公开(公告)号：US10751990B2

公开(公告)日：2020-08-25

申请号：US16503427

申请日：2019-07-03

Applicant: SEMES CO., LTD.

Inventor： Keun Hwa Yang ,  Soon Yong Jeong ,  Jung Wan Hong ,  Gon Kim

IPC: B41J2/045 ,  G01N21/31 ,  B41J2/14

Abstract: Disclosed is an apparatus for detecting liquid discharge characteristics according to an embodiment of the present invention, the apparatus including: a liquid supply unit supplying a liquid; a liquid guide unit including a flow path through which the liquid supplied from the liquid supply unit passes and a nozzle mounting portion communicating with the flow path and on which the nozzle is mounted and guiding the liquid supplied from the liquid supply unit to the nozzle mounted on the nozzle mounting portion; a lighting unit projecting light onto the liquid passing through the flow path inside the liquid guide unit; and a camera obtaining an image of the liquid discharged from the nozzle by being arranged toward the nozzle.

公开(公告)号：US10714352B2

公开(公告)日：2020-07-14

申请号：US15681347

申请日：2017-08-19

Applicant: SEMES CO., LTD.

Inventor： Min Jung Park ,  Jung Yul Lee ,  Hyun Hee Lee ,  Soo Hyun Cho

IPC: H01L21/302 ,  H01L21/027 ,  H01L21/67 ,  H01L21/687 ,  F26B5/04 ,  H01L21/02 ,  H01L21/311 ,  H01L21/683 ,  H01L21/60 ,  H01L21/306

Abstract: Disclosed are an apparatus and a method for treating a substrate. The method includes repeatedly rotating the substrate alternately at a first speed and at a second speed while the treatment liquid is supplied, and the second speed is higher than the first speed.

公开(公告)号：US10705137B2

公开(公告)日：2020-07-07

申请号：US15896399

申请日：2018-02-14

Applicant: SEMES CO., LTD.

Inventor： Soo Man Kwak ,  Hyun Chai Jung ,  Jin Gook Kim

IPC: G01R31/28 ,  H01L21/66 ,  G01R31/382

Abstract: A method of testing semiconductor packages, which performs an electrical test on the semiconductor packages after receiving the semiconductor packages into insert pockets of a test tray and connecting with sockets of a tester by using pusher units each including a heater, includes receiving temperature information of the semiconductor packages from the tester while testing the semiconductor packages, calculating an overall average temperature of the semiconductor packages from the received temperature information, and individually controlling operations of heaters of the pusher units based on difference values between the overall average temperature and individual temperatures of the semiconductor packages.

公开(公告)号：US10682674B2

公开(公告)日：2020-06-16

申请号：US15796415

申请日：2017-10-27

Applicant: SEMES CO., LTD.

Inventor： Younghun Jung ,  Chang Uk Park

IPC: B08B3/10 ,  B08B11/02 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687 ,  B05B9/00 ,  B05C11/10 ,  B08B3/08 ,  C11D11/00 ,  H01L21/02 ,  B08B3/02

Abstract: Embodiments of the inventive concept relate to an apparatus and a method for removing a liquid residing on a substrate. The substrate treating apparatus includes a substrate support unit configured to support the substrate, a liquid supply unit configured to supply a liquid onto the substrate supported by the substrate support unit, and a heating unit configured to heat the substrate supported by the substrate support unit, wherein the substrate support unit includes a support plate having a seating surface, on which the substrate is seated, and having a suction hole on the seating surface, a rotary shaft configured to rotate the support plate, and a vacuum member configured to reduce a pressure of the suction hole such that the substrate seated on the seating surface is vacuum-suctioned on the support plate. Accordingly, the drying efficiency of the substrate may be increased.

公开(公告)号：US20200185217A1

公开(公告)日：2020-06-11

申请号：US16791147

申请日：2020-02-14

Applicant: SEMES CO., LTD.

Inventor： Jinwoo JUNG ,  Young Hun LEE

IPC: H01L21/02 ,  B08B7/00 ,  B08B9/08 ,  H01L21/67 ,  H01L21/687

Abstract: An apparatus and a method for cleaning a chamber are provided. A method for cleaning a chamber having a treatment space for treating a substrate includes cleaning the chamber by supplying a cleaning medium into the treatment space. The cleaning medium includes a supercritical fluid having a non-polar property and an organic solvent having a polar property. The cleaning efficiency of the chamber is improved with respect to a non-polar contaminant and a polar contaminant.

