公开(公告)号：US11211278B2

公开(公告)日：2021-12-28

申请号：US16655330

申请日：2019-10-17

Applicant: TOKYO ELECTRON LIMITED

Inventor： Akihiro Teramoto ,  Suguru Enokida ,  Masashi Tsuchiyama ,  Keisuke Sasaki

IPC: H01L21/677

Abstract: There is provided a substrate processing apparatus for processing a substrate, including: a storage part provided on an uppermost portion of the substrate processing apparatus and on which a substrate accommodation container for accommodating the substrate is placed; and a first transfer device configured to directly or indirectly deliver the substrate accommodation container between the storage part and a loading/unloading part, wherein the loading/unloading part is configured to place the substrate accommodation container thereon in the substrate processing apparatus and to load and unload the substrate into and from a processing part of the substrate processing apparatus, and the first transfer device is configured to deliver the substrate accommodation container with respect to an overhead hoist transport that moves above the substrate processing apparatus.

公开(公告)号：US11099480B2

公开(公告)日：2021-08-24

申请号：US16393042

申请日：2019-04-24

Applicant: Tokyo Electron Limited

Inventor： Takahiro Ookubo ,  Suguru Enokida ,  Toshinobu Furusho

IPC: G03F7/16 ,  B05C11/10

Abstract: A treatment solution supply apparatus supplies a treatment solution to a solution treatment apparatus which applies the treatment solution to a substrate to perform a predetermined treatment. Plural solution treatment apparatuses are supply destinations of the treatment solution. The treatment solution supply apparatus includes: a sending unit common among the solution treatment apparatuses, the sending unit sends the treatment solution stored in a treatment solution supply source to each of the solution treatment apparatuses; and a control unit that controls the sending unit. The sending unit includes pumps that suck the treatment solution and load the treatment solution thereinto and send the loaded treatment solution. The control unit controls suction timing of each of the pumps so that one (or more) of the pumps becomes in a state capable of sending the treatment solution to the solution treatment apparatuses at all times.

公开(公告)号：US09773690B2

公开(公告)日：2017-09-26

申请号：US14649673

申请日：2013-12-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Katsuhiro Morikawa ,  Ikuo Sunaka ,  Suguru Enokida

IPC: H01L21/677 ,  H01L21/67

CPC classification number: H01L21/67772 ,  H01L21/67253 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778

Abstract: A substrate processing apparatus includes: a load port into and out of which the transport container is carried; and an apparatus controller that controls operations in the load port. The apparatus controller includes a storage unit that stores transition data of parameter values sent from outside based on a transport container identification code. The transition data of the parameter values each comprises a usage count of the transport container and a corresponding parameter value that quantifies a result of at least one of an operation performed to remove the lid after the transport container is carried into the load port and an operation performed to carry the container out of the load port. The apparatus controller further includes a determination unit that determines, after a transport container is carried into the load port, presence or absence of an abnormality in that transport container based on a parameter value associated with at least one of carrying-in or carrying-out of that transport container, and past transition data of parameter values associated with that transport container.

公开(公告)号：US20250125175A1

公开(公告)日：2025-04-17

申请号：US18914666

申请日：2024-10-14

Applicant: Tokyo Electron Limited

Inventor： Seiji Nakashima ,  Tsuyoshi Watanabe ,  Akira Oozono ,  Suguru Enokida

IPC: H01L21/677 ,  H01L21/67

Abstract: A substrate processing apparatus includes a carry-in/out block having a container placement section; and a processing block, disposed to be adjacent to the carry-in/out block in a width direction, having multiple processing modules each configured to perform a process on a substrate. The carry-in/out block further includes: a transit block in which transit modules are provided on a processing block side to deliver the substrate to/from the processing block; and a first transfer mechanism configured to transfer the substrate between the container placement section and the transit block. The processing block further includes a second transfer mechanism configured to transfer the substrate between the transit block and the processing module. The first transfer mechanism has a support, and is configured to allow the substrate supported by the support to pass through the transit block in a depth direction intersecting with the width direction, when viewed from a top.

