公开(公告)号：US20050254028A1

公开(公告)日：2005-11-17

申请号：US10842636

申请日：2004-05-11

Applicant: Wilhelmus Box

Inventor： Wilhelmus Box

IPC: G03F7/20 ,  G03B27/42 ,  H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/707 ,  G03F7/70783

Abstract: A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.

Abstract translation: 光刻设备包括：照明系统，用于提供辐射束;支撑件，用于支撑图案形成装置;所述图案形成装置被配置成使其具有在其横截面上的图案;衬底台，用于保持衬底;投影系统 将图案化的光束投影到基板的目标部分上，以及调节系统以调节基板。 调理系统用调理流体来调节基材的非目标部分。 一种制造器件的方法包括调节衬底的非目标部分。

公开(公告)号：US20050134827A1

公开(公告)日：2005-06-23

申请号：US10740832

申请日：2003-12-22

Applicant: Wilhelmus Box ,  Hendrik Eggink

Inventor： Wilhelmus Box ,  Hendrik Eggink

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/58

CPC classification number: G03F7/707 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/709

Abstract: A lithographic apparatus includes an illumination system for projecting a beam of radiation onto a substrate. The lithographic apparatus further has a chuck assembly for supporting at least one of the substrate or a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. A heat transfer system is operable between a first surface and a second surface. The heat transfer system is capable of transferring heat between the first surface and the second surface. The first surface is at least partially formed by at least a part of the chuck assembly. The second surface is at least partially formed by at least a part of a component spaced a distance from the chuck. The second surface is mechanically isolated from and thermally coupled to the first surface.

Abstract translation: 光刻设备包括用于将辐射束投射到衬底上的照明系统。 光刻设备还具有用于支撑基板或图案形成装置中的至少一个的卡盘组件，图案形成装置用于在其横截面中赋予光束图案。 传热系统可在第一表面和第二表面之间操作。 传热系统能够在第一表面和第二表面之间传递热量。 第一表面至少部分地由卡盘组件的至少一部分形成。 第二表面至少部分地由与卡盘间隔一定距离的部件的至少一部分形成。 第二表面与第一表面机械隔离并热耦合。

公开(公告)号：US20050128448A1

公开(公告)日：2005-06-16

申请号：US10731428

申请日：2003-12-10

Applicant: Wilhelmus Box ,  Noud Gilissen ,  Joost Ottens

Inventor： Wilhelmus Box ,  Noud Gilissen ,  Joost Ottens

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70875

Abstract: A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.

Abstract translation: 一种光刻设备，包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还具有用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻设备还具有用于支撑物体的卡盘和相对于光刻设备的其它部分支撑卡盘的框架。 卡盘至少与框架隔离。

公开(公告)号：US20050018157A1

公开(公告)日：2005-01-27

申请号：US10875510

申请日：2004-06-25

Applicant: Wilhelmus Box ,  Johannes Wilhelmus Jacobs ,  Paulus Liebregts ,  Thijs Harink

Inventor： Wilhelmus Box ,  Johannes Wilhelmus Jacobs ,  Paulus Liebregts ,  Thijs Harink

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/70891 ,  G03F7/70916

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a substrate support for supporting at least one substrate, a radiation system for providing at least one beam of radiation, and a vacuum chamber. The vacuum chamber includes a patterning device and/or a projection system. The patterning device is arranged for patterning the beam of radiation according to a desired pattern, and the projection system is arranged for projecting the patterned beam of radiation onto a target portion of the substrate. The apparatus also includes at least one thermal shield for thermally conditioning at least part of the apparatus. The thermal shield includes particle transmission channels for transmitting particles through the shield, from a first side of the shield to a second side of the shield.

Abstract translation: 公开了一种光刻投影装置。 该装置包括用于支撑至少一个基板的基板支撑件，用于提供至少一个辐射束的辐射系统和真空室。 真空室包括图案形成装置和/或投影系统。 图案形成装置被布置成根据期望的图案图案化辐射束，并且投影系统被布置用于将图案化的辐射束投影到基板的目标部分上。 该装置还包括至少一个热屏蔽件，用于热调节装置的至少一部分。 热屏蔽包括用于将颗粒从屏蔽件的第一侧传送到屏蔽件的第二侧的颗粒传输通道。

公开(公告)号：US20070115443A1

公开(公告)日：2007-05-24

申请号：US11285393

申请日：2005-11-23

Applicant: Wilhelmus Box ,  Derk Klunder ,  Maarten Wilhelmus Van Herpen ,  Niels Driessen

Inventor： Wilhelmus Box ,  Derk Klunder ,  Maarten Wilhelmus Van Herpen ,  Niels Driessen

IPC: G03B27/52

CPC classification number: G03F7/70916 ,  G03F7/70858

Abstract: The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source for generating extreme ultraviolet radiation, a contamination barrier for trapping contamination from the radiation source, and a temperature sensor for sensing a temperature of the contamination barrier.

