Lithographic apparatus and device manufacturing method
    11.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20050254028A1

    公开(公告)日:2005-11-17

    申请号:US10842636

    申请日:2004-05-11

    Applicant: Wilhelmus Box

    Inventor: Wilhelmus Box

    CPC classification number: G03F7/70875 G03F7/707 G03F7/70783

    Abstract: A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.

    Abstract translation: 光刻设备包括:照明系统,用于提供辐射束;支撑件,用于支撑图案形成装置;所述图案形成装置被配置成使其具有在其横截面上的图案;衬底台,用于保持衬底;投影系统 将图案化的光束投影到基板的目标部分上,以及调节系统以调节基板。 调理系统用调理流体来调节基材的非目标部分。 一种制造器件的方法包括调节衬底的非目标部分。

    Lithographic apparatus and device manufacturing method
    12.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20050134827A1

    公开(公告)日:2005-06-23

    申请号:US10740832

    申请日:2003-12-22

    CPC classification number: G03F7/707 G03F7/70783 G03F7/70875 G03F7/709

    Abstract: A lithographic apparatus includes an illumination system for projecting a beam of radiation onto a substrate. The lithographic apparatus further has a chuck assembly for supporting at least one of the substrate or a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. A heat transfer system is operable between a first surface and a second surface. The heat transfer system is capable of transferring heat between the first surface and the second surface. The first surface is at least partially formed by at least a part of the chuck assembly. The second surface is at least partially formed by at least a part of a component spaced a distance from the chuck. The second surface is mechanically isolated from and thermally coupled to the first surface.

    Abstract translation: 光刻设备包括用于将辐射束投射到衬底上的照明系统。 光刻设备还具有用于支撑基板或图案形成装置中的至少一个的卡盘组件,图案形成装置用于在其横截面中赋予光束图案。 传热系统可在第一表面和第二表面之间操作。 传热系统能够在第一表面和第二表面之间传递热量。 第一表面至少部分地由卡盘组件的至少一部分形成。 第二表面至少部分地由与卡盘间隔一定距离的部件的至少一部分形成。 第二表面与第一表面机械隔离并热耦合。

    Lithographic apparatus and device manufacturing method
    13.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20050128448A1

    公开(公告)日:2005-06-16

    申请号:US10731428

    申请日:2003-12-10

    CPC classification number: G03F7/70875

    Abstract: A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.

    Abstract translation: 一种光刻设备,包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还具有用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻设备还具有用于支撑物体的卡盘和相对于光刻设备的其它部分支撑卡盘的框架。 卡盘至少与框架隔离。

    Lithographic projection apparatus and device manufacturing method
    14.
    发明申请
    Lithographic projection apparatus and device manufacturing method 失效
    平版印刷设备及其制造方法

    公开(公告)号:US20050018157A1

    公开(公告)日:2005-01-27

    申请号:US10875510

    申请日:2004-06-25

    CPC classification number: G03F7/70891 G03F7/70916

    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a substrate support for supporting at least one substrate, a radiation system for providing at least one beam of radiation, and a vacuum chamber. The vacuum chamber includes a patterning device and/or a projection system. The patterning device is arranged for patterning the beam of radiation according to a desired pattern, and the projection system is arranged for projecting the patterned beam of radiation onto a target portion of the substrate. The apparatus also includes at least one thermal shield for thermally conditioning at least part of the apparatus. The thermal shield includes particle transmission channels for transmitting particles through the shield, from a first side of the shield to a second side of the shield.

    Abstract translation: 公开了一种光刻投影装置。 该装置包括用于支撑至少一个基板的基板支撑件,用于提供至少一个辐射束的辐射系统和真空室。 真空室包括图案形成装置和/或投影系统。 图案形成装置被布置成根据期望的图案图案化辐射束,并且投影系统被布置用于将图案化的辐射束投影到基板的目标部分上。 该装置还包括至少一个热屏蔽件,用于热调节装置的至少一部分。 热屏蔽包括用于将颗粒从屏蔽件的第一侧传送到屏蔽件的第二侧的颗粒传输通道。

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