中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

23 records (took 0.019 seconds)

    Manufacture of truncated lenses, of pairs of truncated lenses and of corresponding devices
    13.
    发明授权
    Manufacture of truncated lenses, of pairs of truncated lenses and of corresponding devices 有权

    公开(公告)号：US10377094B2

    公开(公告)日：2019-08-13

    申请号：US14426472

    申请日：2013-09-03

    Applicant: ams Sensors Singapore Pte. Ltd.

    Inventor： Hartmut Rudmann ,  Jürgen Soechtig ,  Nicola Spring ,  Alexander Bietesch

    IPC: B29D11/00 ,  G02B3/00 ,  B29C33/38 ,  G02B13/00 ,  B29C33/00 ,  B29L11/00

    Abstract: The invention relates to wafer-level manufacturing of optical devices such as modules comprising micro-lenses. In one aspect, passive optical components such as truncated lenses are manufactured by providing a substrate on which a multitude of precursor optical structures is present; and removing material from each of said multitude of precursor optical structures. Another aspect comprises a method for manufacturing a device comprising a set of at least two passive optical components, said method comprising the steps of using a tool obtained by carrying out the steps of manufacturing a precursor tool having a replication surface; and modifying said replication surface by removing material from said precursor tool. An yet another aspect comprises a method for manufacturing a device comprising a set of at least two passive optical components, wherein the method comprises the step of using a master comprising a replication surface comprising, for each of said passive optical components, a first portion describing a shape corresponding to the shape of at least a portion of the respective passive optical component, wherein the master comprises, in addition, at least one protruding portion protruding from at least one of said first portions of said replication surfaces.

    Optical encoder system
    15.
    发明授权
    Optical encoder system 有权

    公开(公告)号：US10317254B2

    公开(公告)日：2019-06-11

    申请号：US15127660

    申请日：2015-03-18

    Applicant: ams Sensors Singapore Pte. Ltd.

    Inventor： Jens Geiger ,  Nicola Spring ,  Robert Lenart ,  Bassam Hallal ,  Hakan Karpuz

    IPC: G01D5/347 ,  G01D5/34

    Abstract: Optical encoding systems include a generalized cylindrical code scale having one or more regions with different light reflective properties. In an example process, a code scale can be created by coating an elongated generalized cylinder with one or more different layers of materials having different light reflective properties. Portions of these layers can be removed selectively in order to expose a particular overlying material and create a particular pattern of features having different optical characteristics (e.g., absorbing, specularly reflecting, diffusely reflecting).

    Replicating optical elements onto a substrate
    17.
    发明授权
    Replicating optical elements onto a substrate 有权

    公开(公告)号：US11897213B2

    公开(公告)日：2024-02-13

    申请号：US17608652

    申请日：2020-06-12

    Applicant: ams Sensors Singapore Pte. Ltd.

    Inventor： Uros Markovic ,  Nicola Spring

    IPC: B29D11/00 ,  G02B3/00

    CPC classification number: B29D11/00375 ,  G02B3/0031 ,  G02B3/0056

    Abstract: Techniques for controlling the flow of replication material (e.g., epoxy) during the formation of replicated optical elements include providing a transparent substrate (220) onto which the optical elements are to be replicated. The substrate (220) includes a structured UV curable shield (202) adhering to its surface. The UV curable shield (202), in turn, has openings (203) that expose portions of the surface of the transparent substrate (220) for replication of the optical elements. During the replication process, excess replication material (124A) may flow onto the UV curable shield (202), which subsequently can be cured so as to facilitate the release and removal of the shield (202) along with the excess replication material (124A).

    YARD CONTROL FEATURES
    18.
    发明申请
    YARD CONTROL FEATURES 有权

    公开(公告)号：US20220176597A1

    公开(公告)日：2022-06-09

    申请号：US17436823

    申请日：2020-03-12

    Applicant: ams Sensors Singapore Pte. Ltd.

    Inventor： Bojan Tesanovic ,  Hartmut Rudmann ,  Nicola Spring ,  Sebastiano Lazzi Gazzini

    IPC: B29C43/02 ,  B29C43/38 ,  B29C64/112 ,  B29C64/379 ,  B29D11/00

    Abstract: A method of manufacturing a plurality of optical elements (140) comprising the steps of providing a substrate (120), and a tool (101) comprising a plurality of replication sections (106), each defining a surface structure of one of the optical elements (140), the tool (101) further comprising at least one contact spacer portion (112), aligning the tool (101) and the substrate (120) with respect to each other and bringing the tool (101) and a first side of the substrate (122) together, with replication material (124) between the tool (101) and the substrate (120), the contact spacer portion (112) contacting the first side of the substrate (122), and thereby causing the spacer portion (112) to adhere to the first side of the substrate (122), hardening the replication material (124), wherein the substrate (120) has yard line features (138) around at least a portion of the replication sections (106), the yard line features (138) containing the replication material (124) on a first side of the yard line with respect to the tool (101) and the substrate (120).

    WAFER ALIGNMENT FEATURES
    19.
    发明申请
    WAFER ALIGNMENT FEATURES 有权

    公开(公告)号：US20220168978A1

    公开(公告)日：2022-06-02

    申请号：US17436803

    申请日：2020-03-11

    Applicant: ams Sensors Singapore Pte. Ltd.

    Inventor： Nicola Spring ,  Uros Markovic

    IPC: B29D11/00 ,  G02B3/00 ,  G02B5/18

    Abstract: A method of manufacturing a plurality of optical elements includes providing a first wafer (200) having lower alignment features (192) arranged on a first surface of the substrate, providing a second wafer (201) comprising, on a replication side, a plurality of replication sections, each replication section defining a surface structure of one of the optical elements, the second wafer (201) further comprising upper alignment features (194) protruding, on the replication side, further than an outermost feature of the replication sections, depositing liquid droplets (196) on the first side of the first wafer (200), and bringing the second wafer (201) and the first side of the first wafer (200) together, with liquid droplets (196) between the first wafer (200) and the second wafer (201), the upper alignment features (194) contacting the liquid droplets (196) on the lower alignment features (192) on the first side of the first wafer (200), and thereby causing the second wafer (201) to align with the first wafer (200) by capillary action.

    OPTICAL LIGHT GUIDES AND METHODS OF MANUFACTURING THE SAME
    20.
    发明申请
    OPTICAL LIGHT GUIDES AND METHODS OF MANUFACTURING THE SAME 有权

    公开(公告)号：US20220113464A1

    公开(公告)日：2022-04-14

    申请号：US17273715

    申请日：2019-09-13

    Applicant: ams Sensors Singapore Pte. Ltd.

    Inventor： Nicola Spring ,  Jens Geiger ,  Diane Morgan

    IPC: F21V8/00 ,  G02B6/12 ,  B29D11/00

    Abstract: Fabricating light guide elements includes forming a first portion of the light guide element using a replication technique (104), and forming a second portion of the light guide element using a photolithographic technique (106). Use of replication can facilitate formation of more complex-shaped optical elements as part of the light guide element. The replication process sometimes results in the formation of a “yard,” or excess replication material, which may lead to light leakage if not removed or smoothed over. In some instances, at least part of the yard portion is embedded within the second portion of the light guide element, thereby resulting in a smoothing over of the yard portion.

Patent Agency Ranking