Abstract:
The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850° C. to 1600° C. before the vitrification, the last stage comprising sintering at a temperature between 1300° C. and 1600° C. in an atmosphere containing hydrogen or oxygen, or a nonflammable mixture of these substances.
Abstract:
The present invention is directed to a method for making silica. A liquid, preferably halide-free, silicon-containing compound capable of being converted by thermal oxidative decomposition to SiO2 is provided and introduced directly into the flame of a combustion burner, which converts the compound to silica, thereby forming finely divided amorphous soot. The soot is vaporized at the site where the liquid is converted into silica by pneumatically atomizing the liquid with a stream of oxygen gas, or a mixture of oxygen gas and nitrogen gas. The amorphous soot is deposited on a receptor surface where, either substantially simultaneously with or subsequently to its deposition, the soot is consolidated into a body of fused silica glass.
Abstract:
Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours as suitable material for the EUV lithography member.
Abstract:
Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours as suitable material for the EUV lithography member.
Abstract:
The present invention provides an optical fiber providing high photosensitivity in the absence of hydrogen loading as well as a low numerical aperture. One aspect of the present invention relates to an optical fiber including a core, the core comprising silica doped with at least about 6 mol % germania and at least about 0.9 wt % fluorine; and a cladding surrounding the core. The optical fiber of the present invention is suitable for the production of fiber Bragg gratings.
Abstract:
The present invention is directed to isotopically enriched optical materials and methods of producing the same. The optical materials provide high isotopic purity silica, calcium, zinc, gallium and germanium materials with increased resistance to optical damage which can be used alone or in combination with other means of preventing damage to decrease lens degradation caused by energy-induced compaction during use.
Abstract:
Optical waveguides made of quartz glass with reduced infrared absorption and reduced attenuation coefficients are made of glass material composed of atoms having mass numbers higher than that of the natural isotope distribution. The quartz glass or doped quartz glass is made of silicon atoms, of which most or all have the mass numbers 29 and/or 30, as well as of oxygen atoms, of which most or all are composed of isotopes with the mass numbers 17 and/or 18. Atoms of the 76Ge isotope are preferably used for doping with germanium atoms having higher mass numbers than in the natural isotope mixture. Glass with atoms of preferably 30Si and/or 18O are preferably used for optical waveguides based on quartz glass having attenuation coefficients below 0.15 dB/km. As indicated, such optical waveguides are also suitable for transmitting high-energy, pulsed or continuous laser light in a wavelength range from 2.0 to 3.0 &mgr;m. These optical waveguides are also suitable for transmitting holmium laser light at 2.1 &mgr;m and Er laser light with a wavelength of 2.79 and 2.94 &mgr;m.
Abstract:
This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties:(a) producing a gas stream of a halide-free silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO.sub.2 ;(b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO.sub.2 ;(c) depositing said amorphous particles onto a support; and(d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the following properties:(1) a Si--R bond dissociation energy that is no higher than the dissociation energy of the Si--O bond;(2) a boiling point no higher than 350.degree. C.; and(3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO.sub.2 which are deemed to be environmentally safe or the emissions are below acceptable governmental standards.
Abstract:
This invention relates to the discovery of a method for incorporating various oxides into silica-containing porous and nonporous glass materials by dissolving soluble compounds of the additive oxides, characterized as MxOy, into solutions, colloidal solutions, or suspensions of soluble silicates, reacting the mixture with an organic compound, and then firing the thus-formed body at temperatures below the softening point of the particular glass composition for a sufficient length of time to produce the porous body or non-porous glass body containing the added oxides intimately bonded to the silica network.
Abstract:
A glass panel unit includes: a first glass pane; a second glass pane facing the first glass pane; a frame member; an evacuated space; and a gas adsorbent. The frame member hermetically bonds the first glass pane and the second glass pane. The evacuated space is surrounded with the first glass pane, the second glass pane, and the frame member. The gas adsorbent is placed in the evacuated space. The gas adsorbent contains a getter material. The getter material contains a plurality of particles of a zeolite crystal. At least one particle accounting for a half or more of a total weight of the plurality of particles has a particle size equal to or greater than 200 nm. An activable temperature of the at least one particle is equal to or lower than 400° C.