公开(公告)号：US20220064353A1

公开(公告)日：2022-03-03

申请号：US17524013

申请日：2021-11-11

申请人： PPG INDUSTRIES OHIO, INC.

发明人： SONGWEI LU

IPC分类号： C08F257/02 ,  C09D5/00 ,  C09D125/06 ,  C09D183/06 ,  C03C17/30 ,  C09D183/02 ,  B05D3/02 ,  B05D5/06 ,  C09D183/04 ,  G02B1/111 ,  G06F3/041

摘要： Touch screen displays and other coated articles demonstrating antiglare properties are provided. A method of forming an antiglare coating on a substrate is also provided, and may be used to prepare the coated articles. The method comprises: (a) heating the substrate to a temperature of at least 100° F. (37.8° C.) to form a heated substrate; (b) applying a curable film-forming composition on at least one surface of the heated substrate to form a substrate coated with a sol-gel layer; and (c) subjecting the coated substrate to thermal conditions for a time sufficient to effect cure of the sol-gel layer. The curable film-forming composition comprises: (i) a silane; (ii) a mineral acid; and (iii) a solvent; wherein the weight ratio of mineral acid to silane is greater than 0.008:1 and the curable film-forming composition has a solids content of less than 10 percent by weight.

公开(公告)号：US20220002575A1

公开(公告)日：2022-01-06

申请号：US17293710

申请日：2019-12-04

申请人： Merck Patent GmbH

发明人： Durairaj BASKARAN ,  MD S. RAHMAN ,  Victor MONREAL

IPC分类号： C09D133/06 ,  C08F220/14 ,  C08F212/08 ,  C09D153/00 ,  C09D125/06 ,  C09D5/00 ,  H01L21/027

摘要： The present invention relates to a random copolymer comprising repeat units of structure (I), (II), (III), and (IV). The invention also pertains to a neutral layer composition comprised of said random copolymer and also pertains to the use of said neutral layer composition to make a crosslinked neutral layer film on a substrate, which can enable self-assembly of a film of a block copolymer overlying said crosslinked neutral layer, wherein said block copolymer contains etch resistant and etchable block, and whose self-assembled pattern is used, through etching, to create either an array of contact holes or posts in said substrate.

公开(公告)号：US11193243B2

公开(公告)日：2021-12-07

申请号：US16683431

申请日：2019-11-14

申请人： BIOSPAN TECHNOLOGIES, INC.

发明人： Sheldon R Chesky

IPC分类号： E01C7/35 ,  E01C11/00 ,  C09D7/63 ,  C09D7/61 ,  C09D125/06 ,  C09D109/06

摘要： This invention is in the field of asphalt construction or pavement applications, compositions and methods of use thereof. The invention also relates to methods of asphalt treatment, such as a step of applying onto an asphalt surface, under treatment conditions, a composition containing a biobased ester, at least one monoterpene, propylene glycol methyl ether acetate, a liquid intermediate made from polystyrene foam, sulfuric acid, D-limonene and soy methyl ester; carbon black pigment and styrene-butadiene complex.

公开(公告)号：US11161999B2

公开(公告)日：2021-11-02

申请号：US17082259

申请日：2020-10-28

申请人： Toshiba Memory Corporation

发明人： Norikatsu Sasao ,  Koji Asakawa ,  Tomoaki Sawabe ,  Shinobu Sugimura

IPC分类号： C09D153/00 ,  C08F20/28 ,  C09D125/06 ,  C09D133/14 ,  C08F12/08 ,  G03F7/00 ,  B05D5/00

摘要： According to one embodiment, a pattern formation method is disclosed. The method includes a preparation process, a block copolymer layer formation process, and a contact process. The preparation process includes preparing a pattern formation material including a block copolymer including a first block and a second block. The first block includes a first main chain and a plurality of first side chains. At least one of the first side chains includes a plurality of carbonyl groups. The block copolymer layer formation process includes forming a block copolymer layer on a first member. The block copolymer layer includes the pattern formation material and includes a first region and a second region. The first region includes the first block. The second region includes the second block. The contact process includes causing the block copolymer layer to contact a metal compound including a metallic element.

公开(公告)号：US20210166935A1

公开(公告)日：2021-06-03

申请号：US17148729

申请日：2021-01-14

申请人： JSR CORPORATION

发明人： Hiroyuki KOMATSU ,  Tomohiro ODA ,  Hitoshi OSAKI ,  Masafumi HORI ,  Takehiko NARUOKA

IPC分类号： H01L21/027 ,  C08F112/08 ,  C09D125/06 ,  H01L21/28 ,  H01L21/321 ,  H01L21/285 ,  C08F8/00 ,  H01L21/02 ,  H01L21/311

摘要： A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.

