摘要:
A method of manufacturing a semiconductor integrated circuit device of the bipolar type of the MOS type or an integration of the two types having high integration and high performance, in which the circuit includes a first device region of which the side surface and entire region of the lower portion of the active region are made of silicon oxide and a second device region of which the side surface and a part of the lower portion of the active region are made of silicon oxide. According to the present invention, a transistor whose bottom portion is opened and a transistor whose bottom portion is not opened can be freely provided on a substrate, thereby dividing the transistors into a transistor to which a voltage can be supplied from the substrate and a transistor to which the voltage can not be supplied from the substrate, so that the wiring which has been conventionally needed can be reduced. In addition, in such transistors which are completely separated, the parasitic effect with the circumference is completely prevented so that excellent characteristics can be provided.
摘要:
Disclosed is a method of isolating a transistor perfectly by employing a selective oxidation technology (LOCOS technology). More particularly, vertical openings are formed in the surface of {100} silicon substrate, and oxidation resistant films are formed of this surface and in part of the side walls of these openings. In succession, by etching with an etchant having an orientation anisotropy, dents are formed at high precision in the side walls of the openings. By oxidizing using the oxidation resistant film as the mask, an oxide film growing out from a dent in the opening side wall is connected with another oxide film growing out from an adjacent dent. The transistor thus formed in the active region of the silicon electrically isolated from the substrate is small in parasitic capacitance and may be formed into a small size, so that it possesses the features suited to VLSI, that is, high speed, low power consumption, and processability to high density integration.
摘要:
A method of fabricating a semiconductor device comprises the steps of forming oxidation-resistive films on the surface and sides of a protrusion formed on a semiconductor substrate, forming grooves at the bottom of the sides of the protrusion, forming highly doped impurity diffusion regions in the groove surfaces, and subjecting the grooves to selective oxidation to form an oxide film under the bottom of the protrusion while a highly doped impurity diffusion region is formed, and forming a device in the protrusion.
摘要:
A parallel type analog-digital converter having a plural number (1023) of comparators, a first voltage divider comprising a plural number (1023) of resistors (R.sub.1 to R.sub.1023) connected in series across positive and negative terminals of a power source thereby feeding reference voltages from the junction points to the comparators, the apparatus further comprisesa second voltage divider comprising a second plural number (8) of resistors (r.sub.1, r.sub.2 . . . r.sub.8) connected in series across the voltage feeding terminals thereby feeding input voltages to input terminals of the current amplifiers D.sub.1, D.sub.2 . . . D.sub.8, the output of which is given to the corresponding junction points of the first voltage divider, thereby to equalize voltages of said first voltage divider with voltages of corresponding junction points of said second voltage divider.
摘要:
The present invention is an electronic musical instrument the type in which information of the actuation of keys is detected by scanning the keys of a keyboard. The electronic musical instrument includes keys selectively actuable for producing sounds which correspond to respective musical scale notes, circuitry for sequentially scanning these keys for detection of the information of the actuation of these keys, and a memory circuit corresponding to each of the keys so that the information of the actuation of the keys is stored in the memory circuits.
摘要:
In a method of making integrated circuits, prior to vapor deposition of metal layers on an insulating layer for interconnection, each opening on the insulating layer is filled with an embedded metal layer in order to smoothen the surface to be vapor deposited and to avoid undesirable thin parts of the vapor deposited metal layer at the step between the lower part in the opening and the elevated part on the insulating layer. The filling of the embedded metal layer in each opening is made by a first step of coating a metal layer on the whole surface of the principal face of the semi-conductor, which surface is coated by the insulating layer with specified openings and further by a photoresist layer which has been used for etching the insulating layer to form said openings and is left covering said insulating layer, and by the subsequent step of applying a photoresist removing liquid on the face to remove the photoresist layer and the part of metal layer still remaining on the photoresist layer.