公开(公告)号：US06890605B2

公开(公告)日：2005-05-10

申请号：US10252607

申请日：2002-09-24

申请人： Michinori Nishikawa ,  Manabu Sekiguchi ,  Matthias Patz ,  Mutsuhiko Yoshioka ,  Atsushi Shiota ,  Kinji Yamada

发明人： Michinori Nishikawa ,  Manabu Sekiguchi ,  Matthias Patz ,  Mutsuhiko Yoshioka ,  Atsushi Shiota ,  Kinji Yamada

IPC分类号： C09D183/06 ,  C23C18/12 ,  H01L21/312 ,  B05D3/04 ,  B05D3/06 ,  H05H1/00

CPC分类号： H01L21/3122 ,  C23C18/04 ,  C23C18/1212 ,  C23C18/122 ,  H01L21/02126 ,  H01L21/0214 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02271 ,  H01L21/02282 ,  H01L21/0234 ,  H01L21/02343 ,  H01L21/02348 ,  Y10T428/25 ,  Y10T428/259

摘要： An insulating film for semiconductors which has excellent adhesion to films formed by CVD and is useful as a dielectric film in semiconductor devices and the like is provided. The insulating film is obtained by a method comprising:(A) a step of subjecting a substrate to at least either of (A-1) at least one treatment selected from the group consisting of an ultraviolet irradiation treatment, an oxygen plasma treatment, a nitrogen plasma treatment, a helium plasma treatment, an argon plasma treatment, a hydrogen plasma treatment and an ammonia plasma treatment, and (A-2) a treatment with at least one of alkoxysilane compound having a reactive group and a product of the hydrolysis and condensation thereof; and(B) a step of applying a composition for film formation which comprises an organic solvent and either or both of at least one compound selected from the group consisting of compounds represented by the general formulae (1) to (4) as described hereinabove, and a hydrolysis/condensation product obtained by hydrolyzing and condensing the at least one compound, to the substrate and heating the resulting coating.

摘要翻译： 提供了一种半导体用绝缘膜，其与通过CVD形成的膜具有优异的粘附性，并且可用作半导体器件等中的电介质膜。 绝缘膜是通过以下方法获得的：（A）使基材经受（A-1）至少一种选自紫外线照射处理，氧等离子体处理， 氮等离子体处理，氦等离子体处理，氩等离子体处理，氢等离子体处理和氨等离子体处理，以及（A-2）使用具有反应性基团的烷氧基硅烷化合物和水解和 冷凝; 和（B）应用如上所述的包含有机溶剂和选自由通式（1）至（4）表示的化合物组成的组中的至少一种化合物中的任一种或两者的成膜用组合物的步骤， 以及通过水解和冷凝至少一种化合物而获得的水解/缩合产物，并加热所得到的涂层。

公开(公告)号：US06824833B2

公开(公告)日：2004-11-30

申请号：US10255941

申请日：2002-09-27

申请人： Michinori Nishikawa ,  Manabu Sekiguchi ,  Matthias Patz ,  Atsushi Shiota ,  Kinji Yamada

发明人： Michinori Nishikawa ,  Manabu Sekiguchi ,  Matthias Patz ,  Atsushi Shiota ,  Kinji Yamada

IPC分类号： B05D302

CPC分类号： H01L21/02126 ,  C08G65/4068 ,  C09D183/14 ,  H01L21/312 ,  Y10T428/31533 ,  Y10T428/31663 ,  Y10T428/31667

摘要： A stacked film for semiconductor having superior adhesion to a coating film formed by a CVD process in, for example, semiconductor devices, an insulating film having the stacked film and a substrate for semiconductor using the insulating film are disclosed. The stacked film comprises (A) a film of an organic compound having a carbon content of 60% by weight or more and (B) a film prepared by heating a hydrolytic condensate obtained by hydrolysis and condensation of at least one compound selected from the group consisting of specific compounds represented by the general formulae (51) to (54) described hereinabove.

