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    Sputtering apparatus with rotating target and target cooling
    21.
    发明授权
    Sputtering apparatus with rotating target and target cooling 失效
    具有旋转目标和目标冷却的溅射装置

    公开(公告)号：US5262032A

    公开(公告)日：1993-11-16

    申请号：US918142

    申请日：1992-07-23

    Applicant: Klaus Hartig ,  Anton Dietrich ,  Joachim Szczyrbowski

    Inventor： Klaus Hartig ,  Anton Dietrich ,  Joachim Szczyrbowski

    IPC: C23C14/34 ,  H01J37/34

    CPC classification number: H01J37/3497 ,  C23C14/3407 ,  H01J37/3405

    Abstract: A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).

    Abstract translation: 提出了一种溅射装置，特别是具有磁控管阴极和旋转靶（1）的溅射装置，并且由液体冷却剂（优选水）进行目标冷却，其中提供用于使冷却集中在旋转的区域或区域上 暴露于由等离子体（12）产生的热的靶（1）和磁体组件（23）的磁体（28,29,30,31）形成至少一个冷却通道（34,35）。

    Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating
    22.
    发明授权
    Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating 失效
    由光学有效层系统组成的用于基板的涂层，由此层系统具有高的抗反射效果，以及制造涂层的方法

    公开(公告)号：US5170291A

    公开(公告)日：1992-12-08

    申请号：US717027

    申请日：1991-06-18

    Applicant: Joachim Szczyrbowski ,  Klaus Hartig ,  Wolfgang Lohwasser

    Inventor： Joachim Szczyrbowski ,  Klaus Hartig ,  Wolfgang Lohwasser

    IPC: C03C17/34 ,  G02B1/11

    CPC classification number: G02B1/115 ,  C03C17/3417 ,  C03C17/3452 ,  C03C17/347

    Abstract: A coating for applying to a front side of a substrate, which side is facing an observer, comprises a four-layer system which is optically effective and has a high anti-reflective effect. A first layer of this system is applied onto the front side of the substrate and is, preferably, a highly-refracting TiO.sub.2 layer, the second layer is applied to the first layer and is a low-refracting Al.sub.2 O.sub.3 layer, a third layer of the system is applied to the second layer and is, preferably, a high-refracting TiO.sub.2, while the fourth layer applied to the third layer is, preferably, a low-refracting SiO.sub.2 layer. The layers can be formed by either a pyrolytic method, a plasma-supported chemical vapor deposition method, a sputtering method or a chemical vapor deposition method. Preferably, they are formed by a DC-reactive sputtering method with a magnetron.

    Abstract translation: 用于施加到基板的前侧的涂层，该涂层面向观察者，包括光学有效并具有高抗反射效果的四层体系。 该系统的第一层被施加到基板的正面，并且优选地是高折射率的TiO 2层，第二层施加到第一层，并且是低折射Al 2 O 3层，第三层是 系统被施加到第二层，并且优选地是高折射TiO 2，而施加到第三层的第四层优选地是低折射SiO 2层。 这些层可以通过热解法，等离子体支持的化学气相沉积法，溅射法或化学气相沉积法形成。 优选地，它们由具有磁控管的DC反应溅射法形成。

    Method and apparatus for the reactive vapor depositing of metal compounds
    25.
    发明授权
    Method and apparatus for the reactive vapor depositing of metal compounds 失效
    用于金属化合物的反应性气相沉积的方法和装置

    公开(公告)号：US4828872A

    公开(公告)日：1989-05-09

    申请号：US906225

    申请日：1986-09-11

    Applicant: Volker Bauer ,  Albert Feuerstein ,  Klaus Hartig ,  Gerhard Kienel ,  Helmuth Lammermann ,  Wolfgang Zirkel

    Inventor： Volker Bauer ,  Albert Feuerstein ,  Klaus Hartig ,  Gerhard Kienel ,  Helmuth Lammermann ,  Wolfgang Zirkel

    IPC: C23C14/30 ,  C23C14/00 ,  C23C14/32

    CPC classification number: C23C14/228 ,  C23C14/0021 ,  C23C14/32

    Abstract: A method and apparatus is disclosed for the reactive deposition of vapors of metal compounds onto substrates by the evaporation of at least one metal by means of an electron beam in an atmosphere consisting of the reaction gas, at pressures of no more than 10.sup.-1 mbar. An electrode positively biased with respect to ground and having an acceleration voltage of at least 20 kV is disposed in the area of the vapor stream flowing to the substrate. The metal vapor is produced in an internal chamber which surrounds the evaporator and has a masked orifice opposite the substrate. The reaction gas is introduced into the internal chamber and the metal vapor and reaction gas are guided by the masked orifice toward the substrate.

