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    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
    11.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
    极光紫外线发光装置

    公开(公告)号：US20120217422A1

    公开(公告)日：2012-08-30

    申请号：US13396289

    申请日：2012-02-14

    申请人： Takayuki YABU ,  Kouji Kakizaki ,  Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

    发明人： Takayuki YABU ,  Kouji Kakizaki ,  Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

    IPC分类号： G01J3/10

    CPC分类号： H05G2/006 ,  G03F7/70033 ,  H05G2/008

    摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.

    摘要翻译： 一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电 导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为 位于等离子体产生区域和至少电绝缘体之间。 目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。

    Laser system
    12.
    发明授权
    Laser system 有权
    激光系统

    公开(公告)号：US08000361B2

    公开(公告)日：2011-08-16

    申请号：US12382109

    申请日：2009-03-09

    申请人： Tamotsu Abe ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

    发明人： Tamotsu Abe ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

    IPC分类号： H01S3/00 ,  H01S3/22

    CPC分类号： H01S3/2316 ,  H01S3/076 ,  H01S3/10007 ,  H01S3/2232

    摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.

    摘要翻译： 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

    Extreme ultraviolet light generation apparatus
    13.
    发明授权
    Extreme ultraviolet light generation apparatus 有权
    极紫外光发生装置

    公开(公告)号：US08698112B2

    公开(公告)日：2014-04-15

    申请号：US13396289

    申请日：2012-02-14

    申请人： Takayuki Yabu ,  Kouji Kakizaki ,  Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

    发明人： Takayuki Yabu ,  Kouji Kakizaki ,  Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

    IPC分类号： H01J35/20

    CPC分类号： H05G2/006 ,  G03F7/70033 ,  H05G2/008

    摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.

    摘要翻译： 一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电 导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为 位于等离子体产生区域和至少电绝缘体之间。 目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。

    LASER SYSTEM
    14.
    发明申请
    LASER SYSTEM 审中-公开
    激光系统

    公开(公告)号：US20110261844A1

    公开(公告)日：2011-10-27

    申请号：US13176483

    申请日：2011-07-05

    申请人： Tamotsu ABE ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

    发明人： Tamotsu ABE ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

    IPC分类号： H01S3/10

    CPC分类号： H01S3/2316 ,  H01S3/076 ,  H01S3/10007 ,  H01S3/2232

    摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.

    摘要翻译： 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
    15.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
    极光超光源光源装置

    公开(公告)号：US20100090132A1

    公开(公告)日：2010-04-15

    申请号：US12559977

    申请日：2009-09-15

    申请人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

    发明人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

    IPC分类号： G21K5/00

    CPC分类号： H05G2/003 ,  H05G2/008

    摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

    摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

    Optical element for gas laser and gas laser apparatus using the same
    18.
    发明授权
    Optical element for gas laser and gas laser apparatus using the same 有权
    用于气体激光的光学元件和使用其的气体激光装置

    公开(公告)号：US07965756B2

    公开(公告)日：2011-06-21

    申请号：US12545495

    申请日：2009-08-21

    申请人： Osamu Wakabayashi ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

    发明人： Osamu Wakabayashi ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

    IPC分类号： H01S3/22

    CPC分类号： H01S3/005 ,  G02B1/02 ,  H01S3/0057 ,  H01S3/08009 ,  H01S3/08054 ,  H01S3/10061 ,  H01S3/2251

    摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.

    摘要翻译： 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。

    Two-stage laser pulse energy control device and two-stage laser system
    19.
    发明申请
    Two-stage laser pulse energy control device and two-stage laser system 有权
    两级激光脉冲能量控制装置和两级激光系统

    公开(公告)号：US20060239309A1

    公开(公告)日：2006-10-26

    申请号：US10568091

    申请日：2004-08-09

    申请人： Tatsuya Ariga ,  Osamu Wakabayashi ,  Kouji Kakizaki

    发明人： Tatsuya Ariga ,  Osamu Wakabayashi ,  Kouji Kakizaki

    IPC分类号： H01S3/13 ,  H01S3/00 ,  H01S3/22 ,  H01S3/223

    CPC分类号： G03F7/70041 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/10007 ,  H01S3/104 ,  H01S3/1301 ,  H01S3/134

    摘要： A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.

    摘要翻译： 施加到设置在振荡激光器100的振荡高电压脉冲发生器12中的主电容器C 0的充电电压Vosc受到恒定的控制，使得振荡激光器100的脉冲能量Posc成为下限能量Es 0或 更多的是放大饱和区域。 并且，控制施加到放大激光器300的放大高压脉冲发生器32中的主电容器C 0的充电电压Vamp，将放大激光器300的脉冲能量Pamp确定为目标能量Patgt。 因此，控制两级激光器的脉冲能量以稳定脉冲能量。