Abstract translation: 本发明涉及一种用于产生辐射束的辐射系统。 辐射系统包括用于产生极紫外辐射的极紫外光源，用于捕获来自辐射源的污染物的污染屏障，以及用于感测污染屏障温度的温度传感器。

公开(公告)号：US20070084461A1

公开(公告)日：2007-04-19

申请号：US11455943

申请日：2006-06-20

Applicant: Wilhelmus Box ,  Harm-Jan Voorma ,  Olav Frijns ,  Maurice Arthur Limpens

Inventor： Wilhelmus Box ,  Harm-Jan Voorma ,  Olav Frijns ,  Maurice Arthur Limpens

IPC: F24J2/36

CPC classification number: G03F7/70891 ,  F24S10/90 ,  F24S23/70 ,  F24S40/50 ,  G02B7/1815 ,  G03F7/70175

Abstract: A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element which is internally provided with a fluid channel.

Abstract translation: 公开了一种收集器，其被构造为接收来自辐射源的辐射并将辐射传输到照明系统，该收集器包括内部设置有流体通道的反射元件。

公开(公告)号：US20060126041A1

公开(公告)日：2006-06-15

申请号：US11012062

申请日：2004-12-15

Applicant: Antonius Van Dijsseldonk ,  Mustafa Amhaouch ,  Wilhelmus Box ,  Johannes Jacobs ,  Hernes Jacobs ,  Marius Ravensbergen ,  Martinus Arnoldus Terken ,  Robert Livesey ,  Franciscus Catharina Van Vroonhoven

Inventor： Antonius Van Dijsseldonk ,  Mustafa Amhaouch ,  Wilhelmus Box ,  Johannes Jacobs ,  Hernes Jacobs ,  Marius Ravensbergen ,  Martinus Arnoldus Terken ,  Robert Livesey ,  Franciscus Catharina Van Vroonhoven

IPC: G03B27/42

CPC classification number: G03F7/70841 ,  G03F7/70991

Abstract: A vacuum operated lithographic apparatus is disclosed. The apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.

Abstract translation: 公开了一种真空操作的光刻设备。 该装置包括用于向构造成支撑图案形成装置的支撑件，或衬底台，或投影系统或其任何组合提供真空环境的真空壳体。 真空壳体的内部包括用于输送用于光刻处理的第一工艺模式的流体和/或电信号的多个输送电路。 传送电路中的至少一个适于将能量传送到真空壳体的内部，以刺激真空壳体中的除气，以用于使光刻设备进入真空操作状态的第二工艺模式。

公开(公告)号：US20060119815A1

公开(公告)日：2006-06-08

申请号：US11005231

申请日：2004-12-07

Applicant: Dominicus Jacobus Franken ,  Arno Bleeker ,  Wilhelmus Box ,  Martinus Hendricus Hoeks ,  Henricus Tegenbosch ,  Kars Troost ,  Lambertus Kessels

Inventor： Dominicus Jacobus Franken ,  Arno Bleeker ,  Wilhelmus Box ,  Martinus Hendricus Hoeks ,  Henricus Tegenbosch ,  Kars Troost ,  Lambertus Kessels

IPC: G03B27/42

CPC classification number: G03F7/70875 ,  G03F7/70291

Abstract: A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

Abstract translation: 使用系统和方法来补偿单独可控元件阵列的热输出。 这可以通过在不使用阵列投影光束来控制阵列的温度时将控制信号输入到阵列来完成。 可以提供加热元件以保持阵列的温度。 可以提供热储存器以保持阵列的温度或者可以提供冷却元件以在使用期间降低阵列的温度。

公开(公告)号：US20050151954A1

公开(公告)日：2005-07-14

申请号：US10986182

申请日：2004-11-12

Applicant: Petrus Bartray ,  Wilhelmus Box ,  Carlo Luijten ,  Bernardus Luttikhuis ,  Michael Ten Bhomer ,  Ferdy Migchelbrink ,  Jan Kuit

Inventor： Petrus Bartray ,  Wilhelmus Box ,  Carlo Luijten ,  Bernardus Luttikhuis ,  Michael Ten Bhomer ,  Ferdy Migchelbrink ,  Jan Kuit

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20 ,  G03B27/58

CPC classification number: G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

Abstract: A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10−6/K.

Abstract translation: 提供了一种光刻设备，其包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。 图案形成装置用于使辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于提供参考表面的隔离参考框架，以及用于测量基板相对于基板的测量系统 参考面。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。

公开(公告)号：US20050018154A1

公开(公告)日：2005-01-27

申请号：US10844570

申请日：2004-05-13

Applicant: Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

Inventor： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

IPC: G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G21K5/00

CPC classification number: G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

Abstract: A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

Abstract translation: 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。