摘要翻译： 公开了一种用于半导体的叠层膜，其具有对例如半导体器件中的CVD工艺形成的涂膜具有优异的粘合性，具有堆叠膜的绝缘膜和使用绝缘膜的半导体衬底。 层叠膜包含（A）碳含量为60重量％以上的有机化合物的膜，（B）通过加热通过水解缩合得到的水解缩合物而制备的膜，所述水解缩合物是通过水解缩合得到的， 由上述通式（51）至（54）表示的具体化合物组成。

公开(公告)号：US07128976B2

公开(公告)日：2006-10-31

申请号：US10269967

申请日：2002-10-15

申请人： Eiji Hayashi ,  Kouichi Hasegawa ,  Youngsoo Seo ,  Michinori Nishikawa ,  Kinji Yamada

发明人： Eiji Hayashi ,  Kouichi Hasegawa ,  Youngsoo Seo ,  Michinori Nishikawa ,  Kinji Yamada

IPC分类号： B32B25/20

CPC分类号： H01L21/02126 ,  C08G77/08 ,  C08G77/50 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122 ,  Y10T428/31663

摘要： A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by the formula (1), compounds represented by the formula (2), and compounds represented by the formula (3) in the presence of water and an ammonium compound, and (B) an organic solvent.

公开(公告)号：US06503633B2

公开(公告)日：2003-01-07

申请号：US09860914

申请日：2001-05-21

申请人： Michinori Nishikawa ,  Kouichi Hasegawa ,  Eiji Hayashi ,  Kinji Yamada

发明人： Michinori Nishikawa ,  Kouichi Hasegawa ,  Eiji Hayashi ,  Kinji Yamada

IPC分类号： C08G7716

CPC分类号： H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122 ,  H01L21/316 ,  Y10T428/31663

摘要： A composition for film formation which, when used in the production of semiconductor devices and the like, can give interlayer insulating films which differ little in dielectric constant even when obtained through curing under different conditions and have excellent adhesion to substrates, a process for producing the composition, and a silica-based film obtained from the composition. The composition for film formation comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing (A-1) at least one compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3), and (A-2) at least one compound represented by the following formula (4), in the presence of a catalyst and water; and (B) an organic solvent.

摘要翻译： 一种成膜用组合物，当用于半导体装置等的制造中时，即使在不同条件下固化而获得的介电常数几乎不相等且对基材的附着性优异，也可以制造出 组合物和由该组合物获得的二氧化硅基膜。 用于成膜的组合物包括：（A）通过水解和缩合获得的水解和缩合产物（A-1）至少一种选自由下式（1）表示的化合物的化合物，由 下述式（2）表示的化合物和下述式（3）所示的化合物和（A-2）至少一种下述式（4）所示的化合物在催化剂和水的存在下反应; 和（B）有机溶剂。

公开(公告)号：US06472079B2

公开(公告)日：2002-10-29

申请号：US09829954

申请日：2001-04-11

申请人： Eiji Hayashi ,  Michinori Nishikawa ,  Kinji Yamada

发明人： Eiji Hayashi ,  Michinori Nishikawa ,  Kinji Yamada

IPC分类号： B32B9041

CPC分类号： H01L21/02126 ,  C08G77/06 ,  C08G77/08 ,  C08G77/50 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02282 ,  H01L21/312 ,  Y10T428/31663

摘要： A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the following formula (1) RaSi(OR1)4-a  (1) (A-2) compounds represented by the following formula (2) Si(OR2)4  (2) and (A-3) compounds represented by the following formula (3) R3b(R4O)3-bSi—(R7)d—Si(OR5)3-cR6c  (3) (B) at least one member selected from the group consisting of compounds of the metals in Groups IA and IIA of the periodic table; and (C) an organic solvent. A method for film formation using the composition and a silica-based film obtained by the method are also disclosed.

摘要翻译： 一种成膜用组合物，其特征在于，含有：（A）水解缩合产物，其通过水解和缩合选自（A-1）由下式（1）表示的化合物（A-2） ）由下式（2）和（A-3）表示的化合物，由下式（3）（B）表示的化合物中的至少一种选自由周期表中第IA和IIA族中的金属的化合物组成的组中的至少一种 表; 和（C）有机溶剂。 还公开了使用该组合物和通过该方法获得的二氧化硅基膜的成膜方法。