公开(公告)号：US20220319876A1

公开(公告)日：2022-10-06

申请号：US17657821

申请日：2022-04-04

Applicant: Tokyo Electron Limited

Inventor： Shinichi Hayashi ,  Hiroaki Inadomi ,  Shota Umezaki ,  Suguru Enokida ,  Kouji Kimoto

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/677 ,  B08B3/08 ,  B08B13/00

Abstract: A substrate processing apparatus includes multiple first substrate processing devices, one or more second substrate processing devices and a transfer unit. Each of the multiple first substrate processing devices is configured to process a substrate one by one. The one or more second substrate processing devices are configured to simultaneously process multiple substrates, which are processed in the multiple first substrate processing devices. The transfer unit is configured to simultaneously carry the multiple substrates, which are processed in the multiple first substrate processing devices, into a same second substrate processing device.

公开(公告)号：US20200066559A1

公开(公告)日：2020-02-27

申请号：US16669965

申请日：2019-10-31

Applicant: Tokyo Electron Limited

Inventor： Kenichi Shigetomi ,  Takeshi Saikusa ,  Eiichi Sekimoto ,  Takayuki Fukudome ,  Kousuke Yoshihara ,  Suguru Enokida ,  Kazuhiro Takeshita ,  Kazuto Umeki

IPC: H01L21/67 ,  H05B1/02

Abstract: A substrate processing apparatus includes plural heating modules each including a table on which a substrate is placed to be heated, the substrate having plural heated zones. The table has plural heaters each assigned to heat respective ones of the heated zones. Heat generation of the heaters is controlled independently. A control unit controls the heaters such that integrated quantities of heat of the respective heated zones given by the corresponding heaters from first to second time point are substantially identical to each other in each of the heating modules, and are substantially identical to each other among the heating modules. The first time point is set when a temperature transition profile of the substrate is rising toward a process temperature after placing the substrate on the table under a condition where heat generation of the heaters is stable. The second time point is set after the temperature transition profile reaches the process temperature.

公开(公告)号：US09460947B2

公开(公告)日：2016-10-04

申请号：US14332473

申请日：2014-07-16

Applicant: Tokyo Electron Limited

Inventor： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC: H01L21/67 ,  G03F7/16 ,  G03F7/30

CPC classification number: H01L21/67178 ,  G03F7/16 ,  G03F7/162 ,  G03F7/30 ,  G03F7/3021 ,  H01L21/67184 ,  H01L21/67225 ,  H01L21/6723

Abstract: In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.

Abstract translation: 在一个实施例中，涂覆和显影装置设置有转移单元，其设置在一堆早期处理单元块和一堆后期处理单元块之间，用于在横向相邻单元块的传送机构之间传送基板 以及用于在转印单元之间输送基板的可垂直移动的辅助转印机构。 一堆第一显影单元块堆叠在早期处理单元块的堆叠上，并且第二显影单元块的堆叠堆叠在后级处理单元块的堆叠上。

公开(公告)号：US09299599B2

公开(公告)日：2016-03-29

申请号：US14248765

申请日：2014-04-09

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yuichi Douki ,  Tokutarou Hayashi ,  Naruaki Iida ,  Suguru Enokida

IPC: H01L21/00 ,  H05B3/68 ,  C23C16/00 ,  H01L21/68 ,  H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  H01L21/66

CPC classification number: H01L21/68 ,  H01L21/6715 ,  H01L21/67748 ,  H01L21/681 ,  H01L21/68707 ,  H01L22/10 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A substrate holder positioning method, capable of positioning a substrate holder without using any positioning jig, includes: measuring a first position of a substrate held on a substrate holder included in a substrate carrying mechanism; carrying the substrate held on the substrate holder to a substrate rotating unit for holding and rotating the substrate; turning the substrate held by the substrate rotating unit through a predetermined angle by the substrate rotating unit; transferring the substrate turned by the substrate rotating unit from the substrate rotating unit to the substrate holder; measuring a second position of the substrate transferred from the substrate rotating unit to the substrate holder; determining the position of the center of rotation of the substrate rotating unit on the basis of the first and the second position; and positioning the substrate holder on the basis of the position of the center of rotation.

