利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

71 条记录 (耗时 0.024 秒)

    Method for fabricating thin film magnetic heads using CMP with polishing stop layer
    11.
    发明授权
    Method for fabricating thin film magnetic heads using CMP with polishing stop layer 失效
    使用具有抛光停止层的CMP制造薄膜磁头的方法

    公开(公告)号：US07279424B2

    公开(公告)日：2007-10-09

    申请号：US10928002

    申请日：2004-08-27

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Hong Zhang

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Hong Zhang

    IPC分类号： H01L21/302

    CPC分类号： B82Y25/00 ,  G11B5/3163 ,  G11B5/3169

    摘要： A method is described for thin film processing using a selected CMP slurry with a silicon dioxide stop layer. The slurry includes an abrasive, preferably alumina, a corrosion inhibitor, preferably benzotriazole (BTA), and an oxidizer preferably hydrogen peroxide. The method is particularly useful for fabricating thin film heads where alumina is used as the dielectric. The method can be used to planarize metal structures surrounded by alumina in magnetic heads. The alumina refill is deposited to the final target height which is slightly below the height of the metal. A thin silicon dioxide stop layer is deposited over the alumina. The CMP is executed using the selected slurry to planarize the wafer down to the stop layer. Preferably only a negligible amount of the stop layer remains and the height of the metal structure is essentially the same as the deposited height of the refilled alumina.

    摘要翻译： 描述了使用具有二氧化硅停止层的所选CMP浆料进行薄膜处理的方法。 浆料包括研磨剂，优选氧化铝，腐蚀抑制剂，优选苯并三唑（BTA）和优选过氧化氢的氧化剂。 该方法对于制造其中使用氧化铝作为电介质的薄膜头特别有用。 该方法可用于平面化由磁头中的氧化铝包围的金属结构。 氧化铝填充物沉积到稍低于金属高度的最终目标高度。 在氧化铝上沉积薄的二氧化硅阻挡层。 使用所选择的浆料执行CMP以将晶片平坦化到停止层。 优选地，仅剩下可忽略量的止挡层，并且金属结构的高度与再填充氧化铝的沉积高度基本相同。

    Gentle chemical mechanical polishing (CMP) liftoff process
    12.
    发明授权
    Gentle chemical mechanical polishing (CMP) liftoff process 失效
    温和化学机械抛光（CMP）剥离工艺

    公开(公告)号：US07220167B2

    公开(公告)日：2007-05-22

    申请号：US11034340

    申请日：2005-01-11

    申请人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  John Jaekoyun Yang

    发明人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  John Jaekoyun Yang

    IPC分类号： B24B1/00

    CPC分类号： B24B37/24 ,  B24B37/042 ,  B24B49/16

    摘要： A method for chemical mechanical polishing (CMP) wafers having high aspect ratio surface topography. A wafer is positioned on a plate. A polishing pad is coupled to a platen. A polishing solution (e.g., slurry) is added between the polishing pad and the wafer. CMP is performed on the wafer by creating a relative movement between the polishing pad and the wafer. The polishing pad removes substantially all residual material from the channels. To accomplish this, the polishing pad has a compressibility of at least 5% at a polishing pressure of about 4 psi.

    摘要翻译： 一种具有高纵横比表面形貌的化学机械抛光（CMP）晶片的方法。 晶片位于板上。 抛光垫联接到压板。 在抛光垫和晶片之间添加抛光溶液（例如浆料）。 通过在抛光垫和晶片之间产生相对移动来在晶片上执行CMP。 抛光垫基本上从通道中去除所有残留的材料。 为了实现这一点，抛光垫在约4psi的抛光压力下具有至少5％的压缩率。

    P1 write pole with shoulder formation and method of fabrication
    13.
    发明申请
    P1 write pole with shoulder formation and method of fabrication 失效
    P1写杆与肩部形成和制造方法

    公开(公告)号：US20060171069A1

    公开(公告)日：2006-08-03

    申请号：US11046740

    申请日：2005-01-31

    申请人： Daniel Bedell ,  Hung-Chin Guthrie ,  Ming Jiang ,  Hieu Lam ,  Jyh-Shuey Lo ,  Edward Lee ,  Aron Pentek

    发明人： Daniel Bedell ,  Hung-Chin Guthrie ,  Ming Jiang ,  Hieu Lam ,  Jyh-Shuey Lo ,  Edward Lee ,  Aron Pentek

    IPC分类号： G11B5/147

    CPC分类号： G11B5/1871 ,  G11B5/3116

    摘要： A magnetic disk drive head is disclosed including a write head, which includes a P1 layer having a pedestal portion, a gap layer formed on the P1 layer, and a P2 layer formed on the gap layer. The P1 layer includes a shoulder formation having a neck portion and a beveled portion. Also disclosed is a disk drive having a write head with a P1 layer with shoulder formation, and a method for fabricating a write pole for a magnetic recording head having a P1 layer with shoulder formation.

