive memory address information associated with a memory write operation for memory cells. The voltage generator can be configured to provide a reference voltage to one or more bitlines coupled to the memory cells. The voltage generator can include two capacitive elements, where during the memory write operation, (i) one of the capacitive elements can be configured to couple the reference voltage to a first negative voltage, and (ii) based on the memory address information, both capacitive elements can be configured to cumulatively couple the reference voltage to a second negative voltage that is lower than the first negative voltage.
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19.
公开(公告)号:US20220359002A1
公开(公告)日:2022-11-10
申请号:US17871635
申请日:2022-07-22
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Yi-Hsin NIEN , Wei-Chang ZHAO , Chih-Yu LIN , Hidehiro FUJIWARA , Yen-Huei CHEN , Ru-Yu WANG
IPC: G11C11/419 , G11C5/06 , G11C11/412
Abstract: A memory device includes a first word line and a second word line. A first portion of the first word line is formed in a first metal layer, a second portion of the first word line is formed in a second metal layer above the first metal layer, and a third portion of the first word line is formed in a third metal layer below the second metal layer. A first portion of the second word line is formed in the first metal layer. A second portion of the second word line is formed in the second metal layer. The first portion, the second portion, and the third portion of the first word line have sizes that are different from each other, and the first portion and the second portion of the second word line have sizes that are different from each other.
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公开(公告)号:US20200020371A1
公开(公告)日:2020-01-16
申请号:US16502596
申请日:2019-07-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hidehiro FUJIWARA , Yen-Huei CHEN
IPC: G11C7/12 , G11C5/14 , H03K19/003 , G11C7/08 , G11C7/10
Abstract: The present disclosure describes various exemplary memory storage devices that can be programmed to bypass one or more memory cells in a bypass mode of operation. The various exemplary memory storage devices can adjust, for example, pull-up or pull-down, the electronic data as the electronic data passes through these exemplary memory storage devices in the bypass mode of operation. In some situations, the various exemplary memory storage devices may introduce an unwanted bias into the electronic data as the electronic data passes through these exemplary memory storage devices in the bypass mode of operation. The various exemplary memory storage devices can pull-down the electronic data and/or pull-up the electronic data as the electronic data is passing through these exemplary memory storage devices in the bypass mode of operation to compensate for this unwanted bias.
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