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42 条记录 (耗时 0.031 秒)

    Microlithographic projection exposure apparatus
    21.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US08982325B2

    公开(公告)日：2015-03-17

    申请号：US13333350

    申请日：2011-12-21

    申请人： Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

    发明人： Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70308 ,  G03F7/70216 ,  G03F7/70566

    摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.

    摘要翻译： 本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。 微光刻投影曝光装置包括照明系统和投影物镜。 照明系统可以照亮布置在投影物镜的物平面中的掩模。 掩模可以具有待成像的结构。 该方法可以包括用光照射照明系统的光瞳平面。 该方法还可以包括在投影物镜的平面内修改通过该平面的光的相位，幅度和/或极化。 可以以相互不同的方式对至少两个衍射级进行修改。 与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

    Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror
    23.
    发明授权
    Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror 有权
    反射折射投影物镜具有倾斜的偏转镜，投影曝光装置，投影曝光方法和反射镜

    公开(公告)号：US08411356B2

    公开(公告)日：2013-04-02

    申请号：US13217793

    申请日：2011-08-25

    申请人： Ralf Mueller ,  Aksel Goehnermeier ,  Wolfgang Singer

    发明人： Ralf Mueller ,  Aksel Goehnermeier ,  Wolfgang Singer

    IPC分类号： G02B17/08

    CPC分类号： G02B17/08 ,  G02B27/286 ,  G03F7/70225 ,  G03F7/70566

    摘要： A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength λ from the object surface towards the concave mirror or deflects light at λ from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis. For a pattern including a grating having a line width of 45 nm and a pitch, p, the projection objective images the pattern to the image surface such that for a first orientation of the pattern and a second orientation of the pattern a difference, ΔHV, between the imaged line width is 1.2 nm or less for 100 nm

    摘要翻译： 投影物镜具有物体表面和图像表面。 投影物镜包括沿着光轴布置的多个光学元件，并且被配置为使得在操作期间，投影物镜将布置在物体表面中的图案图像映像到图像表面上。 光学元件包括凹面镜，第一偏转镜和第二偏转镜。 第一偏转镜相对于光轴相对于第一倾斜轴倾斜第一倾斜角度t1，使得在操作期间，第一偏转镜将波长λ的物体从物体表面偏转到凹面镜，或使光线偏转 λ从凹面镜朝向图像表面。 第二偏转镜相对于光轴倾斜第二倾斜角t2，约为第二倾斜轴。 对于包括具有45nm的线宽度和间距p的光栅的图案，投影物镜将图案图像到图像表面，使得对于图案的第一取向和图案的第二取向而言，Dgr; HV，对于100nm

    Off-axis objectives with rotatable optical element
    24.
    发明授权
    Off-axis objectives with rotatable optical element 有权
    带旋转光学元件的离轴物镜

    公开(公告)号：US08339575B2

    公开(公告)日：2012-12-25

    申请号：US12206550

    申请日：2008-09-08

    申请人： Alexandra Pazidis ,  Aksel Goehnermeier

    发明人： Alexandra Pazidis ,  Aksel Goehnermeier

    IPC分类号： G02B7/02 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/70916 ,  G03F7/70308 ,  G03F7/70983

    摘要： An objective and a method for operating an objective, in particular a projection objective or an illumination objective for microlithography for imaging a reticle onto a wafer, with a plurality of optical elements that are arranged along a ray path, wherein at least one optical element of a first kind (1) is provided, which is irradiated only partially by a ray bundle, wherein the one or more optical element(s) of the first kind are rotatably mounted or positionable about the optical axis or an axis parallel thereto, wherein, for each optical element of the first kind at least two mounting positions are provided, and wherein the rotation angle between the two mounting positions is defined by the surface (7) irradiated by the ray bundle such that, in the various mounting positions, the surfaces irradiated by the ray path do not overlap.

    摘要翻译： 一种用于操作物镜的目的和方法，特别是具有沿着光线路径布置的多个光学元件的用于将光罩成像到晶片上的微光刻的投影物镜或照明物镜，其中至少一个光学元件 提供第一种（1），其仅部分地被射线束照射，其中第一类的一个或多个光学元件围绕光轴或平行于其的轴线可旋转地安装或定位，其中， 对于第一种的每个光学元件，提供至少两个安装位置，并且其中两个安装位置之间的旋转角度被由射线束照射的表面（7）限定，使得在各种安装位置，表面 由射线路径照射不重叠。

    Method of manufacturing a miniaturized device
    28.
    发明授权
    Method of manufacturing a miniaturized device 有权
    制造小型化装置的方法

    公开(公告)号：US07508489B2

    公开(公告)日：2009-03-24

    申请号：US11294860

    申请日：2005-12-05

    申请人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

    发明人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

    IPC分类号： G03B27/42 ,  G03B27/54

    CPC分类号： G03B27/42 ,  G03F7/70258

    摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane; disposing a substrate carrying a resist in a region of the image plane and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.

    摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在物平面的区域中; 在所述图像平面的区域中配置携带抗蚀剂的基板，并使用所述投影曝光系统以调整的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。

    Objective with crystal lenses
    29.
    发明申请
    Objective with crystal lenses 有权
    目标水晶镜片

    公开(公告)号：US20050157401A1

    公开(公告)日：2005-07-21

    申请号：US10931745

    申请日：2004-09-01

    申请人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

    发明人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

    IPC分类号： G02B1/02 ,  G02B5/30 ,  G03F7/20 ,  G02B21/02

    CPC分类号： G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G02B13/14 ,  G02B27/0043 ,  G02B27/286 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  G03F7/70966

    摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.

    摘要翻译： 目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。 在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。 双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。