    Abstract translation: 公开了一种方法和装置，用于通过在由不大于10-1mbar的压力的反应气体组成的气氛中通过电子束蒸发至少一种金属，将金属化合物的蒸汽反应沉积到基底上 。 相对于地面正向偏置并具有至少20kV的加速电压的电极设置在流到衬底的蒸汽流的区域中。 金属蒸汽在围绕蒸发器的内部室中产生，并具有与基板相对的掩蔽孔。 将反应气体引入到内部室中，并且金属蒸气和反应气体被掩蔽的孔朝向衬底引导。

    Concentration-modulated coatings
    26.
    发明授权
    Concentration-modulated coatings 有权
    浓度调制涂层

    公开(公告)号：US09255030B2

    公开(公告)日：2016-02-09

    申请号：US11672207

    申请日：2007-02-07

    Applicant: Klaus Hartig

    Inventor： Klaus Hartig

    IPC: C23C14/24 ,  C03C17/36 ,  C23C14/35 ,  C23C14/08 ,  C23C14/56

    CPC classification number: C03C17/3613 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3694 ,  C23C14/086 ,  C23C14/352 ,  C23C14/568 ,  Y10T428/265

    Abstract: The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.

    Abstract translation: 本发明提供一种承载低发射率涂层的基片。 低辐射涂层包括至少一个分级膜区域。 在某些实施例中，在双型低辐射率涂层的两个红外反射层之间提供至少一个分级膜区域。 分级膜区域具有基本上连续降低的第一介电材料的浓度和基本上连续增加的第二介电材料的浓度。 还提供了沉积这种低辐射率涂层和承载这些涂层的基材的方法。

    VERTICAL-OFFSET COATER AND METHODS OF USE
    30.
    发明申请
    VERTICAL-OFFSET COATER AND METHODS OF USE 有权
    垂直偏心涂层及其使用方法

    公开(公告)号：US20100221422A1

    公开(公告)日：2010-09-02

    申请号：US12713843

    申请日：2010-02-26

    Applicant: Klaus Hartig

    Inventor： Klaus Hartig

    IPC: B05D1/00

    CPC classification number: C23C14/50 ,  B65G49/063 ,  B65G2249/02 ,  C03C17/002 ,  C03C2218/365 ,  C23C14/56 ,  C23C16/4587 ,  C23C16/54

    Abstract: The invention provides a coater, and methods of using the coater, for depositing thin films onto generally-opposed major surfaces of a sheet-like substrate. The coater has a substrate transport system adapted for supporting the substrate in a vertical-offset configuration wherein the substrate is not in a perfectly vertical position but rather is offset from vertical by an acute angle. The transport system defines a path of substrate travel extending through the coater. The transport system is adapted for conveying the substrate along the path of substrate travel. Preferably, the transport system includes a side support for supporting a rear major surface of the substrate. The preferred side support bounds at least one passage through which coating material passes when such coating material is deposited onto the substrate's rear major surface. Preferably, the coater includes at least one coating apparatus (e.g., which is adapted for delivering coating material) on each of two sides of the path of substrate travel. The coating apparatuses preferably are adapted for depositing coatings onto both of the generally-opposed major surfaces of the substrate in a single pass of the substrate along the path of substrate travel.

    Abstract translation: 本发明提供一种涂布机，以及使用涂布机的方法，用于将薄膜沉积在片状基底的大致相对的主表面上。 该涂布机具有适于以垂直偏移配置来支撑基底的基底输送系统，其中基底不处于完全垂直的位置，而是以垂直方向偏斜锐角。 输送系统定义了延伸穿过涂布机的基板行程的路径。 传送系统适于沿着基板移动的路径输送基板。 优选地，输送系统包括用于支撑基底的后主表面的侧支撑件。 当这种涂层材料沉积到基底的后主表面上时，优选的侧支撑物限定涂层材料通过的至少一个通道。 优选地，涂布机包括至少一个涂布装置（例如适于输送涂料的涂布装置）在基板移动路径的两侧的每一侧上。 涂覆设备优选地适于在衬底行进路径的单次通过中将衬底沉积在衬底的两个大致相对的主表面上。

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