公开(公告)号：US20200168496A1

公开(公告)日：2020-05-28

申请号：US16682333

申请日：2019-11-13

Applicant: SEMES CO., LTD

Inventor： Duk Hyun Son ,  Hyung Joon Kim

IPC: H01L21/68 ,  H01L21/687 ,  B65G47/90

Abstract: A substrate treatment apparatus includes a transport part to transport a transparent rectangular substrate, a substrate support part to support the substrate, light generators to irradiate two different lights onto the moving substrate, and sense the irradiated lights, and a control device to determine a posture of the substrate with reference to the sensed lights and control the transport part such that the substrate is seated on the substrate support part in a default posture that is preset. The control device determines the posture of the transparent rectangular substrate with respect to the default posture using a time difference between a time point at which a first light of the two different lights is not transmitted through an edge of the transparent rectangular substrate and a time point at which a second light of the two different lights is not transmitted through the edge of the transparent rectangular substrate.

公开(公告)号：US20200167946A1

公开(公告)日：2020-05-28

申请号：US16685345

申请日：2019-11-15

Applicant: Semes Co., Ltd.

Inventor： Ohyeol KWON ,  Soo Young Park ,  Jihyun Lee ,  Young Ho Choo

IPC: G06T7/64 ,  G06T7/13 ,  G06T7/11 ,  G06T7/00 ,  H01L21/687

Abstract: Disclosed are a substrate treating apparatus, an eccentricity inspection apparatus, an eccentricity inspection method, and a recording medium for measuring the amount of eccentricity of a spin chuck. The substrate treating apparatus includes a process chamber, a support unit that supports a substrate and rotates the substrate about a support shaft of a spin chuck, and an eccentricity inspection device that inspects eccentricity of the support shaft. The eccentricity inspection device includes an image acquisition unit that obtains an image of the substrate supported on the support unit and an eccentricity measurement unit that obtains edge data of the substrate from the image of the substrate and measures an amount of eccentricity of the support shaft, based on the edge data.

公开(公告)号：US20200081347A1

公开(公告)日：2020-03-12

申请号：US16565661

申请日：2019-09-10

Applicant: SEMES CO., LTD.

Inventor： KIHOON CHOI ,  CHAN YOUNG HEO ,  DO HEON KIM ,  HAE-WON CHOI ,  JAESEONG LEE ,  ANTON KORIAKIN ,  JI SOO JEONG

IPC: G03F7/16 ,  B08B3/04 ,  G03F7/32 ,  G03F7/30

Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

公开(公告)号：US20200065008A1

公开(公告)日：2020-02-27

申请号：US16535125

申请日：2019-08-08

Applicant: SEMES Co. Ltd.

Inventor： Sangman YIM

IPC: G06F3/06

Abstract: The present invention relates to a method of monitoring a memory usage and a substrate processing apparatus. The method of monitoring a memory usage of the present invention comprises: a memory usage collecting step of collecting a memory usage according to a predetermined collection period; a memory leak determining step of determining a memory leak based on the collected memory usage; and an alarm processing step of generating an equipment alarm based on the determining result of the memory leak, wherein the memory leak determining step includes a first memory leak determining step of determining the memory leak by comparing the memory usage with a predetermined threshold value and a second memory leak memory step of determining the memory leak based on a change trend of the memory usage when the memory usage does not exceed the predetermined threshold value.

公开(公告)号：US10563919B2

公开(公告)日：2020-02-18

申请号：US15463319

申请日：2017-03-20

Applicant: SEMES CO., LTD.

Inventor： Jung Min Won ,  Ik-Jin Choi ,  Hyo Seong Seong ,  Shin-Woo Nam

IPC: F27D7/06

Abstract: An embodiment includes an apparatus for controlling temperature of a substrate, an apparatus for treating a substrate comprising the same, and a method of controlling the same, which may control the temperature of the substrate by each area and not increasing the volume of the apparatus. The substrate temperature control apparatus comprises: a support plate for supporting a substrate; a plurality of heating units placed in different area of the substrate and controlling a temperature of the substrate by each area; a power supply unit for providing a power to control the temperature of the substrate; a switch unit connected between the plurality of heating units and the power supply unit, and obtaining one or more of a transistor device; and a controller for controlling a power which is supplied to each heating units by controlling unit.