公开(公告)号：US20210009815A1

公开(公告)日：2021-01-14

申请号：US16905403

申请日：2020-06-18

申请人： PPG Industries Ohio, Inc.

发明人： Songwei Lu ,  Noel Vanier ,  Xiangling Xu ,  Shanti Swarup ,  David C. Martin ,  Kurt G. Olson ,  Irina Schwendeman

IPC分类号： C09D5/00 ,  C09D125/06 ,  C09D183/06 ,  C03C17/30 ,  C08F257/02 ,  C09D183/02 ,  B05D3/02 ,  B05D5/06 ,  C09D183/04 ,  G02B1/111 ,  G06F3/041

摘要： Curable film-forming sol-gel compositions that are essentially free of inorganic oxide particles are provided. The compositions contain: a tetraalkoxysilane; a solvent component; and non-oxide particles, and further contain either i) a mineral acid or ii) an epoxy functional trialkoxysilane and a metal-containing catalyst. Coated articles demonstrating antiglare properties are also provided, comprising: (a) a substrate having at least one surface; and (b) a cured film-forming composition applied thereon, formed from a curable sol-gel composition comprising a silane and non-oxide particles. A method of forming an antiglare coating on a substrate is also provided. The method comprises: (a) applying a curable film-forming sol-gel composition on at least one surface of the substrate to form a coated substrate; and (b) subjecting the coated substrate to thermal conditions for a time sufficient to effect cure of the sol-gel composition and form a coated substrate with a sol-gel network layer having anti-glare properties.

公开(公告)号：US20200317939A1

公开(公告)日：2020-10-08

申请号：US16906374

申请日：2020-06-19

申请人： SUN CHEMICAL CORPORATION

发明人： Michael J. JUREK ,  John G. TIESSEN ,  Soichiro OMIZU ,  Juanita M. PARRIS

IPC分类号： C09D11/101 ,  C09D11/108 ,  C09D11/033 ,  C09D125/06 ,  C09D4/06 ,  C09D7/20

摘要： Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.

公开(公告)号：US20200062973A1

公开(公告)日：2020-02-27

申请号：US16672507

申请日：2019-11-03

申请人： PolyM technology corporation

发明人： Chien-Chung Han ,  Ting-Chia Ku ,  Jo-Wen Chiang

IPC分类号： C09D5/24 ,  H01G9/025 ,  H01G9/15 ,  H01G9/00 ,  C09D125/06 ,  H01G11/70 ,  C09D5/08 ,  C09D179/04 ,  C08G61/12 ,  H01B1/12 ,  C08G73/06

摘要： A composition for forming an electroactive coating includes an acid as a polymerization catalyst, at least one functional component, and at least one compound of formula (1) as a monomer: wherein X is selected from S, O, Se, Te, PR2 and NR2, Y is hydrogen (H) or a precursor of a good leaving group Y− whose conjugate acid (HY) has a pKa of less than 45, Z is hydrogen (H), silyl, or a good leaving group whose conjugate acid (HY) has a pKa of less than 45, b is 0, 1 or 2, each R1 is a substituent, and the at least one compound of formula (1) includes at least one compound of formula (1) with Z═H and Y≠H.

公开(公告)号：US10529552B2

公开(公告)日：2020-01-07

申请号：US15905501

申请日：2018-02-26

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Yu-Ling Chang Chien ,  Chien-Chih Chen ,  Chin-Hsiang Lin ,  Ching-Yu Chang ,  Yahru Cheng

IPC分类号： H01L21/02 ,  H01L21/311 ,  C09D125/06 ,  C09D133/12 ,  C09D125/16 ,  H01L21/027 ,  H01L21/768 ,  H01L21/033 ,  C09D125/18

摘要： In a method of manufacturing a semiconductor device, an underlying structure is formed. A surface grafting layer is formed on the underlying structure. A photo resist layer is formed on the surface grafting layer. The surface grafting layer includes a coating material including a backbone polymer, a surface grafting unit coupled to the backbone polymer and an adhesion unit coupled to the backbone polymer.

公开(公告)号：US10457826B2

公开(公告)日：2019-10-29

申请号：US15039096

申请日：2014-11-07

申请人： STAEDTLER Mars GmbH & Co. KG

发明人： Johannes Herbolsheimer

IPC分类号： C09D13/00 ,  C09D5/06 ,  C09D125/06 ,  C09D125/12 ,  C09D7/63

摘要： A polymer-bound lead refill for writing, drawing and/or painting devices, in particular for pencils or colored pencils, including at least one binding agent, at least one wax, at least one coloring agent and at least one filling agent. The lead refill including at least one surfactant.