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23 条记录 (耗时 0.025 秒)

    Insulating film, process for producing the same and electronic device using the same
    11.
    发明授权
    Insulating film, process for producing the same and electronic device using the same 失效
    绝缘膜，其制造方法和使用其的电子器件

    公开(公告)号：US08216647B2

    公开(公告)日：2012-07-10

    申请号：US12914471

    申请日：2010-10-28

    申请人： Yutaka Adegawa

    发明人： Yutaka Adegawa

    IPC分类号： H01L21/31

    CPC分类号： H01L21/02282 ,  H01L21/02118 ,  H01L21/3121 ,  H05K3/287 ,  H05K3/4676

    摘要： An insulating film formed by a method comprising: coating a film-forming composition containing a compound having a cage structure; and drying the coated composition, wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying; a process for producing the same; and an electronic device having the same.

    摘要翻译： 一种绝缘膜，其通过以下方法形成：包括含有具有笼结构的化合物的成膜组合物; 并干燥涂布的组合物，其中在干燥和干燥之中的至少一个中，用波长为200nm或更小的光照射涂覆的组合物; 其制造方法; 和具有该电子设备的电子设备。

    Positive photoresist composition for far ultraviolet exposure
    14.
    发明授权
    Positive photoresist composition for far ultraviolet exposure 失效
    用于远紫外线曝光的正光致抗蚀剂组合物

    公开(公告)号：US06794108B1

    公开(公告)日：2004-09-21

    申请号：US09541597

    申请日：2000-04-03

    申请人： Kenichiro Sato ,  Yutaka Adegawa ,  Toshiaki Aoai ,  Kunihiko Kodama

    发明人： Kenichiro Sato ,  Yutaka Adegawa ,  Toshiaki Aoai ,  Kunihiko Kodama

    IPC分类号： G03F7004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/111

    摘要： The present invention provides a positive photoresist composition for far ultraviolet exposure, which comprises a polymer having at least one of a repeating unit represented by formula (Ia) and a repeating unit represented by formula (Ib), and a repeating unit represented by formula (II), and having a group capable of decomposing by the action of an acid: wherein R1 and R2 each represents hydrogen atom, a cyano group, a hydroxyl group, —COOH, —COOR5, —CO—NH—R6, —CO—NH—SO2—R6, an alkyl group, an alkoxy group, a cyclic hydrocarbon group or a —Y group, X represents —O—, —S—, —NH—, —NHSO2— or —NHSO2NH—, A represents a single bond or a divalent linking group, Z2 represents —O— or —N(R3)—, R11 and R12 each represents a hydrogen atom, a cyano group, a halogen atom or an alkyl group, Z1 represents an atomic group necessary for forming an alicyclic structure which contains two bonded carbon atoms (C—C), and Y, R3, R5 and R6 are as defined in the specification.

    摘要翻译： 本发明提供一种用于远紫外线曝光的正性光致抗蚀剂组合物，其包含具有式（Ia）表示的重复单元和式（Ib）表示的重复单元中的至少一种的聚合物和由式（Ib）表示的重复单元， II），并且具有能够通过酸的作用分解的基团：其中R 1和R 2各自表示氢原子，氰基，羟基，-COOH，-COOR 5，-CO-NH-R 6，-CO- NH-SO 2 -R 6，烷基，烷氧基，环状烃基或-Y基，X表示-O - ， - S - ， - NH-，-NHSO 2 - 或-NHSO 2 NH-，A表示单 键或二价连接基团，Z 2表示-O-或-N（R 3） - ，R 11和R 12各自表示氢原子，氰基，卤素原子或烷基，Z 1表示形成 含有两个键合碳原子（CC）的脂环结构，Y，R3，R5和R6如说明书中所定义。

    Negative resist composition
    15.
    发明授权
    Negative resist composition 有权
    负阻抗组成

    公开(公告)号：US06773862B2

    公开(公告)日：2004-08-10

    申请号：US10274386

    申请日：2002-10-21

    申请人： Koji Shirakawa ,  Yutaka Adegawa ,  Shoichiro Yasunami

    发明人： Koji Shirakawa ,  Yutaka Adegawa ,  Shoichiro Yasunami

    IPC分类号： G03C173

    CPC分类号： G03F7/0045 ,  G03F7/0382 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/115 ,  Y10S430/143 ,  Y10S430/167 ,  Y10S430/168

    摘要： A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.

