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    Yttria-based material coated chemical vapor deposition chamber heater
    22.
    发明授权
    Yttria-based material coated chemical vapor deposition chamber heater 有权
    氧化钇材料涂层化学气相沉积室加热器

    公开(公告)号：US09556507B2

    公开(公告)日：2017-01-31

    申请号：US14199745

    申请日：2014-03-06

    申请人： Applied Materials, Inc.

    发明人： Ren-Guan Duan ,  Juan Carlos Rocha-Alvarez ,  Jianhua Zhou

    IPC分类号： H05B3/68 ,  C23C4/10 ,  C23C16/44 ,  C23C16/458 ,  H05B3/14

    CPC分类号： C23C4/11 ,  C23C4/134 ,  C23C16/4404 ,  C23C16/4581 ,  H05B3/143

    摘要： Embodiments of the present invention generally relate to heated substrate supports having a protective coating thereon. The protective coating is formed from yttrium oxide at a molar concentration ranging from about 50 mole percent to about 75 mole percent; zirconium oxide at a molar concentration ranging from about 10 mole percent to about 30 mole percent; and at least one other component, selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof, at a molar concentration ranging from about 10 mole percent to about 30 mole percent. The alloying of yttrium oxide with a compatible oxide improves wear resistance, flexural strength, and fracture toughness of the protective coating, relative to pure yttrium oxide.

    摘要翻译： 本发明的实施方案一般涉及其上具有保护涂层的加热的衬底支撑件。 保护性涂层由摩尔浓度范围为约50摩尔％至约75摩尔％的氧化钇形成; 摩尔浓度范围为约10摩尔％至约30摩尔％的氧化锆; 和选自氧化铝，氧化铪，氧化钪，氧化钕，氧化铌，氧化钐，氧化镱，氧化铒，氧化铈及其组合中的至少一种其它组分，摩尔浓度范围为 约10摩尔％至约30摩尔％。 相对于纯氧化钇，氧化钇与相容氧化物的合金化提高了保护涂层的耐磨性，弯曲强度和断裂韧性。

    Processing equipment component plating
    28.
    发明授权
    Processing equipment component plating 有权

    公开(公告)号：US11270870B2

    公开(公告)日：2022-03-08

    申请号：US16806852

    申请日：2020-03-02

    申请人： Applied Materials, Inc.

    发明人： Ren-Guan Duan ,  Juan Carlos Rocha-Alvarez ,  Bushra Afzal

    IPC分类号： C25D7/00 ,  H01J37/32 ,  H01J9/24 ,  C25D5/12 ,  C25D3/62 ,  C25D3/48

    摘要： A method of forming a radio frequency (RF) strap for use in a process chamber is provided. The method includes positioning a core strap including a first material that is electrically and thermally conductive in a first electrochemical bath. The first electrochemical bath includes a first solvent and a first plating precursor. The method further includes forming a first protective coating on an outer surface of the core strap, removing the first solvent and the first plating precursor from the core strap having the first protective coating formed thereon, post-treating the core strap having the first protective coating formed thereon, positioning the core strap having the first protective coating formed thereon in a second electrochemical bath, and forming a second protective coating on an outer surface of the first protective coating. The first protective coating includes nickel, the second electrochemical bath includes a second solvent and a second plating precursor, and the second protective coating includes gold.

    Alumina layer formation on aluminum surface to protect aluminum parts
    29.
    发明授权
    Alumina layer formation on aluminum surface to protect aluminum parts 有权

    公开(公告)号：US10711350B2

    公开(公告)日：2020-07-14

    申请号：US15437098

    申请日：2017-02-20

    申请人： Applied Materials, Inc.

    发明人： Ren-Guan Duan ,  Jianhua Zhou ,  Juan Carlos Rocha-Alvarez

    IPC分类号： C23C18/12 ,  C22F1/04 ,  C23C18/04 ,  C23G1/12

    摘要： Implementations described herein generally relate to materials and coatings, and more specifically to materials and coatings for aluminum and aluminum-containing chamber components. In one implementation, a process is provided. The process comprises exposing an aluminum-containing component to a moisture thermal treatment process and exposing the aluminum-containing component to a thermal treatment process. The moisture thermal treatment process comprises exposing the aluminum-containing component to an environment having a moisture content from about 30% to about 100% at a first temperature from about 30 to about 100 degrees Celsius. The thermal treatment process comprises heating the aluminum-containing component to a second temperature from about 200 degrees Celsius to about 550 degrees Celsius to form an alumina layer on the at least one surface of the aluminum-containing component.