公开(公告)号：US20120288747A1

公开(公告)日：2012-11-15

申请号：US13519752

申请日：2011-01-18

申请人： Masaya Naoi ,  Katsuhiko Hieda ,  Kinji Yamada

发明人： Masaya Naoi ,  Katsuhiko Hieda ,  Kinji Yamada

IPC分类号： H01M2/02 ,  H01G9/00 ,  H01M2/30

CPC分类号： H01G11/76 ,  H01G11/12 ,  H01G11/18 ,  H01G11/26 ,  H01M10/0413 ,  H01M10/045 ,  Y02E60/13

摘要： The object of the present invention is to provide an electrochemical device, by which short circuit between electrode sheets can be prevented even when the electrode sheets come into contact with each other due to misregistration upon folding of the electrode sheets.The electrochemical device of the present invention is an electrochemical device having a electrode unit with a pair of band-like electrode sheets respectively folded so as to be alternately stacked in a state that the following respective electrode layers come into no contact with each other, wherein the pair of the electrode sheets each have a band-like current collector, a plurality of electrode layers respectively formed on plane regions surrounded by peripheral edge portions and folding edge portions in at least one surface of the current collector, and insulating films formed on respective both surfaces of the peripheral edge portions and folding edge portions in the current collector.

摘要翻译： 本发明的目的是提供一种电化学装置，即使当电极片折叠时由于不对准而导致电极片彼此接触，也可以防止电极片之间的短路。 本发明的电化学装置是具有电极单元的电化学装置，该电极单元具有分别折叠的一对带状电极片，以便在以下各个电极层彼此不接触的状态下交替层叠，其中 一对电极片各自具有带状集电体，分别形成在由周缘部包围的平面区域上的多个电极层和集电体的至少一个表面中的折边部，以及形成在各个电极片上的绝缘膜 周缘部的两个面和集电体的折边部。

公开(公告)号：US20110184155A1

公开(公告)日：2011-07-28

申请号：US13025273

申请日：2011-02-11

申请人： Masayuki TAKAHASHI ,  Tetsuo Fukuta ,  Kiyoshi Kasai ,  Toshihiro Ogawa ,  Satoshi Katayose ,  Kouji Tamori ,  Kinji Yamada

发明人： Masayuki TAKAHASHI ,  Tetsuo Fukuta ,  Kiyoshi Kasai ,  Toshihiro Ogawa ,  Satoshi Katayose ,  Kouji Tamori ,  Kinji Yamada

IPC分类号： C07K1/14 ,  C07H1/00 ,  H01F1/42

CPC分类号： C08G63/91 ,  B32B5/16 ,  G01N33/53 ,  G01N33/5434 ,  G01N33/54353 ,  Y10T428/2982 ,  Y10T428/2998

摘要： Carrier polymer particles comprising organic polymer particles having a particle diameter of 0.1 to 20 micrometers and a saccharide with which the surface of the organic polymer particles is covered, the organic polymer particles and the saccharide being chemically bonded.

摘要翻译： 包含粒径为0.1-20微米的有机聚合物颗粒的载体聚合物颗粒和被覆盖有机聚合物颗粒的表面的糖类，有机聚合物颗粒和化学键合的糖类。

公开(公告)号：US20110077364A1

公开(公告)日：2011-03-31

申请号：US12894149

申请日：2010-09-30

申请人： Taichi TAZAKI ,  Kinji Yamada ,  Tarou Kanamori ,  Keisuke Yajima

发明人： Taichi TAZAKI ,  Kinji Yamada ,  Tarou Kanamori ,  Keisuke Yajima

IPC分类号： C08G77/32 ,  C08L83/04

CPC分类号： C08L83/14 ,  C08G77/24 ,  C08G77/50 ,  C08G77/60 ,  C08K5/0025 ,  C08K2201/008

摘要： A composition includes a curing agent and a silicon-containing polymer. The silicon-containing polymer includes a structural unit (A1) and a structural unit (A2). The structural unit (A1) is shown by a formula (1), in which each of R1 represents a monovalent hydrocarbon group having 1 to 6 carbon atoms, each of X represents a divalent hydrocarbon group having 1 to 7 carbon atoms, and n is an integer from 1 to 6. The structural unit (A2) is shown by a formula (2), in which R2 represents a monovalent hydrocarbon group having 1 to 6 carbon atoms, R3 represents a monovalent hydrocarbon group having 1 to 6 carbon atoms, a halogen atom, or a reactive functional group, and m is a positive integer. The structural unit (A1) and the structural unit (A2) have a weight ratio (A1):(A2) of 4:96 to 70:30.

