Water-based coating compositions and process for coating said
compositions
    11.
    发明授权
    Water-based coating compositions and process for coating said compositions 失效
    水性涂​​料组合物和涂覆所述组合物的方法

    公开(公告)号:US4264656A

    公开(公告)日:1981-04-28

    申请号:US41529

    申请日:1979-05-23

    Applicant: Frank Reeder

    Inventor: Frank Reeder

    CPC classification number: C09D201/08

    Abstract: A water-based coating composition which emits very little pollutants on curing to a water-resistant coating comprises a synthetic resin containing free carboxyl groups held in solution or stable dispersion in water by an amine. The amine is a tertiary carbinamine containing at least two hydroxymethyl groups bonded to the carbon atom carrying the amine group. The coating compositions react with formaldehyde to produce stable fluid emulsion coating compositions having similar properties on curing. The coating compositions are used to coat substrates.

    Abstract translation: 在固化到防水涂层上时发出非常少的污染物的水性涂料组合物包含含有保持在溶液中的游离羧基或通过胺稳定地分散在水中的合成树脂。 胺是含有至少两个与携带胺基的碳原子键合的羟甲基的叔胺。 涂料组合物与甲醛反应以产生具有类似固化性质的稳定的流体乳液涂料组合物。 涂料组合物用于涂覆基材。

    LOW-TEMPERATURE-CURABLE COATING COMPOSITION
    14.
    发明申请

    公开(公告)号:US20180258318A1

    公开(公告)日:2018-09-13

    申请号:US15757472

    申请日:2016-08-19

    Abstract: The present invention provides a coating composition which cures at low temperatures to form a cured film having high solvent resistance. The present invention provides a low-temperature-curable coating composition which comprises (A) a film-forming polymer having a hydrogen-donating functional group that has a heteroatom which bonds covalently to a hydrogen atom, (B) a film-forming polymer having a specific hydrogen-accepting functional group that has a heteroatom to which no hydrogen atom bonds covalently, and (C) a non-basic volatile solvent selected from the group consisting of a non-basic volatile solvent (C-1) having, in the molecule, both a heteroatom that bonds covalently to a hydrogen atom and a heteroatom that does not bond covalently to a hydrogen atom; a mixture of a non-basic volatile solvent (C-2) having, in the molecule, a heteroatom which bonds covalently to a hydrogen atom and a non-basic volatile solvent (C-3) having, in the molecule, a heteroatom to which no hydrogen atom bonds covalently; and combinations thereof.

    Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device
    19.
    发明授权
    Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device 有权
    用于形成保护膜的辐射敏感性树脂组合物,由该组合物形成保护膜的方法,液晶显示装置和固体摄像装置

    公开(公告)号:US07713680B2

    公开(公告)日:2010-05-11

    申请号:US12051037

    申请日:2008-03-19

    CPC classification number: C09D201/08

    Abstract: A radiation sensitive resin composition for forming a protective film, comprising: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy group-containing unsaturated compound and (a3) an unsaturated compound different from the components (a1) and (a2); [B] a monofunctional polymerizable unsaturated compound having a molecular weight of 180 or more and a carboxyl group; [C] a polyfunctional polymerizable unsaturated compound; and [D] a photopolymerization initiator, a method of forming a protective film from the above composition and a protective film formed from the above composition. The composition can provide a cured film having high flatness, has high developability and heat resistance, is advantageously used to form a protective film for liquid crystal display devices and solid-state image sensing devices, and has high storage stability as a composition.

    Abstract translation: 一种用于形成保护膜的辐射敏感性树脂组合物,其包含:[a](a1)不饱和羧酸和/或不饱和羧酸酐的共聚物,(a2)含环氧基的不饱和化合物和(a3)不饱和羧酸 不同于组分(a1)和(a2)的化合物; [B]分子量为180以上且具有羧基的单官能聚合性不饱和化合物, [C]多官能聚合性不饱和化合物; 和[D]光聚合引发剂,由上述组合物形成保护膜的方法和由上述组合物形成的保护膜。 该组合物可以提供具有高平坦度,高显影性和耐热性的固化膜,有利地用于形成液晶显示装置和固体摄像装置的保护膜,并且作为组合物具有高储存稳定性。

    RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE
    20.
    发明申请
    RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE 有权
    用于形成保护膜的辐射敏感性树脂组合物,从组合物形成保护膜的方法,液晶显示装置和固体状态图像感测装置

    公开(公告)号:US20080233515A1

    公开(公告)日:2008-09-25

    申请号:US12051037

    申请日:2008-03-19

    CPC classification number: C09D201/08

    Abstract: A radiation sensitive resin composition for forming a protective film, comprising: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy group-containing unsaturated compound and (a3) an unsaturated compound different from the components (a1) and (a2); [B] a monofunctional polymerizable unsaturated compound having a molecular weight of 180 or more and a carboxyl group; [C] a polyfunctional polymerizable unsaturated compound; and [D] a photopolymerization initiator, a method of forming a protective film from the above composition and a protective film formed from the above composition. The composition can provide a cured film having high flatness, has high developability and heat resistance, is advantageously used to form a protective film for liquid crystal display devices and solid-state image sensing devices, and has high storage stability as a composition.

    Abstract translation: 一种用于形成保护膜的辐射敏感性树脂组合物,其包含:[a](a1)不饱和羧酸和/或不饱和羧酸酐的共聚物,(a2)含环氧基的不饱和化合物和(a3)不饱和羧酸 不同于组分(a1)和(a2)的化合物; [B]分子量为180以上且具有羧基的单官能聚合性不饱和化合物, [C]多官能聚合性不饱和化合物; 和[D]光聚合引发剂,由上述组合物形成保护膜的方法和由上述组合物形成的保护膜。 该组合物可以提供具有高平坦度,高显影性和耐热性的固化膜,有利地用于形成液晶显示装置和固体摄像装置的保护膜,并且作为组合物具有高储存稳定性。

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