Abstract translation: 一种能够在不使用任何定位夹具的情况下定位基板支架的基板支架定位方法，包括：测量保持在基板承载机构中的基板保持器上的基板的第一位置; 将保持在所述基板保持器上的所述基板承载到用于保持和旋转所述基板的基板旋转单元; 通过基板旋转单元将由基板旋转单元保持的基板转动预定角度; 将由基板旋转单元转动的基板从基板旋转单元传送到基板保持器; 测量从所述基板旋转单元转移到所述基板保持器的所述基板的第二位置; 基于第一位置和第二位置确定基板旋转单元的旋转中心的位置; 并且基于旋转中心的位置来定位衬底保持器。

公开(公告)号：US08740481B2

公开(公告)日：2014-06-03

申请号：US13967485

申请日：2013-08-15

Applicant: Tokyo Electron Limited

Inventor： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC: G03D5/00 ,  G03B27/52 ,  B05C11/02 ,  B05C13/02 ,  G03F7/20 ,  H01L21/67

CPC classification number: G03F7/708 ,  H01L21/6715

Abstract: A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.

Abstract translation: 涂覆和显影装置包括具有至少一个涂膜形成单元块堆叠和垂直堆叠的显影单元块堆叠的处理块。 每个单元块堆叠包括垂直堆叠的单元块，并且每个单元块包括包含液体处理模块和加热模块的处理模块。 每个单元块包括可沿着运输通道从承载块侧移动到接口块侧的运输机构，以在属于单元块的处理模块之间输送基板。 分别在涂膜形成单元块和显影单元块的承载块侧设置传送单元，用于将基板传送到相关的涂膜形成或显影单元块的传送机构。 第一传送机构将从载体移除的基板传送到与涂膜形成单元块相关联的转印单元之一。

公开(公告)号：US20130166064A1

公开(公告)日：2013-06-27

申请号：US13716659

申请日：2012-12-17

Applicant: Tokyo Electron Limited

Inventor： Junnosuke Maki ,  Mitsuteru Yano ,  Seiji Nakano ,  Tsuyoshi Watanabe ,  Yasunori Toyoda ,  Suguru Enokida ,  Naruaki Iida ,  Hiroki Harada

IPC: G06F17/00

CPC classification number: G06F17/00 ,  B25J13/085 ,  H01L21/67288 ,  H01L21/68707

Abstract: A transfer apparatus for mounting and transferring a transferred component on a driven means, the transfer apparatus includes: a driving means for rotating a driving side pulley by a rotational driving force of a motor to move a belt wound around the driving side pulley, thereby moving the driven means coupled to the belt in a predetermined direction; and a transfer monitoring means for monitoring a transfer state of the driven means, wherein the transfer monitoring means detects a torque value of the motor required to move the driven means, calculates a torque differential value of the torque value with respect to time based on the detected torque value, and detects the transfer state using the calculated torque differential value.

Abstract translation: 一种用于在被驱动装置上安装和传送传送部件的传送装置，所述传送装置包括：驱动装置，用于通过电动机的旋转驱动力旋转驱动侧滑轮，以使缠绕在驱动侧滑轮周围的皮带移动，从而移动 所述被驱动装置沿预定方向联接到所述带; 以及传送监视装置，用于监视被驱动装置的传送状态，其中转印监视装置检测移动被驱动装置所需的电动机的转矩值，基于时间计算转矩值相对于时间的转矩差值 检测转矩值，并使用计算出的转矩差分值来检测转印状态。