公开(公告)号：US20140152969A1

公开(公告)日：2014-06-05

申请号：US14234352

申请日：2012-07-20

Applicant: Arno Jan Bleeker ,  Laurentius Cornelius De Winter

Inventor： Arno Jan Bleeker ,  Laurentius Cornelius De Winter

IPC: G03F7/20

CPC classification number: G03F7/70608 ,  G03F7/70191 ,  G03F7/70291 ,  G03F7/70558

Abstract: A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data.

Abstract translation: 光刻设备被提供和配置成将图案化的辐射束投影到衬底上。 该装置具有测量系统，以提供与衬底上的抗蚀剂层的厚度相关的测量数据，以及控制器，用于控制光刻设备的操作，使得待投影到衬底上的图案化束中的辐射强度水平为 根据测量数据进行控制。

公开(公告)号：US20120127467A1

公开(公告)日：2012-05-24

申请号：US13388267

申请日：2010-07-02

Applicant: Vitalii Ivanov ,  Vadim Yevgenyevich Banine ,  Arie Jeffrey Den Boef ,  Luigi Scaccabarozzi ,  Nikolay Nikolaevich Iosad

Inventor： Vitalii Ivanov ,  Vadim Yevgenyevich Banine ,  Arie Jeffrey Den Boef ,  Luigi Scaccabarozzi ,  Nikolay Nikolaevich Iosad

IPC: G01J3/28

CPC classification number: G03F1/84 ,  G01N21/6408 ,  G01N21/6489 ,  G01N21/65 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G03F1/24

Abstract: Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.

Abstract translation: 用于检查物体的方法和系统包括使用光谱技术来检测物体表面上的不需要的颗粒，这是由于不同的物质与不同的物质相比，由于不同的物质而与被检查物体的不同响应。 可以使用来自物体表面的二次光子发射的时间分辨光谱和/或能量分辨光谱来获得拉曼和光致发光光谱。 待检查的物体可以是例如在光刻工艺中使用的图案形成装置，例如掩模版，在这种情况下，例如可以检测到金属，金属氧化物或有机颗粒的存在。 所述方法和装置是高度敏感的，例如能够检测EUV掩模版图案侧的小颗粒（小于100nm，特别是低于50nm）。

公开(公告)号：US20110026032A1

公开(公告)日：2011-02-03

申请号：US12920984

申请日：2009-03-30

Applicant: Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Marcus Adrianus Van De Kerkhof ,  Henricus Petrus Maria Pellemans ,  Martin Ebert

Inventor： Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Marcus Adrianus Van De Kerkhof ,  Henricus Petrus Maria Pellemans ,  Martin Ebert

IPC: G01N21/47

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N21/95607 ,  G01N2021/8845 ,  G03F7/70625

Abstract: A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.

Abstract translation: 提出了一种评估底物模型的方法。 使用第一波长的辐射进行散射测量。 然后改变辐射的波长，并进行进一步的散射测量。 如果散射测量在波长范围内是一致的，则模型是足够准确的。 然而，如果散射测量值随着波长的变化而变化，则衬底的模型不够准确。

公开(公告)号：US20080179765A1

公开(公告)日：2008-07-31

申请号：US11710428

申请日：2007-02-26

Applicant: Antonius Johannus Van Der Net

Inventor： Antonius Johannus Van Der Net

IPC: C10J1/10 ,  B01D47/00

CPC classification number: G03F7/70933 ,  C10J1/06 ,  C10J1/10 ,  G03F7/70341 ,  Y10S261/65

Abstract: A humidifying apparatus is disclosed in which gas is provided to a first side of a membrane and liquid to a second side of the same membrane. The membrane is non-porous to the liquid but porous to vapour of the liquid and is liquidphilic to said liquid.

Abstract translation: 公开了一种加湿装置，其中将气体提供到膜和液体的第一侧到同一膜的第二侧。 该膜对于液体是无孔的，但是对于液体是多孔的至蒸气，并且与所述液体是液体的。

公开(公告)号：US20060017894A1

公开(公告)日：2006-01-26

申请号：US10896000

申请日：2004-07-22

Applicant: Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

Inventor： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC: G03B27/52

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

Abstract translation: 公开了一种光刻设备。 该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。

公开(公告)号：US20250085172A9

公开(公告)日：2025-03-13

申请号：US18286631

申请日：2022-03-29

Applicant: ASML Netherland B.V.

Inventor： Koen Martin Willem Jan BOS ,  Joost André KLUGKIST ,  Anirudh ANAND

IPC: G01K11/12 ,  G03F7/00

Abstract: An optical apparatus is disclosed, the apparatus comprising an optical element having a reflective surface for reflecting incident radiation in a beam path, and at least one sensor configured to sense radiation corresponding to a temperature of a respective portion of a backside surface of the optical element. Also disclosed is a method of controlling a temperature of a reflective surface of an optical element in a lithographic apparatus.

公开(公告)号：US20240201029A1

公开(公告)日：2024-06-20

申请号：US18286631

申请日：2022-03-29

Applicant: ASML Netherland B.V.

Inventor： Koen Martin Willem Jan BOS ,  Joost André KLUGKIST ,  Anirudh ANAND

IPC: G01K11/12 ,  G03F7/00

CPC classification number: G01K11/12 ,  G03F7/7015 ,  G03F7/70316 ,  G03F7/70525 ,  G03F7/7085 ,  G03F7/70891 ,  G03F7/70958

Abstract: An optical apparatus is disclosed, the apparatus comprising an optical element having a reflective surface for reflecting incident radiation in a beam path, and at least one sensor configured to sense radiation corresponding to a temperature of a respective portion of a backside surface of the optical element. Also disclosed is a method of controlling a temperature of a reflective surface of an optical element in a lithographic apparatus.

公开(公告)号：US10599040B2

公开(公告)日：2020-03-24

申请号：US16040808

申请日：2018-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： James Malcolm Weidman ,  Franciscus Johannes Blok ,  Erika Jane Prime ,  Juliane Charlotte Behrend

IPC: G03B27/54 ,  G03F7/20

Abstract: A method of determining compatibility of a patterning device with a lithographic apparatus. The method includes determining an intensity distribution of a conditioned radiation beam across a sensor plane of an illumination system of the lithographic apparatus. The method further includes using the determined intensity distribution to calculate a non-uniformity of intensity caused by contamination and/or degradation of a collector. The method further includes determining the effect of the non-uniformity on a characteristic of an image of the patterned radiation beam. The method further includes determining the compatibility of the patterning device with the lithographic apparatus based on the effect of the non-uniformity on the characteristic.

公开(公告)号：US20190056216A1

公开(公告)日：2019-02-21

申请号：US16168355

申请日：2018-10-23

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria PELLEMANS ,  Arie Jeffrey Den Boef

IPC: G01B11/24 ,  G03F7/20

CPC classification number: G01B11/24 ,  G03F7/70191 ,  G03F7/70633 ,  G03F7/7085

Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.

公开(公告)号：US20180321603A1

公开(公告)日：2018-11-08

申请号：US15771634

申请日：2016-10-25

Applicant: ASML NETHERLAND B.V.

Inventor： Sicco OOSTERHOFF ,  Paul JANSSEN ,  Beltrijs Louise Marie-Joseph Katrie VERBRUGGE

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/24

CPC classification number: G03F7/70983 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70916 ,  G03F7/70958 ,  G21K2201/067

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.