    摘要翻译： 公开了一种包括写头的磁盘驱动器头，该写头包括具有基座部分的P 1层，在P 1层上形成的间隙层和形成在间隙层上的P 2层。 P 1层包括具有颈部和斜面部分的肩部结构。 还公开了一种具有具有肩部形成的P 1层的写入头的磁盘驱动器，以及用于制造具有具有肩部形成的P 1层的磁性记录头的写入磁极的方法。

    Gentle chemical mechanical polishing (CMP) liftoff process
    14.
    发明申请
    Gentle chemical mechanical polishing (CMP) liftoff process 失效
    温和化学机械抛光（CMP）剥离工艺

    公开(公告)号：US20060154573A1

    公开(公告)日：2006-07-13

    申请号：US11034340

    申请日：2005-01-11

    申请人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  John Yang

    发明人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  John Yang

    IPC分类号： B24B1/00

    CPC分类号： B24B37/24 ,  B24B37/042 ,  B24B49/16

    摘要： A method for chemical mechanical polishing (CMP) wafers having high aspect ratio surface topography. A wafer is positioned on a plate. A polishing pad is coupled to a platen. A polishing solution (e.g., slurry) is added between the polishing pad and the wafer. CMP is performed on the wafer by creating a relative movement between the polishing pad and the wafer. The polishing pad removes substantially all residual material from the channels. To accomplish this, the polishing pad has a compressibility of at least 5% at a polishing pressure of about 4 psi.

    摘要翻译： 一种具有高纵横比表面形貌的化学机械抛光（CMP）晶片的方法。 晶片位于板上。 抛光垫联接到压板。 在抛光垫和晶片之间添加抛光溶液（例如浆料）。 通过在抛光垫和晶片之间产生相对移动来在晶片上执行CMP。 抛光垫基本上从通道中去除所有残留的材料。 为了实现这一点，抛光垫在约4psi的抛光压力下具有至少5％的压缩率。

    CMP for corrosion-free CoFe elements for magnetic heads
    15.
    发明申请
    CMP for corrosion-free CoFe elements for magnetic heads 有权
    CMP用于磁头的无腐蚀CoFe元件

    公开(公告)号：US20050127027A1

    公开(公告)日：2005-06-16

    申请号：US10734361

    申请日：2003-12-11

    申请人： Christopher Bergevin ,  Hung-Chin Guthrie ,  Tom Harris ,  Ming Jiang ,  John Yang

    发明人： Christopher Bergevin ,  Hung-Chin Guthrie ,  Tom Harris ,  Ming Jiang ,  John Yang

    IPC分类号： B24B37/04 ,  B44C1/22 ,  C09K3/14 ,  G11B5/31

    CPC分类号： G11B5/3163 ,  B24B37/044 ,  C09K3/1472

    摘要： A method of manufacture of magnetic heads which include CoFe elements using CMP is presented. The method includes providing a slurry of Al2O3, adjusting the concentration of H2O2 in said slurry to within a range of 6-12% by volume and balancing mechanical polishing action. The balancing is done by adjusting the table speed of a mechanical polisher to within a range of 55-90 rpm, and adjusting polishing pressure to within a range of 5-7 psi. Also a magnetic head having elements made of CoFe material made by this method is disclosed.

    摘要翻译： 提出了使用CMP制造包括CoFe元素的磁头的制造方法。 该方法包括提供Al 2 N 3 O 3的浆料，调节所述的二氧化钛的浓度 浆料在6-12体积％的范围内，并平衡机械抛光作用。 通过将机械抛光机的工作台速度调节到55-90rpm的范围内并且将抛光压力调节到5-7psi的范围内来进行平衡。 还公开了一种具有由该方法制成的由CoFe材料制成的元件的磁头。

    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge
    17.
    发明授权
    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
    具有磁写入磁极的垂直磁性写头具有凹形后缘

    公开(公告)号：US07576951B2

    公开(公告)日：2009-08-18

    申请号：US11411556

    申请日：2006-04-25

    申请人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aaron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

    发明人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aaron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

    摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

    摘要翻译： 用于垂直磁记录的磁写头，具有带有凹后缘的写极。 磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。 写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。 凹形后边缘提高磁性能，例如通过改善转变曲率。 构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。 然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。 执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。