    摘要翻译： 一种负性抗蚀剂组合物，其包含：（A）能够在用光化射线或辐射照射时能够产生酸的化合物; （B）碱溶性聚合物; 和（C）至少两种能够通过酸的作用与聚合物（B）发生交联的交联剂，其中所述交联剂（C）包含至少两种具有彼此不同骨架的化合物，其被选择 在苯环上具有羟甲基和烷氧基甲基中的至少一个的苯酚衍生物，其中羟甲基和烷氧基甲基的和为两个或多个，所述至少两种交联剂中的一种包含一个或两个 其分子中的苯环，并且所述至少两种交联剂中的另一种在其分子中包含3至5个苯环。

    Chemical amplification type negative-working resist composition for electron beams or X-rays
    16.
    发明授权
    Chemical amplification type negative-working resist composition for electron beams or X-rays 失效
    用于电子束或X射线的化学放大型负性抗蚀剂组合物

    公开(公告)号：US06528233B2

    公开(公告)日：2003-03-04

    申请号：US09737568

    申请日：2000-12-18

    申请人： Yutaka Adegawa

    发明人： Yutaka Adegawa

    IPC分类号： G03F7004

    CPC分类号： G03F7/038 ,  G03F7/0045 ,  Y10S430/106

    摘要： A negative-working chemical amplification-type resist composition for electron beams or X-rays satisfying the characteristics of the sensitivity and resolution•resist pattern for the use of electron beams or X-rays is provided. The chemical amplification-type negative-working resist composition contains (1) an alkali-soluble resin having a weight-average molecular weight of exceeding 3,000 and not larger than 1,000,000, (2) a crosslinking agent causing crosslinkage by an acid, and (3) a compound generating an acid by the irradiation of electron beams or X-rays, wherein the alkali-soluble resin has a specific structure.

    摘要翻译： 提供了一种用于电子束或X射线的负极化学放大型抗蚀剂组合物，其满足使用电子束或X射线的灵敏度和分辨率抗蚀图案的特性。 化学放大型负性抗蚀剂组合物含有（1）重均分子量超过3,000且不大于1,000,000的碱溶性树脂，（2）引起酸交联的交联剂和（3 ）通过照射电子束或X射线产生酸的化合物，其中碱溶性树脂具有特定结构。

    Composition for forming insulating film and process for producing insulating film
    18.
    发明授权
    Composition for forming insulating film and process for producing insulating film 失效
    用于形成绝缘膜的组合物和用于制造绝缘膜的方法

    公开(公告)号：US07320828B2

    公开(公告)日：2008-01-22

    申请号：US11060544

    申请日：2005-02-18

    申请人： Kensuke Morita ,  Yutaka Adegawa

    发明人： Kensuke Morita ,  Yutaka Adegawa

    IPC分类号： B32B9/04

    CPC分类号： H01L21/3124 ,  C09D183/04 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  Y10T428/31663

    摘要： A composition for forming an insulating film comprising at least one of a compound represented by formula (I), a hydrolysate of the compound represented by formula (I) and a condensate of the compound represented by formula (I): wherein R1 to R7 each independently represents an organic group, and R1 to R7 are the same or different. And an insulating film obtained by a process, the process comprising using the compound represented by formula (I) as a starting material.

    摘要翻译： 一种用于形成绝缘膜的组合物，其包含由式（I）表示的化合物，式（I）表示的化合物的水解产物和由式（I）表示的化合物的缩合物中的至少一种：其中R“ R 1至R 7各自独立地表示有机基团，R 1至R 7相同或不同。 和通过该方法获得的绝缘膜，该方法包括使用由式（I）表示的化合物作为起始原料。