摘要翻译： 组合物包括固化剂和含硅聚合物。 含硅聚合物包括结构单元（A1）和结构单元（A2）。 结构单元（A1）由式（1）表示，其中R 1表示碳原子数为1〜6的一价烃基，X表示碳原子数1〜7的二价烃基，n表示 结构单元（A2）由式（2）表示，其中R 2表示具有1至6个碳原子的一价烃基，R 3表示具有1至6个碳原子的一价烃基， 卤素原子或反应性官能团，m为正整数。 结构单元（A1）和结构单元（A2）的重量比（A1）:( A2）为4:96至70:30。

公开(公告)号：US07754806B2

公开(公告)日：2010-07-13

申请号：US12437790

申请日：2009-05-08

申请人： Masayuki Takahashi ,  Kinji Yamada ,  Toshihiro Ogawa

发明人： Masayuki Takahashi ,  Kinji Yamada ,  Toshihiro Ogawa

IPC分类号： C09D5/16

CPC分类号： C09D5/1668 ,  C09D133/14 ,  Y10T428/1334 ,  Y10T428/1352 ,  Y10T428/1393

摘要： A biological substance related article includes a coating formed by causing a biological substance adsorption preventive coating composition to come in contact with a surface of the biological substance related article and heating the composition, the biological substance adsorption preventive coating composition including: (A) a copolymer obtained by copolymerizing raw material monomers including a monomer A1 shown by the following general formula (1) and an active hydrogen group-containing monomer A2; (B) a crosslinking agent reactive with an active hydrogen group; and (C) a solvent. CH2═CR3COOR1OR2  (1) (R1 represents an alkylene group having 1 to 4 carbon atoms, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents a hydrogen atom or a methyl group).

摘要翻译： 生物物质相关物品包括通过使生物物质吸附预防涂料组合物与生物物质相关物质的表面接触并加热组合物而形成的涂层，所述生物物质吸附防止涂料组合物包含：（A）共聚物 通过使包含由以下通式（1）表示的单体A1和含活性氢基团的单体A2的原料单体共聚而获得的; （B）与活性氢基反应的交联剂; 和（C）溶剂。 CH2 = CR3COOR1OR2（1）（R1表示碳原子数1〜4的亚烷基，R2表示碳原子数1〜4的烷基，R3表示氢原子或甲基）。

公开(公告)号：US07742277B2

公开(公告)日：2010-06-22

申请号：US11508204

申请日：2006-08-23

申请人： Tomotaka Shinoda ,  Kinji Yamada ,  Takahiro Kitano ,  Yoshiki Yamanishi ,  Muneo Harada ,  Tatsuzo Kawaguchi ,  Yoshihiro Hirota ,  Katsuya Okumura ,  Shuichi Kawano

发明人： Tomotaka Shinoda ,  Kinji Yamada ,  Takahiro Kitano ,  Yoshiki Yamanishi ,  Muneo Harada ,  Tatsuzo Kawaguchi ,  Yoshihiro Hirota ,  Katsuya Okumura ,  Shuichi Kawano

IPC分类号： H01G4/06 ,  H01G4/005

CPC分类号： H01L28/65 ,  H01L27/11507 ,  H01L28/55 ,  Y10T29/435

摘要： A dielectric film capacitor includes a lower electrode having an opening and formed of a material including platinum, a dielectric film provided over the lower electrode and including an oxide having an ABOx crystal structure, and an upper electrode provided over the dielectric film. The planar area of the lower electrode is 50% or more of the area of a formation region of the dielectric film. A dielectric film capacitor includes a lower electrode formed of a material including platinum and having a thickness of 10 to 100 nm, a dielectric film provided over the lower electrode and including an oxide having an ABOx crystal structure, and an upper electrode provided over the dielectric film.

摘要翻译： 电介质膜电容器包括具有开口并由包括铂的材料形成的下电极，设置在下电极上并包括具有ABOx晶体结构的氧化物的电介质膜和设置在电介质膜上的上电极。 下部电极的平面面积为电介质膜的形成区域的面积的50％以上。 电介质膜电容器包括由包括铂的材料形成的厚度为10至100nm的下电极，设置在下电极上并包括具有ABOx晶体结构的氧化物的电介质膜，以及设置在电介质上的上电极 电影。