公开(公告)号：US20230091241A1

公开(公告)日：2023-03-23

申请号：US17909223

申请日：2021-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Vitaliy PROSYENTSOV ,  Yongfeng NI

IPC: G02F1/35 ,  G02F1/365 ,  G03F7/20

Abstract: An assembly including a non-linear element configured for generating broadband radiation from input radiation coupled into the non-linear element. The assembly further includes an optical element positioned downstream of the non-linear element configured to reflect a fraction of the broadband radiation back into the non-linear element. The non-linear element can be a nonlinear fiber, such as a hollow-core photonic crystal fiber (HC-PCF).

公开(公告)号：US20230076218A1

公开(公告)日：2023-03-09

申请号：US17799019

申请日：2021-02-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Koenraad VAN INGEN SCHENAU ,  Abraham SLACHTER ,  Vadim Yourievich TIMOSHKOV ,  Marleen KOOIMAN ,  Marie-Claire VAN LARE ,  Hermanus Adrianus DILLEN ,  Stefan HUNSCHE ,  Luis Alberto Colina Sant COLINA ,  Aiqin JIANG ,  Fuming WANG ,  Sudharshanan RAGHUNATHAN

IPC: G03F7/20

Abstract: Methods related to improving a simulation processes and solutions (e.g., retargeted patterns) associated with manufacturing of a chip. A method includes obtaining a plurality of dose-focus settings, and a reference distribution based on measured values of a characteristic of a printed pattern associated with each setting of the plurality of dose-focus settings. The method further includes, based on an adjustment model and the plurality of dose-focus settings, determining a probability density function (PDF) of the characteristic such that an error between the PDF and the reference distribution is reduced. The PDF can be a function of the adjustment model and variance associated with dose, the adjustment model being configured to change a proportion of non-linear dose sensitivity contribution to the PDF. A process window can be adjusted based on the determined PDF of the characteristic.

公开(公告)号：US20230076185A1

公开(公告)日：2023-03-09

申请号：US17799806

申请日：2021-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Maialen LARRANAGA ,  Dimira GKOROU ,  Alexander YPMA

IPC: G05B19/418

Abstract: A method including: determining a sequence of states of an object, the states determined based on processing information associated with the object, wherein the sequence of states includes one or more future states of the object; determining, based on at least one of the states within the sequence of states and the one or more future states, a process metric associated with the object, the process metric including an indication of whether processing requirements for the object are satisfied for individual states in the sequence of states; and initiating an adjustment to processing based on (1) at least one of the states and the one or more future states and (2) the process metric, the adjustment configured to enhance the process metric for the individual states in the sequence of states such that final processing requirements for the object are satisfied.

公开(公告)号：US20230063156A1

公开(公告)日：2023-03-02

申请号：US17794897

申请日：2020-12-24

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Ronald Peter ALBRIGHT ,  Kursat BAL ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Sjoerd Frans DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Yang-Shan HUANG ,  Zhuangxiong HUANG ,  Johannes Henricus Wilhelmus JACOBS ,  Johannes Hubertus Josephina MOORS ,  Georgi Nanchev NENCHEV ,  Andrey NIKIPELOV ,  Thomas Maarten RAASVELD ,  Manish RANJAN ,  Edwin TE SLIGTE ,  Karl Robert UMSTADTER ,  Eray UZGÖREN ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F7/20

Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

公开(公告)号：US20230061967A1

公开(公告)日：2023-03-02

申请号：US17793726

申请日：2020-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin John VAN ZWET

IPC: G03F7/20

Abstract: Method of exposing a substrate by a patterned radiation beam, comprising: —providing a radiation beam; —imparting the radiation beam by an array of individually controllable elements; —generating, from the radiation beam, a patterned radiation beam, by tilting the individually controllable elements between different positions about a tilting axis; —projecting the patterned radiation beam towards a substrate; —scanning a substrate across the patterned radiation beam in a scanning direction so as to expose the substrate to the patterned radiation beam, whereby the tilting axis of the individually controllable elements is substantially perpendicular to the scanning direction.

公开(公告)号：US11594395B2

公开(公告)日：2023-02-28

申请号：US17049329

申请日：2019-03-21

Applicant: ASML Netherlands B.V.

Inventor： Yongxin Wang ,  Zhonghua Dong

IPC: H01J37/244 ,  H01L27/146

Abstract: Detectors and detection systems are disclosed. According to certain embodiments, a detector comprises a substrate comprising a plurality of sensing elements including a first sensing element and a second sensing element, wherein at least the first sensing element is formed in a triangular shape. The detector may include a switching region configured to connect the first sensing 5 element and the second sensing element. There may also be provided a plurality of sections including a first section connecting a first plurality of sensing elements to a first output and a second section connecting a second plurality of sensing elements to a second output. The section may be provided in a hexagonal shape.

公开(公告)号：US11592756B2

公开(公告)日：2023-02-28

申请号：US15734882

申请日：2019-05-09

Applicant: ASML Netherlands B.V.

Inventor： Hessel Bart Koolmees ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H02K3/02 ,  H02K41/02 ,  H02K55/00

Abstract: The invention provides an assembly comprising a cryostat (6, 7, 8, 9) and a flat coil layer (3) of superconducting coils (2) for use with a magnetic levitation and/or acceleration motor system (1) of a lithographic apparatus. The cryostat comprises two insulation coverings (8, 9). The coil layer is arranged between the two coverings. The coverings each comprise an inner plate (10) configured to be cryocooled and an outer plate (11) parallel to the inner plate, and an insulation system with a vacuum layer (13) between the inner and outer plate. The insulation system of said covering comprises a layer of circular bodies (101), the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.

公开(公告)号：US11592752B2

公开(公告)日：2023-02-28

申请号：US16875643

申请日：2020-05-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Te-Sheng Wang ,  Xiang Wan

IPC: G03F7/20

Abstract: A process of characterizing a process window of a patterning process, the process including: obtaining a set of inspection locations for a pattern, the pattern defining features to be applied to a substrate with a patterning process, the set of inspection locations corresponding to a set of the features, the set of features being selected from among the features according to sensitivity of the respective features to variation in one or more process characteristics of the patterning process; patterning one or more substrates under varying process characteristics of the patterning process; and determining, for each of the variations in the process characteristics, whether at least some of the set of features yielded unacceptable patterned structures on the one or more substrates at corresponding inspection locations.

公开(公告)号：US20230056872A1

公开(公告)日：2023-02-23

申请号：US18048119

申请日：2022-10-20

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Suzanne Johanna Antonetta Geertruda COSIJNS ,  Koen Govert Olivier VAN DE MEERAKKER ,  Ivo WIDDERSHOVEN

IPC: G01J9/02 ,  G01B11/00 ,  G03F7/00 ,  G03F7/20 ,  G01B9/02001 ,  G01B9/02002 ,  G01B9/02015

Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.

公开(公告)号：US20230054421A1

公开(公告)日：2023-02-23

申请号：US17982226

申请日：2022-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna DE SIMONE ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Thibault Simon Mathieu LAURENT ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Niek Jacobus Johannes ROSET ,  Justin Johannes Hermanus GERRITZEN

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.